Abstract:
Polyethers (A), whose main chain essentially consists of repeating units of the formulae (1) and (2) in alternating order, are useful as an additive to a porous polymer membrane, or as the main polymer constituent of a porous polymer membrane, for stabilizing said membrane against detrimental effects of oxidizing agents and/or for improving the stability of a filtration module comprising said membrane against detrimental effects of oxidizing agents.
Abstract:
Membrane comprising a carrier and a rejection layer, wherein said membrane is a multiple channel membrane. The rejection layer is a polyamide layer. Process for making multiple channel membranes coated with a polyamide layer.
Abstract:
Block copolymer comprising polyarylene ether blocks and polyalkylene oxide blocks, wherein said block copolymer comprises at least two polyalkylene oxide blocks that are endcapped with different endcapping groups.
Abstract:
The invention relates to a method for preparing polyarylethersulfone-polyalkylene oxide block copolymers (PPC) comprising the polycondensation of a reaction mixture (RG) comprising the components: (A1) at least one aromatic dihalogen compound, (B1) at least one aromatic dihydroxyl compound, (B2) at least one polyalkylene oxide having at least two hydroxyl groups, (C) at least one aprotic polar solvent and (D) at least one metal carbonate, where the reaction mixture (RG) does not comprise any substance which forms an azeotrope with water.
Abstract:
Polymer membranes, especially as used for water filtration processes, are effectively stabilized against detrimental effects of acids, bases and/or oxidizing agents commonly used for chemically enhanced backwash by incorporation of an oligo- or polyurethane of the formula (I) wherein k and n independently are numbers from 1 to 100, m is from the range 0-100, (X) is a block of formula (II) and (Y) is a block of the formula (III), (A) is a residue of an aliphatic or aromatic diisocyanate linker, (B) is a residue of a linear oligo- or polysiloxane containing alkanol end groups, and optionally further containing one or more aliphatic ether moieties, and (C) is an aromatic oligo- or polysulfone block; or a mixture of such oligo- or polyurethanes.
Abstract:
The present invention relates to a process for the production of low-halogen-content polybiphenyl sulfone polymers, to the resultant polybiphenyl sulfone polymers, to polybiphenyl sulfone polymers having less than 400 ppm content of polymer-bonded halogen, to thermoplastic molding compositions comprising these polybiphenyl sulfone polymers, and to their use for the production of moldings, of fibers, of films, of membranes, or of foams.