公开(公告)号：US5290992A

公开(公告)日：1994-03-01

申请号：US957969

申请日：1992-10-07

Applicant: How T. Lin ,  Mark V. Pierson

Inventor： How T. Lin ,  Mark V. Pierson

IPC: B23K26/06 ,  B23K26/067 ,  G03F7/20

CPC classification number: B23K26/0673 ,  B23K26/066 ,  B23K26/067 ,  G03F7/2002 ,  G03F7/70291 ,  G03F7/70991

Abstract: The present invention is an apparatus and method for maximizing light beam utilization in patterning applications by positioning a plurality of mask mirrors in the light beam path to form patterned light onto a plurality of work pieces. Each mask mirror is designed so that a portion of the light beam area needed for exposing a work piece to patterned light is reflected from the mask mirror, while the remainder is passed through the mask mirror to another mask mirror. Alternatively, each mask mirror can be designed so that a portion of the light beam area needed for exposing a work piece to patterned light is passed through the mask mirror, while the remainder is reflected to another mask mirror.

Abstract translation: 本发明是一种用于通过在光束路径中定位多个掩模反射镜以在多个工件上形成图案化光来最大化图案化应用中的光束利用的装置和方法。 每个掩模镜被设计成使得用于将工件暴露于图案化光所需的光束区域的一部分从掩模反射镜反射，而其余部分通过掩模镜到另一个掩模反射镜。 或者，每个掩模反射镜可被设计成使得将工件暴露于图案化光所需的光束区域的一部分通过掩模反射镜，而剩余部分被反射到另一个掩模反射镜。