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    42.
    发明专利
    未知

    公开(公告)号：DE3709920A1

    公开(公告)日：1988-10-06

    申请号：DE3709920

    申请日：1987-03-26

    Applicant: BASF AG

    Inventor： SCHULZ GUENTHER DR ,  DRUSCHKE WOLFGANG DR ,  JAEGER HELMUT

    IPC: C09J175/00 ,  C08F283/00 ,  C08G18/08 ,  C08G18/10 ,  C08G18/66 ,  C08G18/67 ,  C09J175/16 ,  C09J3/16

    Abstract: Radiation-curable contact adhesives containing (A) oligomeric or polymeric reaction products of (a) diisocyanates, (b) polyesterols and/or polyetherols, (c) optionally C2-C50-diols, (d) C2-C20-hydroxyalkyl (meth)acrylates and (e) monohydroxyalkylcarboxylic acids in defined weight proportions and (e) monovinyl compounds in an amount of 2-90% by weight, based on A+B, produce contact adhesive layers of particularly high surface tackiness and particularly high cohesion.

    43.
    发明专利
    未知

    公开(公告)号：DE3541162A1

    公开(公告)日：1987-05-27

    申请号：DE3541162

    申请日：1985-11-21

    Applicant: BASF AG

    Inventor： HOFFMANN GERHARD DR ,  KOCH HORST DR ,  SCHULZ GUENTHER DR

    IPC: G03F7/032 ,  C08G65/32 ,  G03F7/00 ,  G03F7/033 ,  G03C1/68 ,  G03C1/71 ,  G03F7/10 ,  C08F261/02

    Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3). In addition to these components, the photosensitive recording layer (B) might contain further assistants or additives. The novel photosensitive recording material is especially well suited for the production of lithographic printing plates, resists and relief plates, in particular relief printing plates. The invention is furthermore related to a process for preparing the novel photosensitive recording material by polymerizing vinylesters in the presence of polyalkylene oxides to yield polyalkylene oxide - vinylester - graft copolymers, hydrolyzing or transesterifying said polyalkylene oxide - vinylester - graft copolymers to yield the said elastomeric graft copolymer (B1), mixing the said elastomeric graft copolymers (B1) with the other components of the photosensitive recording layer (B), and forming the said photosensitive recording layer (B) from the mixture consisting of its components on the dimensionally stable base (A).

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