公开(公告)号：ZA8208365B

公开(公告)日：1983-09-28

申请号：ZA8208365

申请日：1982-11-15

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS ,  VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56 ,  C25D

CPC classification number: C25D3/56 ,  C25D3/06

公开(公告)号：FI63785C

公开(公告)日：1983-08-10

申请号：FI781902

申请日：1978-06-14

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

公开(公告)号：GB2109817A

公开(公告)日：1983-06-08

申请号：GB8134779

申请日：1981-11-18

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  VIGAR JAMES MICHAEL LINFORD ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.

公开(公告)号：FI63785B

公开(公告)日：1983-04-29

申请号：FI781902

申请日：1978-06-14

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

公开(公告)号：DE2921749A1

公开(公告)日：1979-12-13

申请号：DE2921749

申请日：1979-05-29

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

公开(公告)号：GB2265325A

公开(公告)日：1993-09-29

申请号：GB9205832

申请日：1992-03-18

Applicant: IBM

Inventor： BANKS PETER MICHAEL ,  MORGAN WILLIAM MORRIS

IPC: B23K1/06 ,  B23K1/08 ,  B23K3/06 ,  B23K101/42 ,  H05K1/00 ,  H05K3/28 ,  H05K3/34

Abstract: Solder is applied to a circuit board 7 by dipping the board into a bath 1 of molten solder 3, the molten solder having a layer of oil 5 on top. The solder is dipped into the bath by rotating it along a path that is substantially coplanar with the circuit board. This is achieved by supporting the board on a carrier 9 which in turn is attached to a motor shaft 11.

公开(公告)号：DK151643C

公开(公告)日：1988-08-15

申请号：DK263878

申请日：1978-06-13

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56 ,  C25D3/04

公开(公告)号：DE3269232D1

公开(公告)日：1986-03-27

申请号：DE3269232

申请日：1982-11-11

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS ,  VIGAR JAMES MICHAEL LINFORD

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.

公开(公告)号：GB2109817B

公开(公告)日：1985-07-03

申请号：GB8134779

申请日：1981-11-18

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  VIGAR JAMES MICHAEL LINFORD ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56

Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.

公开(公告)号：CH641213A5

公开(公告)日：1984-02-15

申请号：CH518878

申请日：1978-05-12

Applicant: IBM

Inventor： BARCLAY DONALD JOHN ,  MORGAN WILLIAM MORRIS

IPC: C25D3/06 ,  C25D3/10 ,  C25D3/56