公开(公告)号：US4578743A

公开(公告)日：1986-03-25

申请号：US622877

申请日：1984-06-21

Applicant: Haruhisa Inokuchi ,  Takami Sakai

Inventor： Haruhisa Inokuchi ,  Takami Sakai

IPC: H02J3/36 ,  H02M7/515 ,  H01J3/36

CPC classification number: H02J3/36 ,  Y02E60/60

Abstract: A converter control system for DC power transmission line performs the following operation. When the DC current flowing through an inverter decreases to a value being smaller than a rated current value by a value in excess of a predetermined value, a reference voltage value determining the DC voltage of the inverter decreases. The decrease of this reference voltage value is limited to a given extent, so that a partial constant current characteristic portion appears at the voltage decreased portion in the DC voltage/current characteristic of the inverter. Then, an automatic voltage regulator of the inverter is rendered always active.

Abstract translation: 用于直流输电线路的转换器控制系统执行以下操作。 当流过逆变器的直流电流减小到小于额定电流值的值超过预定值时，确定逆变器的直流电压的参考电压值减小。 该参考电压值的减小被限制在给定的程度，使得在逆变器的直流电压/电流特性中的电压降低部分出现部分恒定电流特性部分。 然后，使逆变器的自动电压调节器始终处于活动状态。

公开(公告)号：EP3443822B1

公开(公告)日：2024-06-05

申请号：EP17782880.3

申请日：2017-04-06

IPC: H05H7/04 ,  H01F1/057 ,  H01J37/143 ,  H01J3/02 ,  H01J3/36

CPC classification number: H01J3/027 ,  H01J3/029 ,  H01J3/36 ,  H01J37/143

公开(公告)号：EP1056113A2

公开(公告)日：2000-11-29

申请号：EP00303209.1

申请日：2000-04-17

Applicant: APPLIED MATERIALS, INC.

Inventor： Glavish, Hilton F. ,  Gordon, John Stuart

IPC: H01J37/317 ,  H01J37/30 ,  H01J3/36

CPC classification number: H01J37/3171 ,  H01J2237/04737

Abstract: An ion implanter employs two three gap rf accelerator stages to boost the implant energy after mass selection. The electrodes of the accelerator stages have slit-shaped apertures that accommodate high beam current, when the accelerator is in drift mode. By particular choice of the parameters of the accelerator, each stage of the accelerator produces accelerated ions having a relatively small energy spread, even though the acceptance range of the accelerator stage extends over a substantial phase angle of the applied rf voltage. The resulting accelerator is flexible, permitting a wide variation of output energies with good beam dynamics. Ion bunches from the first three gap stage are caused to have the correct flight time to reach the second stage for acceleration by adjusting the speed of the ions while maintaining the rf phase of the fields in the two stages locked to fixed values.

Abstract translation: 离子注入机采用两个三个间隙rf加速器级，以在质量选择之后增加植入能量。 当加速器处于漂移模式时，加速器级的电极具有适应远光束电流的狭缝形孔。 通过加速器的参数的特定选择，加速器的每个阶段产生具有相对小的能量扩展的加速离子，即使加速器级的接受范围在所施加的rf电压的基本相位角上延伸。 所产生的加速器是灵活的，允许具有良好的光束动力学的输出能量的广泛变化。 通过调整离子速度同时将两级中的场的rf相位锁定到固定值，使来自前三个间隙级的离子束具有到达第二阶段加速的正确飞行时间。

公开(公告)号：TWI696206B

公开(公告)日：2020-06-11

申请号：TW107134058

申请日：2018-09-27

Applicant: 日商PHOTO ELECTRON SOUL股份有限公司 ,  PHOTO ELECTRON SOUL INC.

Inventor： 西谷智博 ,  NISHITANI, TOMOHIRO ,  小泉淳 ,  KOIZUMI, ATSUSHI ,  川俣智章 ,  KAWAMATA, TOMOAKI ,  鹿野悠 ,  SHIKANO, HARUKA

IPC: H01J3/36 ,  H01J3/32 ,  H01J1/88