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公开(公告)号：US10248027B2
公开(公告)日：2019-04-02
申请号：US15525610
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Raoul Maarten Simon Knops , Bob Streefkerk , Christiaan Louis Valentin , Jan Bernard Plechelmus Van Schoot , Wilhelmus Franciscus Johannes Simons , Leon Leonardus Franciscus Merkx , Robertus Johannes Marinus De Jongh , Roel Johannes Elisabeth Merry , Michael Frederik Ypma
IPC: G03F7/20
Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.
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公开(公告)号：US10175587B2
公开(公告)日：2019-01-08
申请号：US15100920
申请日：2014-11-21
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
Abstract: A control device configured to determine a primary first drive signal, based on a first error signal representing a difference between desired and measured positions of a first body, for driving a positioner driving the first body; determine a primary second drive signal, based on a second error signal representing a difference between desired and measured positions of a second body, for driving a positioner driving the second body; determine, based on the second error signal, a secondary first drive signal for driving the first body positioner; determine, based on the first error signal, a secondary second drive signal for driving the second body positioner; combine the primary and secondary first drive signals and combine the primary and secondary second drive signals; and output the combined first and second drive signals to the respective positioning devices.
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公开(公告)号：US11609503B2
公开(公告)日：2023-03-21
申请号：US17218420
申请日：2021-03-31
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US10921720B2
公开(公告)日：2021-02-16
申请号：US16606398
申请日：2018-03-28
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler
IPC: G03F7/20
Abstract: The invention relates to support structure, comprising: a first body; a second body; a first support having a first stiffness; a second support having a second stiffness, wherein the second body supports the first body at a first location via the first support, wherein the second body supports the first body at a second location via the second support; a position measurement system arranged to generate a deformation signal representative of a difference of deformation of the first body and the second body relative to each other; a first actuator to apply a force between the first body and the second body at or near the first location; a second actuator to apply a force between the first body and the second and body at or near the second location; wherein the support structure comprises a controller arranged to determine a deformation compensation signal on the basis of the first stiffness, the second stiffness and the deformation signal and to drive at least one of the first actuator and the second actuator on the basis of the deformation compensation signal to prevent or at least reduce deformation of the first body.
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公开(公告)号：US10578983B2
公开(公告)日：2020-03-03
申请号：US16062735
申请日：2016-11-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Björn Hubertus Maria Bukkems , Cornelius Adrianus Lambertus De Hoon , Maurice Willem Jozef Etiënne Wijckmans
IPC: G03F7/20
Abstract: A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.
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Patent Agency Ranking
46.发明授权公开(公告)号：US10416572B2
公开(公告)日：2019-09-17
申请号：US16321867
申请日：2017-06-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Wim Symens , Bas Jansen
Abstract: A positioning system including: a first body; a second body; and an actuator arranged between the first body and the second body to position the first body relative to the second body, wherein the actuator includes a first piezoelectric actuator and a second piezoelectric actuator arranged in series, wherein the first piezoelectric actuator has a first hysteresis, wherein the second piezoelectric actuator has a second hysteresis smaller than the first hysteresis, and wherein the second piezoelectric actuator has a positioning range at least equal to the first hysteresis.
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公开(公告)号：US20190171117A1
公开(公告)日：2019-06-06
申请号：US16263429
申请日：2019-01-31
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler
Abstract: A lithographic apparatus includes a patterning device support to support a patterning device, the patterning device system including a moveable structure movably arranged relative to an object, a patterning device holder movably arranged relative to the movable structure to hold the patterning device, an actuator to move the movable structure relative to the object, and an ultra short stroke actuator to move the patterning device holder with respect to the movable structure; a substrate support to hold a substrate; a projection system to project a patterned radiation beam onto a target portion of the substrate; a transmission image sensor for measuring a position of the patterned radiation beam downstream of the projection system; and a calibrator for determining a relationship between magnitude of an applied control signal to the ultra short stroke actuator and resulting change in position of the patterned radiation beam and/or patterning device holder and/or patterning device.
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公开(公告)号：US10310392B2
公开(公告)日：2019-06-04
申请号：US15776995
申请日：2016-11-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Johannes Petrus Martinus Bernardus Vermeulen , Engelbertus Antonius Fransiscus Van Der Pasch
IPC: G03F7/20
Abstract: A positioning device comprising an object table and a positioning module configured to position the object table. The positioning module comprises a first positioning module member configured to hold the object table, a second positioning module member configured to support the first positioning module member, and a support frame configured to support the second positioning module member. The positioning module also includes one or more actuators, a position measurement system configured to measure a position of the object table, and a control unit configured to control a position of the object table based on the measured position of the object table. The control unit is further configured to control a vertical position of the second position module member so as to maintain a top surface of the second positioning module member substantially parallel to a bottom surface of the first positioning module member.
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公开(公告)号：US10234774B2
公开(公告)日：2019-03-19
申请号：US15949057
申请日：2018-04-09
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler
Abstract: A lithographic apparatus includes a patterning device support to support a patterning device, the patterning device system including a moveable structure movably arranged relative to an object, a patterning device holder movably arranged relative to the movable structure to hold the patterning device, an actuator to move the movable structure relative to the object, and an ultra short stroke actuator to move the patterning device holder with respect to the movable structure; a substrate support to hold a substrate; a projection system to project a patterned radiation beam onto a target portion of the substrate; a transmission image sensor for measuring a position of the patterned radiation beam downstream of the projection system; and a calibrator for determining a relationship between magnitude of an applied control signal to the ultra short stroke actuator and resulting change in position of the patterned radiation beam and/or patterning device holder and/or patterning device.
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公开(公告)号：US10209634B2
公开(公告)日：2019-02-19
申请号：US15547713
申请日：2016-01-26
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Maurice Willem Jozef Etiënne Wijckmans , Engelbertus Antonius Fransiscus Van Der Pasch , Christiaan Alexander Hoogendam , Bernardus Antonius Johannes Luttikhuis
IPC: G03F7/20
Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.
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