전자총, 전자선 적용 장치, 및, 전자총의 제어 방법

    公开(公告)号:KR20200143383A

    公开(公告)日:2020-12-23

    申请号:KR20207029164

    申请日:2020-05-08

    Abstract: 전자총이구비하는구성만으로, 포토캐소드로부터방출된전자빔의강도를직접모니터할수 있는전자총, 전자총을탑재한전자선적용장치, 및, 전자총의제어방법을제공하는것을과제로한다. 광원과, 광원으로부터의수광에따라, 전자빔을방출하는포토캐소드와, 애노드와, 전자빔의일부를차폐할수 있는전자빔 차폐부재와, 전자빔 차폐부재에의해차폐한측정용전자빔을이용하여, 포토캐소드로부터방출된전자빔의강도를측정하는측정부를포함하는전자총에의해과제를해결할수 있다.

    전자 총, 전자선 적용 장치, 전자 총에 의한 전자 사출 방법, 및, 전자 빔의 초점 위치 조정 방법

    公开(公告)号:KR20200130420A

    公开(公告)日:2020-11-18

    申请号:KR20207029333

    申请日:2019-08-07

    Inventor: IIJIMA HOKUTO

    Abstract: 전자총을상대측장치에탑재한후에, 전자빔의초점을단초점측 및장초점측으로조정할수 있는장치를제공하는것을과제로한다. 포토캐소드와, 애노드를포함하는전자총으로서, 상기전자총은, 상기포토캐소드와상기애노드사이에배치하는중간전극을추가로포함하고, 상기중간전극은, 상기포토캐소드로부터사출한전자빔이통과하는전자빔 통과구멍을가지며, 상기전자빔 통과구멍에는, 전압의인가에의해상기포토캐소드와상기애노드사이에전계가형성되었을때에, 상기전계의영향을무시할수 있는드리프트스페이스가형성되어있는, 전자총에의해과제를해결할수 있다.

    ELECTRON GUN, ELECTRON BEAM APPLICATOR, AND EMISSION METHOD OF ELECTRON BEAM

    公开(公告)号:US20240212967A1

    公开(公告)日:2024-06-27

    申请号:US18556080

    申请日:2022-03-25

    Abstract: Provided is an electron gun that can have a setting to make it possible to irradiate a desired location on an irradiation target with an electron beam having a desired electron beam parameter by using only the component included in the electron gun. This object can be achieved by an electron gun including: a light source; a photocathode configured to generate releasable electrons in response to receiving light from the light source; an anode configured to generate an electric field between the photocathode and the anode, extract the releasable electrons by the generated electric field, and form an electron beam; and a control unit, and the control unit sets the number of emission times of the electron beam and sets an electron beam parameter for each emitting electron beam, or sets an emission duration of the electron beam and sets an electron beam parameter of an emitting electron beam in association with the emission duration.

    Electron gun, electron beam applicator, and method for controlling electron gun

    公开(公告)号:US12198889B2

    公开(公告)日:2025-01-14

    申请号:US17044850

    申请日:2020-05-08

    Abstract: The present disclosure addresses the problem of providing an electron gun that can directly monitor an intensity of an electron beam emitted from a photocathode using only the configuration provided to the electron gun, an electron beam applicator equipped with an electron gun, and a method for controlling an electron gun.
    The aforementioned problem can be solved by an electron gun comprising a light source, a photocathode that emits an electron beam in response to receiving light from the light source, an anode, an electron-beam-shielding member with which it is possible to shield part of the electron beam, and a measurement unit that measures the intensity of the electron beam emitted from the photocathode using a measurement electron beam shielded by the electron-beam-shielding member.

    Photocathode kit, electron gun, and electron beam applicator

    公开(公告)号:US12033827B2

    公开(公告)日:2024-07-09

    申请号:US17604368

    申请日:2020-07-31

    CPC classification number: H01J1/34 H01J37/073

    Abstract: Provided is a photocathode kit that does not require adjustment of the distance between a photocathode film and a lens focusing on the photocathode film when the photocathode and the lens are installed inside an electron gun. The photocathode kit includes: a photocathode including a substrate in which a photocathode film is formed on a first surface; a lens; and a holder that holds the substrate and the lens, and the holder has a retaining member that retains the photocathode film and the lens to be spaced apart by a predetermined distance, and a first communication path that communicates between inside of the holder and outside of the holder.

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