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    1.
    发明专利
    未知

    公开(公告)号：AT107053T

    公开(公告)日：1994-06-15

    申请号：AT88110062

    申请日：1988-06-24

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR ,  BINDER HORST

    IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

    Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

    5.
    发明专利
    未知

    公开(公告)号：DE3781603D1

    公开(公告)日：1992-10-15

    申请号：DE3781603

    申请日：1987-06-19

    Applicant: BASF AG

    Inventor： BOETTCHER ANDREAS DR ,  HOFMANN REINER W- NEUSTADT DR ,  SCHUPP HANS DR

    IPC: C08F2/50 ,  G03F7/105

    Abstract: Photopolymerisable copying materials contain photopolymerisable olefinically unsatd. organic cpd(s). (I), opt. a polymeric binder (II), photopolymerisation initiator(s) (III), a colour-forming system (IV), which increases the colour intensity of the material on exposure to actinic light, a sensitiser (V) and opt. other additives. (IV) consists of a (practically) colourless organic cpd. (IVA), which can be oxidised to a coloured cpd., and a photo-oxidant (IVB) for (IVA). The novelty is that (IVB) is an acylphosphine oxide or acylphosphine sulphide cpd. with a max. long-wave absorption band below 500 nm. (IVB) can be prepd. by conventional methods.

    6.
    发明专利
    未知

    公开(公告)号：DE3861833D1

    公开(公告)日：1991-04-04

    申请号：DE3861833

    申请日：1988-06-24

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR

    IPC: C07D333/46 ,  C07C67/00 ,  C07C69/96 ,  C07C325/00 ,  C07C381/12 ,  C07F7/08 ,  C07F7/18 ,  C08F2/50 ,  C08F4/00 ,  C09D7/12 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031 ,  G03F7/26

    Abstract: Sulphonium salts of the formula … … in which R , R and R are identical to or different from one another and represent aliphatic and/or aromatic radicals which may contain heteroatoms, or two of the radicals R to R are linked to one another to form a ring, with the proviso that at least one of the radicals R to R contains at least one grouping cleavable by acid or one of the radicals R to R is linked to one or more further sulphonium salt radicals, if desired via groupings cleavable by acid, and X denotes a non-nucleophilic counterion… are suitable as photoinitiators for cationic polymerisation.

    7.
    发明专利
    未知

    公开(公告)号：DE3914375A1

    公开(公告)日：1990-11-15

    申请号：DE3914375

    申请日：1989-04-29

    Applicant: BASF AG

    Inventor： REHMER GERD DR ,  BOETTCHER ANDREAS DR

    IPC: C08F2/50 ,  C08F291/00 ,  C09D4/06 ,  C09J4/06 ,  C08F2/48

    Abstract: The UV-curable compositions are based on a binder preparation comprising (1) from 99.0 to 20% by weight of a copolymer, (2) from 1.0 to 80% by weight of monoolefinically unsaturated compounds and (3) from 0.0 to 20% by weight of olefinically polyunsaturated compounds and are characterised in that the copolymer (1) is obtainable by subjecting a mixture of (A) from 80 to 99.9% by weight of olefinically unsaturated monomers, (B) from 0 to 10% by weight of a copolymerisable olefinically unsaturated photoinitiator, and (C) from 0 to 10% by weight of a polymerisation-regulating photoinitiator to free-radical polymerisation, where the sum of (B) and (C) is at least 0.1% by weight and the stated percentages by weight are based on the sum of the weights of (A) + (B) + (C).

    10.
    发明专利
    未知

    公开(公告)号：DE3717037A1

    公开(公告)日：1988-12-08

    申请号：DE3717037

    申请日：1987-05-21

    Applicant: BASF AG

    Inventor： BOETTCHER ANDREAS DR ,  FISCHER MARTIN DR ,  ALDAG REINHARD DR ,  BLUEMEL THOMAS DR

    IPC: G03C1/00 ,  G03F7/031 ,  G03C1/72 ,  G03C1/68 ,  G03F7/10

    Abstract: Photopolymerizable recording materials suitable for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable olefinically unsaturated organic compounds, optionally a polymeric binder, one or more photopolymerization initiators, a color-forming system which on irradiation with actinic light causes an increase in the color intensity of the recording material, a sensitizer and optionally further additive and/or auxiliary substances, and contain as the color-forming system (a) one or more colorless or virtually colorless organic compounds which are oxidizable to colored compounds, and (b) a photooxidant for the colorless or virtually colorless organic compound(s) (a), wherein photooxidant (b) comprises an organic salt with a substituted or unsubstituted hetaromatic system, this hetaromatic system having one or more built-in groups of the general formula (I) (I) where R is substituted or unsubstituted alkenyl, alkynyl, hetaryl, alkoxycarbonyl, carbamoyl, alkylsulfonyl or arylsulfonylaminosulfinyl, substituted cycloalkyl or a substituted or unsubstituted hetaryl cation, with the proviso that the maximum of the long-wave absorption band of the salt is below 400 nm.

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