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公开(公告)号：FI65286C
公开(公告)日：1984-04-10
申请号：FI824259
申请日：1982-12-10
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , VIGAR JAMES MICHAEL LINFORD
IPC: C25D20060101 , C25D3/06
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公开(公告)号：ZA828366B
公开(公告)日：1983-09-28
申请号：ZA828366
申请日：1982-11-15
Applicant: IBM
Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.
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Patent Agency Ranking
公开(公告)号：FI63263C
公开(公告)日：1983-05-10
申请号：FI793514
申请日：1979-11-09
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , VIGAR JAMES MICHAEL LINFORD
Abstract: A very low concentration (below 0.03 M) trivalent chromium plating bath in which the source of chromium is an equilibrated aqueous solution of a chromium (III) - thiocyanate complex gives a deposit of unexpectedly light color. Such a bath is employed to produce thin overcoatings of light colored chromium for decorative applications. The bath and process is also used to plate the initial layer of a thick (greater than 5 micron) deposit for engineering applications, the major part of which is plated from a higher chromium concentration bath. Such thick deposits from a higher concentration bath are more cohesive and smoother when plated over an initial layer from the low concentration bath.
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公开(公告)号：FI63263B
公开(公告)日：1983-01-31
申请号：FI793514
申请日：1979-11-09
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , VIGAR JAMES MICHAEL LINFORD
Abstract: A very low concentration (below 0.03 M) trivalent chromium plating bath in which the source of chromium is an equilibrated aqueous solution of a chromium (III) - thiocyanate complex gives a deposit of unexpectedly light color. Such a bath is employed to produce thin overcoatings of light colored chromium for decorative applications. The bath and process is also used to plate the initial layer of a thick (greater than 5 micron) deposit for engineering applications, the major part of which is plated from a higher chromium concentration bath. Such thick deposits from a higher concentration bath are more cohesive and smoother when plated over an initial layer from the low concentration bath.
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公开(公告)号：FI824259A0
公开(公告)日：1982-12-10
申请号：FI824259
申请日：1982-12-10
Applicant: IBM
Inventor： BARCLAY DONALD JOHN , VIGAR JAMES MICHAEL LINFORD
IPC: C25D20060101 , C25D3/06 , C25D
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公开(公告)号：FI802060A
公开(公告)日：1980-12-30
申请号：FI802060
申请日：1980-06-27
Applicant: IBM
Inventor： VIGAR JAMES MICHAEL LINFORD
Abstract: A process for plating thick chromium coatings for engineering applications comprises depositing a thin initial layer from a low concentration chromium III/thiocyanate bath and depositing the bulk of the remaining thickness from a relatively higher concentration chromium III/thiocyanate bath. Deposits produced by this two-stage process are more cohesive and smoother than those obtainable by plating the entire thickness from the high concentration bath alone.
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公开(公告)号：DE2233453A1
公开(公告)日：1973-02-22
申请号：DE2233453
申请日：1972-07-07
Applicant: IBM
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