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    Method of making a composite membrane
    43.
    发明授权
    Method of making a composite membrane 有权
    制作复合膜的方法

    公开(公告)号：US07588796B2

    公开(公告)日：2009-09-15

    申请号：US11077652

    申请日：2005-03-11

    Applicant: Robert J. Klare ,  James DeYoung ,  James B. McClain

    Inventor： Robert J. Klare ,  James DeYoung ,  James B. McClain

    IPC: B05D7/22

    CPC classification number: B01D67/0088 ,  B01D71/36 ,  B01D2311/2623 ,  B01D2323/225 ,  B01D2323/28 ,  B01D2323/42 ,  B01D2325/12 ,  B01D2325/14 ,  B01D2325/16 ,  H01B1/122 ,  H01M8/1023 ,  H01M8/1025 ,  H01M8/1027 ,  H01M8/1032 ,  H01M8/1039 ,  H01M8/1053 ,  H01M8/106 ,  H01M2300/0082 ,  Y02P70/56

    Abstract: A method of making a composite membrane with ion exchange properties includes, in an exemplary embodiment, forming a porous membrane from a first material, dissolving a coating material in a fluid at supercritical conditions, and exposing the porous membrane to the coating material dissolved in the supercritical fluid. The method also includes precipitating a uniform coating of the coating material onto an exterior surface of the porous membrane by changing the supercritical conditions of the fluid to a non-supercritical condition, and applying an ion exchange material to the coated porous membrane so that the ion exchange material is in intimate contact with substantially all of the coated surfaces of the porous membrane.

    Abstract translation: 制造具有离子交换性质的复合膜的方法包括在一个示例性实施方案中，从第一材料形成多孔膜，在超临界条件下将涂料溶解在流体中，并将​​多孔膜暴露于溶解在 超临界流体 该方法还包括通过将流体的超临界条件改变为非超临界状态将涂层材料均匀地涂覆到多孔膜的外表面上，并将离子交换材料施加到涂覆的多孔膜上，使得离子 交换材料与多孔膜的基本上所有的涂覆表面紧密接触。

    Holder For Electrically Charging A Substrate During Coating
    44.
    发明申请
    Holder For Electrically Charging A Substrate During Coating 有权
    用于在涂层期间对基板进行充电的支架

    公开(公告)号：US20080095919A1

    公开(公告)日：2008-04-24

    申请号：US11877591

    申请日：2007-10-23

    Applicant: James B. McClain ,  Doug Taylor ,  Ed Dicklnson ,  Steve Worm

    Inventor： James B. McClain ,  Doug Taylor ,  Ed Dicklnson ,  Steve Worm

    IPC: A61L33/00 ,  B05B5/025

    CPC classification number: B05B5/0533 ,  A61L31/10 ,  B05B5/082 ,  B05B13/0207 ,  B05C13/025

    Abstract: A stent holder for mounting and electrically charging a stent during coating of the stent using dry particles, the particles comprising inert polymers, pharmaceutical or biological agents, is provided. An assembly for supporting and electrically charging a stent during the coating of the stent using dry particles, the particles comprising inert polymers, pharmaceutical or biological agents, is provided. A chamber for creating an electrical field around a stent and for supporting, electrically charging, and exposing the stent to dry particles, the particles comprising inert polymers, pharmaceutical or biological agents, is provided. A method for creating an electrical field around a stent and for supporting, electrically charging, and exposing the stent to dry particles comprising inert polymers, pharmaceutical or biological agents is provided.

    Abstract translation: 提供一种用于在使用干燥颗粒涂覆支架期间安装和充电支架的支架支架，所述颗粒包括惰性聚合物，药物或生物制剂。 提供了一种用于在使用干燥颗粒涂覆支架期间支撑和充电支架的组件，所述颗粒包含惰性聚合物，药物或生物制剂。 提供了一种用于在支架周围产生电场并用于支撑，充电并将支架暴露于干颗粒的腔室，包括惰性聚合物，药物或生物制剂的颗粒。 提供了一种用于在支架周围产生电场并用于支撑，充电和将支架暴露于包含惰性聚合物，药物或生物制剂的干燥颗粒的方法。

    Method and apparatus for cleaning substrates using liquid carbon dioxide
    46.
    发明授权
    Method and apparatus for cleaning substrates using liquid carbon dioxide 失效
    使用液态二氧化碳清洗基板的方法和设备

    公开(公告)号：US06763840B2

    公开(公告)日：2004-07-20

    申请号：US09953061

    申请日：2001-09-14

    Applicant: Joseph M. DeSimone ,  James P. DeYoung ,  James B. McClain

    Inventor： Joseph M. DeSimone ,  James P. DeYoung ,  James B. McClain

    IPC: B08B300

    CPC classification number: H01L21/67057 ,  B08B7/0021 ,  C11D7/02 ,  C11D11/0047 ,  H01L21/02063 ,  Y10S134/902

    Abstract: Methods for cleaning a microelectronic substrate in a cluster tool are described that include placing the substrate in a pressure chamber of a module in a cluster tool; pressurizing the pressure chamber; introducing liquid CO2 into the pressure chamber; cleaning the substrate in the pressure chamber; removing the liquid CO2 from the pressure chamber, depressurizing the pressure chamber, and removing the substrate from the pressure chamber. Apparatus for processing a microelectronic substrate are also disclosed that that include a transfer module, a first processing module that employs liquid carbon dioxide as a cleaning fluid coupled to the transfer module, a second processing module coupled to the transfer module, and a transfer mechanism coupled to the transfer module. The transfer mechanism is configured to move the substrate between the first processing module and the second processing module.

    Abstract translation: 描述了用于清洁簇工具中的微电子衬底的方法，其包括将衬底放置在组件工具的模块的压力室中; 对压力室加压; 将液体CO 2引入压力室中; 清洗压力室中的基板; 从压力室中除去液态二氧化碳，减压压力室，并从压力室中取出基板。 还公开了一种用于处理微电子衬底的装置，其包括转移模块，使用液态二氧化碳作为耦合到转移模块的清洁流体的第一处理模块，耦合到转移模块的第二处理模块，以及耦合到 到传输模块。 传送机构构造成在第一处理模块和第二处理模块之间移动衬底。

    Methods, apparatus and slurries for chemical mechanical planarization
    48.
    发明授权
    Methods, apparatus and slurries for chemical mechanical planarization 失效
    用于化学机械平面化的方法，设备和浆料

    公开(公告)号：US06743078B2

    公开(公告)日：2004-06-01

    申请号：US10447251

    申请日：2003-05-28

    Applicant: James B. McClain ,  Joseph M. DeSimone

    Inventor： James B. McClain ,  Joseph M. DeSimone

    IPC: B24B100

    CPC classification number: B24B57/02 ,  B24B37/042

    Abstract: Methods and apparatus for chemical mechanical planarization of an article such as a semiconductor wafer use polishing slurries including a carbon dioxide solvent or a carbon dioxide-philic composition. A carbon dioxide cleaning solvent step and apparatus may also be employed.

    Abstract translation: 用于诸如半导体晶片的物品的化学机械平面化的方法和装置使用包括二氧化碳溶剂或二氧化碳亲油性组合物的抛光浆料。 还可以使用二氧化碳清洗溶剂步骤和装置。

    Apparatus for conserving vapor in a carbon dioxide dry cleaning system
    50.
    发明授权
    Apparatus for conserving vapor in a carbon dioxide dry cleaning system 失效

    公开(公告)号：US06666050B2

    公开(公告)日：2003-12-23

    申请号：US10044382

    申请日：2002-01-11

    Applicant: David E. Brainard ,  James B. McClain ,  Michael E. Cole ,  Steve L. Worm

    Inventor： David E. Brainard ,  James B. McClain ,  Michael E. Cole ,  Steve L. Worm

    IPC: D06B2318

    CPC classification number: D06F43/08 ,  D06F43/007

    Abstract: A method for conserving carbon dioxide vapor in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution to clean articles, where the method includes removing carbon dioxide vapor from a wash tank to a vapor tank, storing the carbon dioxide vapor in the vapor tank; and charging the wash tank with carbon dioxide vapor from the vapor tank. The method may be performed as part of a wash cycle that includes filling the wash tank with cleaning solution, washing articles to be cleaned in the wash tank, and emptying the cleaning solution out of the wash tank. An apparatus may also be employed for conserving carbon dioxide vapor in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution to clean articles, where the apparatus includes a wash tank for contacting the articles to be cleaned with the liquid carbon dioxide cleaning solution, a working tank for storing liquid carbon dioxide cleaning solution, a vapor tank for storing carbon dioxide vapor, a first piping system providing fluid communication between the wash tank and the vapor tank, where the first piping system includes a first line and a first valve residing in the first line, and a second piping system providing fluid communication between the working tank and the wash tank. Methods and apparatus for collecting liquid carbon dioxide in a collecting tank are also provided.

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