公开(公告)号：US20180073992A1

公开(公告)日：2018-03-15

申请号：US15683216

申请日：2017-08-22

Applicant: ASML Netherlands B.V.

Inventor： Peter Danny VAN VOORST ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Sietse Thijmen Van Der Post

IPC: G01N21/88 ,  G03F7/20

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2021/95676 ,  G03F7/70616 ,  G03F7/7065 ,  H05G2/00 ,  H05G2/008

Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

公开(公告)号：US20170322497A1

公开(公告)日：2017-11-09

申请号：US15585072

申请日：2017-05-02

Applicant: ASML Netherlands B.V.

Inventor： Nan LIN ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F7/20 ,  G21K5/04

CPC classification number: G03F7/70575 ,  G02F1/353 ,  G02F2001/354 ,  G02F2201/16 ,  G03F7/2004 ,  G03F7/70033 ,  G03F7/70625 ,  G03F7/70633 ,  G03F2007/2067 ,  G21K5/04 ,  H05G2/00

Abstract: An method for generating illuminating radiation in an illumination apparatus for use in an inspection apparatus for use in lithographic processes is described. A driving radiation beam is provided that comprises a plurality of radiation pulses. The beam is split into first and second pluralities of driving radiation pulses. Each plurality of driving radiation pulses has a controllable characteristic. The first and second pluralities may be used to generate an illuminating radiation beam with an output wavelength spectrum. The first and second controllable characteristics are controlled so as to control first and second portions respectively of the output wavelength spectrum of the illuminating radiation beam.

公开(公告)号：US20170255104A1

公开(公告)日：2017-09-07

申请号：US15444765

申请日：2017-02-28

Applicant: ASML Netherlands B.V.

Inventor： Alessandro POLO ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F7/20 ,  G01B11/27 ,  G01B11/30 ,  G03F9/00

CPC classification number: G03F9/7046 ,  G01B11/00 ,  G01B11/02 ,  G01B11/24 ,  G01B11/272 ,  G01B11/303 ,  G01B2210/56 ,  G01N21/9501 ,  G01N21/956 ,  G02B2207/129 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70775 ,  G03F7/7085 ,  G03F9/7069 ,  G03F9/7088

Abstract: Disclosed is a metrology apparatus and method for measuring a structure formed on a substrate by a lithographic process. The metrology apparatus comprises an illumination system operable to provide measurement radiation comprising a plurality of wavelengths; and a hyperspectral imager operable to obtain a hyperspectral representation of a measurement scene comprising the structure, or a part thereof, from scattered measurement radiation subsequent to the measurement radiation being scattered by the structure.

公开(公告)号：US12189314B2

公开(公告)日：2025-01-07

申请号：US18035008

申请日：2021-11-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Sebastianus Adrianus Goorden ,  Simon Gijsbert Josephus Mathijssen ,  Leendert Jan Karssemeijer ,  Manouk Rijpstra ,  Ralph Brinkhof ,  Kaustuve Bhattacharyya

IPC: G03F9/00 ,  G03F7/00

Abstract: A method for a metrology process, the method includes obtaining first measurement data relating to a first set of measurement conditions and determining a first measurement recipe based on the first measurement data. At least one performance indicator is determined from one or more components of the first measurement data obtained from a component analysis or statistical decomposition. Alternatively, at least one performance indicator is determined from a comparison of one or more first measurement values relating to the first measurement recipe and one or more second measurement values relating to a second measurement recipe, where second measurement recipe is different to the first measurement data and relates a second set of measurement conditions, the second set of measurement conditions being different to the first set of measurement conditions.

公开(公告)号：US12189305B2

公开(公告)日：2025-01-07

申请号：US18004555

申请日：2021-05-27

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus Mathijssen ,  Patricius Aloysius Jacobus Tinnemans ,  Arie Jeffrey Den Boef ,  Kaustuve Bhattacharyya ,  Samee Ur Rehman

IPC: G03F7/00 ,  G03F9/00

Abstract: Disclosed is a method of improving a measurement of a parameter of interest. The method comprises obtaining metrology data comprising a plurality of measured values of the parameter of interest, relating to one or more targets on a substrate, each measured value relating to a different measurement combination of a target of said one or more targets and a measurement condition used to measure that target and asymmetry metric data relating to asymmetry for said one or more targets. A respective relationship is determined for each of said measurement combinations relating a true value for the parameter of interest to the asymmetry metric data, based on an assumption that there is a common true value for the parameter of interest over said measurement combinations. These relationships are used to improve a measurement of the parameter of interest.

公开(公告)号：US10656533B2

公开(公告)日：2020-05-19

申请号：US16106322

申请日：2018-08-21

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus Mathijssen ,  Martin Jacobus Johan Jak ,  Kaustuve Bhattacharyya

IPC: G03F7/20 ,  G01N21/47

Abstract: An apparatus and method for estimating a parameter of a lithographic process and an apparatus and method for determining a relationship between a measure of quality of an estimate of a parameter of a lithographic process are provided. In the apparatus for estimating the parameter a processor is configured to determine a quality of the estimate of the parameter relating to the tested substrate based on a measure of feature asymmetry in the at least first features of the tested substrate and further based on a relationship determined for a plurality of corresponding at least first features of at least one further substrate representative of the tested substrate, the relationship being between a measure of quality of an estimate of the parameter relating to the at least one further substrate and a measure of feature asymmetry in the corresponding first features.

公开(公告)号：US10649344B2

公开(公告)日：2020-05-12

申请号：US15788258

申请日：2017-10-19

Applicant: ASML Netherlands B.V.

Inventor： Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F7/20 ,  G01N21/956 ,  H01S3/00 ,  G01N21/47 ,  G01N21/88 ,  G02F1/35 ,  H05G2/00 ,  G02B5/10

Abstract: Disclosed is an illumination source apparatus comprising a high harmonic generation medium, a pump radiation source and a spatial filter. The pump radiation source emits a beam of pump radiation having a profile comprising no pump radiation in a central region of the beam and excites the high harmonic generation medium so as to generate high harmonic radiation. The pump radiation and the generated high harmonic radiation are spatially separated beyond the focal plane of the beam of pump radiation. The spatial filter is located beyond a focal plane of the beam of pump radiation, and blocks the pump radiation. Also disclosed is a method of generating high harmonic measurement radiation optimized for filtration of pump radiation therefrom.

公开(公告)号：US10599047B2

公开(公告)日：2020-03-24

申请号：US15988677

申请日：2018-05-24

Applicant: ASML Netherlands B.V.

Inventor： Janneke Ravensbergen ,  Nitesh Pandey ,  Zili Zhou ,  Armand Eugene Albert Koolen ,  Sebastianus Adrianus Goorden ,  Bastiaan Onne Fagginger Auer ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G01N21/47 ,  G01B11/27

Abstract: A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.

公开(公告)号：US10530111B2

公开(公告)日：2020-01-07

申请号：US15903392

申请日：2018-02-23

Applicant: ASML Netherlands B.V.

Inventor： Sudhir Srivastava ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Nan Lin ,  Sjoerd Nicolaas Lambertus Donders ,  Krijn Frederik Bustraan ,  Petrus Wilhelmus Smorenburg ,  Gerrit Jacobus Hendrik Brussaard

IPC: G03F7/20 ,  H01S3/00 ,  H05G2/00 ,  G03F1/84 ,  G01N21/956 ,  G02F1/35 ,  G01N21/88

Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.

公开(公告)号：US10474039B2

公开(公告)日：2019-11-12

申请号：US15384084

申请日：2016-12-19

Applicant: ASML Netherlands B.V.

Inventor： Paul Christiaan Hinnen ,  Simon Gijsbert Josephus Mathijssen ,  Maikel Robert Goosen ,  Maurits Van Der Schaar ,  Arie Jeffrey Den Boef

IPC: G03B27/34 ,  G03F7/20

Abstract: A lithographic apparatus (LA) prints product features and at least one focus metrology pattern (T) on a substrate. The focus metrology pattern is defined by a reflective reticle and printing is performed using EUV radiation (404) incident at an oblique angle (θ). The focus metrology pattern comprises a periodic array of groups of first features (422). A spacing (S1) between adjacent groups of first features is much greater than a dimension (CD) of the first features within each group. Due to the oblique illumination, the printed first features become distorted and/or displaced as a function of focus error. Second features 424 may be provided as a reference against which displacement of the first features may be seen. Measurement of this distortion and/or displacement may be by measuring asymmetry as a property of the printed pattern. Measurement can be done at longer wavelengths, for example in the range 350-800 nm.