公开(公告)号：ES2445397T3

公开(公告)日：2014-03-03

申请号：ES08717297

申请日：2008-02-29

Applicant: OERLIKON TRADING AG

Inventor： RAMM JUERGEN ,  WOHLRAB CHRISTIAN

IPC: H01J37/32 ,  C23C14/00 ,  C23C14/08 ,  C23C14/32

Abstract: Procedimiento para el funcionamiento de una fuente de arco, cebando, respectivamente haciendo funcionar unadescarga eléctrica de chispa sobre la superficie de un blanco (5) y alimentando al mismo tiempo la descarga de chispacon una corriente continua a la que se asigna una tensión (DV) continua así como con una corriente pulsatoria aplicadaperiódicamente, caracterizado porque se genera una señal (21) de tensión pulsada con una tensión (PV) del impulso ycon una longitud (Tp) del impulso de varios microsegundos.

公开(公告)号：CA2601722C

公开(公告)日：2014-02-25

申请号：CA2601722

申请日：2006-01-19

Applicant: OERLIKON TRADING AG

Inventor： RAMM JUERGEN ,  WIDRIG BENO ,  KALSS WOLFGANG

IPC: C23C14/32 ,  C23C14/28 ,  H01J37/32

Abstract: The invention relates to a hard material layer, deposited on a workpiece (30) as a functional layer (32) by means of an arc-PVD method. Said layer is essentially embodied by an electrically insulating oxide of at least one of the metals (Me) of the transition metals of the sub-groups IV, V, VI of the periodic table and Al, Si, Fe, Co, Ni, Co, or Y and the functional layer (32) contains no noble gas or halogen.

公开(公告)号：BRPI0914364A2

公开(公告)日：2014-02-04

申请号：BRPI0914364

申请日：2009-10-27

Applicant: OERLIKON TRADING AG

Inventor： RUDIGIER HELMUT ,  RAMM JUERGEN ,  WIDRIG BENO ,  VOM BRAUCKE TROY

IPC: C23C14/02 ,  C23C14/32

Abstract: The method for the surface treatment of work pieces in a vacuum treatment system having a first electrode that is designed as metallic target partially and temporally deposited on the work pieces and is part of an arc evaporation source and a second electrode that is designed as work piece holder and forms a bias electrode together with the work pieces, comprises operating a spark over the first electrode with spark flow (CC), by which material from the target is evaporated, and applying a bias voltage to the bias electrode by a voltage source in accordance to the spark flow. The method for the surface treatment of work pieces in a vacuum treatment system having a first electrode that is designed as metallic target partially and temporally deposited on the work pieces and is part of an arc evaporation source and a second electrode that is designed as work piece holder and forms a bias electrode together with the work pieces, comprises operating a spark over the first electrode with spark flow (CC), by which material from the target is evaporated, and applying a bias voltage to the bias electrode by a voltage source in accordance to the spark flow such that no material build-up takes place in net terms on the surface. The first electrode is operated with pulsed current, where a substrate current increased against the unpulsed operation is generated by the pulses through the workpiece surface and no material build-up takes place in net terms on the surface during opposite unpulsed operation of the first electrode with low bias voltage. The substrate bias voltage is operated in a pulsed manner. The actual pulse frequency of the substrate bias voltage is an integral multiple of the pulse frequency of the spark flow. The pulses of the bias voltage are phase shifted against the spark flow at a time interval, which corresponds to the average flight time of the ions from the target to the substrate. A hard metal is used as a substrate, where the substrate surface is a cutting edge and an indexable cutting insert. The target material and/or optionally reaction gas chemically react with material components of the substrate and form stable components. The metallic target contains carbon substrate and conducts the chemical reaction for the formation of carbides. The pulses of the spark flow are selected, so that the current rise valves are 10000 A/ms. The averaged substrate ion current rise related to the material evaporated at the target results more than 30% for spark flow equally averaged in time. The zero growth and/or rates of smaller than 5 nm/s are achieved at the substrate. The surface treatment is carried out above the spark target with and without blends. The pulse steepness is larger than 1000 A/ms and the pulse frequency is larger than 1000 Hz. The resultant of the formation of the chemical connections is detectable in the substrate surface between the target material and reactive gas on one side and substrate material on other side. The process is carried out in the reactive gas without layer formation.

公开(公告)号：SG193819A1

公开(公告)日：2013-10-30

申请号：SG2013064290

申请日：2006-03-01

Applicant: OERLIKON TRADING AG

Inventor： RAMM JUERGEN ,  GSTOEHL OLIVER ,  WIDRIG BENO ,  LENDI DANIEL

Abstract: - --METHOD FOR OPERATING A PULSED ARC SOURCE Abstract5 ire invention. relates to an arc method foP deposit ing Hr sulating layers and to an arc, ppathod for low temprature coat nq . To this end, an electrical spark felH scharde, which s gnited or operated on a surface of a tardet (5) of an arc source, is simultaneously10 supplied with a /ti.r2ct current ap well ap with pulsed or alternating current . The invention also relates to an arc source in which the target (5) is connected to a power supply unit (13) that comprises either at least one firTt c;,d hH ph-current. supply (18, 18' ) and15 another power supply (13' , 18" or is a. power supply(21, 21', 22) de s ioned with combinational cf rcu if technology.Fig 2

公开(公告)号：RU2466828C2

公开(公告)日：2012-11-20

申请号：RU2009146546

申请日：2008-05-05

Applicant: OERLIKON TRADING AG

Inventor： QUINTO DENNIS ,  WOHLRAB CHRISTIAN ,  RAMM JUERGEN

IPC: B23B27/14 ,  C23C30/00

Abstract: Изобретениеотноситсяк режущиминструментамс покрытием. Режущийинструментсодержитспеченноетелоизцементированногокарбида, кубическогонитридабора, металлокерамикииликерамикис режущейкромкойс радиусом Re, боковойи переднейповерхностьюи однослойноеилимногослойное PVD-покрытие, покрывающеепоменьшеймеречастьповерхностиспеченноготелаи содержащеепоменьшеймереодиноксидныйслой, нанесенныйкатодно-дуговымосаждениеми покрывающий, поменьшеймере, частьповерхностиспеченноготела. Приэтомрадиускромки Re меньше 40 мкм, предпочтительноменьшеилиравен 30 мкм. Техническийрезультатзаключаетсяв сочетанииудовлетворительнойизносостойкостии термохимическойстойкости, атакжев сопротивлениик скалываниюкраеврежущегоинструмента. 28 з.п. ф-лы, 6 табл.

公开(公告)号：DE102011016681A1

公开(公告)日：2012-10-11

申请号：DE102011016681

申请日：2011-04-11

Applicant: OERLIKON TRADING AG

Inventor： RAMM JUERGEN ,  WIDRIG BENO ,  RUHM KURT

IPC: H01J37/32

Abstract: Die Erfindung bezieht sich auf ein Verfahren zum Betreiben einer gepulsten diskontinuierlichen Funkenentladung. Der Funken wird über einen Kondensator gespiesen. Es gibt zwischen den Pulsen abgeschaltete Zeitintervalle, während denen kein Funkenstrom fliesst. Innerhalb der Pulse, also während der zugeschalteten Zeitintervalle wird die Ladungszufuhr bei erreichen einer Stromschwelle abgestellt und erneut angestellt, so dass es zu Subpulsen innerhalb der Pulse kommt. Die Zeitintervalle und Subpulse sind erfindungsgemäss so gewählt, dass bei erneutem Zuschalten des Kondensators die Funkenentladung ohne weiteres erneut zündet.

公开(公告)号：CA2791197A1

公开(公告)日：2011-09-01

申请号：CA2791197

申请日：2011-02-10

Applicant: OERLIKON TRADING AG

Inventor： RAMM JUERGEN ,  WIDRIG BENNO

IPC: C23C14/00 ,  C23C14/08 ,  C23C14/32

Abstract: This application relates to the reactive cathodic arc evaporation of the composite Al-Cr targets and the nucleation and phase formation of the synthesized Al-Cr-O layers. The oxygen partial pressure and the pulsed operation of the arc current influence the formation of intermetallic phases and solid solutions at the target surface. The nucleation of the ternary oxides at the substrate site appears to be, to some extent, controllable by the intermetallics or solid solutions formed at the target surface. A specific nucleation process at substrate site can therefore be induced by the free choice of target composition in combination with the partial pressure of the oxygen reactive gas. It also allows the control over the oxide island growth at the target surface which occurs occasionally at higher oxygen partial pressure. This is supported by the X-ray diffraction analysis of the layers as well as of the target surface.

公开(公告)号：MX2011005039A

公开(公告)日：2011-06-17

申请号：MX2011005039

申请日：2009-10-27

Applicant: OERLIKON TRADING AG

Inventor： RUDIGIER HELMUT ,  RAMM JUERGEN ,  WIDRIG BENO ,  VOM BRAUCKE TROY

IPC: C23C14/02 ,  C23C14/32

Abstract: La invención se refiere a un método para el tratamiento de la superficie de piezas de trabajo en un sistema de tratamiento al vacío, que comprende un primer electrodo que se diseña como blanco y que es parte de una fuente de evaporación por arco, en donde por vía del primer electrodo se opera un arco con corriente de arco mediante el cual se evapora material del blanco que se deposita al menos parcialmente y al menos temporalmente sobre las piezas de trabajo, y que comprende además un segundo electrodo diseñado como una sujeción de la pieza de trabajo y que en común con las piezas de trabajo constituye un electrodo de polarización, siendo que al electrodo de polarización se aplica una tensión de polarización por medio de una fuente de tensión, siendo que la tensión de polarización se aplica en sincronización con la corriente de arco de manera que en términos netos sustancialmente no tiene lugar una síntesis de material sobre la superficie.

公开(公告)号：MX2010011502A

公开(公告)日：2010-11-30

申请号：MX2010011502

申请日：2009-02-06

Applicant: OERLIKON TRADING AG

Inventor： WIDRIG BENO ,  RAMM JUERGEN

IPC: C23C14/00 ,  C23C14/08 ,  C23C14/32 ,  C23C14/34

Abstract: La invención se relaciona con un método para producir capas de óxido por medio de PVD (deposición física de vapor), en particular por medio de evaporación de arco catódico, en donde se vaporiza un blanco de polvo metalúrgico y el blanco de polvo metalúrgico se elabora de por lo menos dos constituyentes metálicos o semimetálicos, en donde la composición de los constituyentes metálicos o semimetálicos o del blanco se selecciona de modo que durante el calentamiento en la transición de la temperatura ambiente a la fase líquida, no se cruzan límites de fase de las fases puramente sólidas con respecto al diagrama de fases de una mezcla fundida de por lo menos dos componentes metálicos o semi-metálicos.

公开(公告)号：CA2722520A1

公开(公告)日：2009-10-29

申请号：CA2722520

申请日：2009-02-06

Applicant: OERLIKON TRADING AG

Inventor： RAMM JUERGEN

IPC: C23C14/32 ,  C23C14/08

Abstract: The invention relates to a method for producing layers comprising ternary and higher oxides of metal and semimetal constituents, wherein the temperature of generation of said oxides is established substantially above the composition of the binary (or higher) alloying targets (based on the phase diagram).