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公开(公告)号：US12210294B2
公开(公告)日：2025-01-28
申请号：US17608760
申请日：2020-05-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Bas Jansen
Abstract: An actuator assembly including a first piezo actuator and a second piezo actuator. The piezo actuator has a correction unit configured to determine an output voltage difference representing a difference between a voltage at the output terminal of the first piezo actuator and a voltage at the output terminal of the second piezo actuator, and a first power correction for correcting the first power signal and/or a second power correction for correcting the second power signal, based on the output voltage difference.
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公开(公告)号：US12147167B2
公开(公告)日：2024-11-19
申请号：US15775602
申请日：2016-09-30
Applicant: ASML Netherlands B.V.
Inventor： Junichi Kanehara , Hans Butler , Paul Corné Henri De Wit , Engelbertus Antonius Fransiscus Van Der Pasch
Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.
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公开(公告)号：US11914308B2
公开(公告)日：2024-02-27
申请号：US18123620
申请日：2023-03-20
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/7085 , G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70808 , G03F9/70 , G03F9/7015 , G03F9/7019 , G03F9/7049 , G03F9/7084 , G03F9/7088 , G03F7/70633
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US11467505B2
公开(公告)日：2022-10-11
申请号：US16346727
申请日：2017-10-12
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20 , G03F9/00 , H01L21/027
Abstract: A lithographic apparatus (LA) applies a pattern to a substrate (W). The lithographic apparatus includes a height sensor (LS), a substrate positioning subsystem, and a controller configured for causing the height sensor to measure the height (h) of the substrate surface at locations across the substrate. The measured heights are used to control the focusing of one or more patterns applied to the substrate. The height h is measured relative to a reference height (zref). The height sensor is operable to vary the reference height (zref), which allows a wider effective range of operation. Specifications for control of the substrate height during measurement can be relaxed. The reference height can be varied by moving one or more optical elements (566, 572, 576, 504 and/or 512) within the height sensor, or moving the height sensor. An embodiment without moving parts includes a multi-element photodetector (1212).
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公开(公告)号：US11302512B2
公开(公告)日：2022-04-12
申请号：US16809519
申请日：2020-03-04
Applicant: ASML Netherlands B.V.
Inventor： Marcel Koenraad Marie Baggen , Antonius Henricus Arends , Lucas Kuindersma , Johannes Hubertus Antonius Van De Rijdt , Peter Paul Hempenius , Robertus Jacobus Theodorus Van Kempen , Niels Johannes Maria Bosch , Henricus Martinus Johannes Van De Groes , Kuo-Feng Tseng , Hans Butler , Michael Johannes Christiaan Ronde
IPC: H01J37/20
Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.
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Patent Agency Ranking
公开(公告)号：US10976675B2
公开(公告)日：2021-04-13
申请号：US16774035
申请日：2020-01-28
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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公开(公告)号：US10962891B2
公开(公告)日：2021-03-30
申请号：US16707525
申请日：2019-12-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Antonius Theodorus Anna Maria Derksen , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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8.发明授权公开(公告)号：US10955761B2
公开(公告)日：2021-03-23
申请号：US16482515
申请日：2018-01-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Maurice Willem Jozef Etiënne Wijckmans
Abstract: The present invention relates to a lithographic apparatus, comprising: a projection system configured to project a patterned radiation beam onto a substrate, comprising optical elements, a sensor frame, a first position measurement system configured to measure a position of an optical element relative to the sensor frame, comprising a sensor adapted to monitor an optical element, with a sensor element mounted to the sensor frame, a sensor frame support supporting the sensor frame on a reference, a force measurement device adapted to generate force measurement data relating to force exerted on the sensor frame by the sensor frame support, a position control device adapted to control the relative position of the substrate and the patterned radiation beam wherein the position control device is configured to receive the force measurement data and to control said relative position based on at least the force measurement data.
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公开(公告)号：US10816910B2
公开(公告)日：2020-10-27
申请号：US16079169
申请日：2017-02-03
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Cornelius Adrianus Lambertus De Hoon , Fransiscus Mathijs Jacobs , Pavel Kagan , Jeroen Pieter Starreveld , Maurice Willem Jozef Etienne Wijckmans
IPC: G03F7/20 , F16F9/02 , F16F15/023 , F16F13/00 , F16F15/027
Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator part arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.
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公开(公告)号：US10732511B2
公开(公告)日：2020-08-04
申请号：US16257955
申请日：2019-01-25
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Anton Bernhard Van Oosten , Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal
Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.
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