Abstract:
A polyol composition for use in the production of a rigid polyurethane foam by the spray process, and a method of producing said foam from said composition by said process. This composition is characterized by comprising a polyol based on an ethylene-diamine/alkylene oxide adduct, a blowing agent based on a halogenated hydrocarbon in an amount smaller than that used in the conventional production or a rigid polyurethane foam by the spray process, and a large amount of water. More specifically the polyol composition comprises a polyol containing at least 45 % by weight of a polyol based on an ethylenediamine/alkylene oxide adduct and having a mean hydroxyl value of 250 to 550, and a blowing agent comprising at most 45 % by weight of a blowing agent based on a low-boiling halogenated hydrocarbon and 1 to 6 parts by weight of water per 100 parts by weight of said polyol.
Abstract:
The invention provides peptide derivatives comprising synthetic cyclic peptides represented by formula (I), or salts thereof, wherein R represents an amino acid residue or an oligo- or polypeptide residue, and a pharmaceutical agent containing said derivative as an active ingredient and inhibiting adhesion of animal cells to a substrate. The peptide derivatives are stable to hydrolysis by enzymes, and the pharmaceutical agent is effective in inhibiting adhesion of animal cells to a substrate, depressing metastasis of cancer cells, and inhibiting agglutination of platelets.
Abstract:
Method for electrically isolating large area electrode bodies to facilitate cascade interconnection of semiconductor bodies which may be deposited afterwards includes applying a maskant in a preselected pattern onto a substrate, depositing a conformal layer of an electrically conductive electrode material atop the patterned maskant and removing the maskant and the electrode material deposited thereon by dissolving in a solvent which is substantially chemically inert with respect to subsequently deposited materials to expose at least portions of the substrate and electrically isolate the remaining portions of the electrode material so that selective electrical interconnections may be made between electrically isolated electrode portions. This method substantially eliminates the need for laser or mechanical scribing of semiconductor bodies on a large area substrate.
Abstract:
A method of bending a glass plate, comprising the steps of using a forming means, composed of roller groups comprising a plurality of rollers arranged above and below a transfer plane, along which a glass plate is transferred, to form by bending the glass plate interposed between the upper and lower rollers, transferring the glass plate while moving positions of the pluraltiy of rollers in the transfer direction in such a manner as to change an area where the glass plate is interposed between the upper and lower rollers, and bending the glass plate with a predetermined curvature, and an apparatus for use therein.
Abstract:
Molded articles produced by melt-molding fluorinated copolymer comprising 70 to 99.9 mole % of repeating units derived from CF2=CF2, 0.1 to 20 mole % of repeating units derived from CF2=CFO(CF2)3CH2OH, and 0 to 10 mole % of repeating units derived from CF2=CFO(CF2)2CF3 and subjecting the molded body thus obtained to heat treatment.
Abstract:
A double-glazed unit comprising at least two flat glasses arranged in such a manner that they face with each other across a spacing layer formed by resin spacers which are made of a thermoplastic resin composition comprising 50 to 98 wt.% of a butyl rubber and 2 to 50 wt.% of a crystalline polyolefin, each percentage being based on the total amount of the rubber and the polyolefin, and which exhibit a JIS A hardness of 10 to 90 at 25 DEG C.
Abstract:
A process for producing uniform and high-density composite sputtering targets composed of a high-melting substance and a low-melting metal, which comprises molding a mixture of a powder of a high-melting substance having a melting point of 900 DEG C or above with a powder of a low-melting metal having a melting point of 700 DEG C or below at a temperature below the melting point of the metal under heat and pressure. This process if freed from the problem of the conventional production processes comprising melting, hot pressing or atmospheric pressure sintering such that it has been impossible to produce uniform and high-density composite sputtering targets because of the compositional change due to different melting points of the components and the exudation of the low-melting metal as a result of melting thereof.
Abstract:
A difluoride derivative represented by the general formula: R -(A -Y )m-A -CF=CF-C=C-A -(Y -A )n-R , wherein A through A represent each trans-1,4-cyclohexylene, 1,4-cyclohexenylene or 1,4-phenylene; m and n represent each 0 or 1; and R and R represent each C1-C10 alkyl, halogen or cyano. The compound is lowly viscous and light-stable, and hence can provide a liquid crystal composition having high response speed.
Abstract:
A process for producing 3,3-dichloro-1,1,1,2,2-pentafluoropropane (R225ca) and 1,3-dichloro-1,1,2,2,3-pentafluoropropane (R225cb) from tetrafluoroethylene (C2F4) and dichlorofluoromethane (R21) in high yields at high selectivity, by greatly suppressing the formation of by-product impurities which are difficult to separate by an ordinary method, i.e., 2,2-dichloro-1,1,1,3,3-pentafluoropropane (R225aa) and 2,3-dichloro-1,1,1,2,3-pentafluoropropane (R225ba). This process is characterized by using either a catalyst comprising a halogenated oxide containing at least one element selected among those of the groups 4, 5 and 13, such as Ti, Zr, Hf, V, B and Ga, or a catalyst comprising a halogenated oxide containing at least one element selected among those of the groups 4, 5, and 13, such as Ti Zr, Hf, V, B, Al and Ga, and at least one element selected among those of the groups 2, 6, 12 and 14, such as Ba, W, Zn, Si, Bi and P.
Abstract:
A method for producing a dichloropentafluoropropane, which comprises reacting dichlorofluoromethane (R21) with tetrafluoroethylene (4F) in the presence of a Lewis acid catalyst for addition reaction to obtain dichloropentafluoropropane, wherein a halide containing at least one element selected from the group consisting of Sb, Nb, Ta, B, Ga, In, Zr, Hf and Ti, or AlBr3, or AlI3, is used as the Lewis acid.