LOW REFLECTANCE, ANTI-REFLECTIVE FILM STRUCTURES WITH CONTROLLED COLOR AND ARTICLES WITH THE SAME

    公开(公告)号:US20240045106A1

    公开(公告)日:2024-02-08

    申请号:US18378316

    申请日:2023-10-10

    CPC classification number: G02B1/11 G02B1/115

    Abstract: An article is described herein that includes: a translucent substrate having a major surface; and an anti-reflective coating disposed on the major surface and forming an anti-reflective surface. The article exhibits a single side average photopic light reflectance at the anti-reflective surface of less than 0.35%. Further, the article exhibits a single side color shift (ΔC) of less than 6 over an incident angle range from 0 degrees to 60 degrees incidence at the anti-reflective surface, wherein the anti-reflective coating comprises a physical thickness from about 50 nm to less than 500 nm. In addition, the anti-reflective coating comprises a plurality of layers that comprises at least one low refractive index layer and at least one high refractive index layer. Further, each high refractive index layer has a refractive index of greater than 2.0 and each low refractive index layer has a refractive index of less than 1.7.

    ARTICLES WITH THIN, DURABLE ANTI-REFLECTION COATINGS WITH EXTENDED INFRARED TRANSMISSION

    公开(公告)号:US20230010461A1

    公开(公告)日:2023-01-12

    申请号:US17852452

    申请日:2022-06-29

    Abstract: An article is described that includes: a substrate having opposing major surfaces; and an optical film structure in direct contact with a first major surface and comprising a physical thickness from ˜50 nm to less than 500 nm, high refractive index (RI) and low RI layers with a first low RI layer directly on the first major surface, and a capping low RI layer. The high and low RI layers total three (3) layers to nine (9) layers, wherein each low RI layer and the capping low RI layer comprises a silicon-containing oxide and each high RI layer comprises a silicon-containing nitride or oxynitride. The article exhibits a Berkovich maximum hardness of 8 GPa or greater measured over an indentation depth ≥˜50 nm. The article exhibits a two-side average transmittance >85% at infrared wavelengths from 840 to 860 nm and from 930 to 950 nm at 0° incidence.

    INORGANIC OXIDE ARTICLES WITH THIN, DURABLE ANTI-REFLECTIVE STRUCTURES

    公开(公告)号:US20200158917A1

    公开(公告)日:2020-05-21

    申请号:US16749513

    申请日:2020-01-22

    Abstract: An article that includes: an inorganic oxide substrate having opposing major surfaces; and an optical film structure disposed on a first major surface of the substrate, the optical film structure comprising one or more of a silicon-containing oxide, a silicon-containing nitride and a silicon-containing oxynitride and a physical thickness from about 50 nm to less than 500 nm. The article exhibits a hardness of 8 GPa or greater measured at an indentation depth of about 100 nm or a maximum hardness of 9 GPa or greater measured over an indentation depth range from about 100 nm to about 500 nm, the hardness and the maximum hardness measured by a Berkovich Indenter Hardness Test. Further, the article exhibits a single-side photopic average reflectance that is less than 1%.

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