Method for pretreating substrate for pvd methods
    1.
    发明专利
    Method for pretreating substrate for pvd methods 审中-公开
    PVD方法预处理衬底的方法

    公开(公告)号:JP2012177198A

    公开(公告)日:2012-09-13

    申请号:JP2012090972

    申请日:2012-04-12

    Abstract: PROBLEM TO BE SOLVED: To solve an economic problem that can be used for a manufacturing system based on an arc vaporization source.SOLUTION: The invention relates to a method for surface treatment of work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of the arc vaporization source; by means of the first electrode, an arc is operated with an arc current and vaporizes material from the target that is deposited at least partially and intermittently onto the work pieces and having a second electrode that is embodied as a work piece holder and, together with the work pieces, constitutes a bias electrode; by means of a voltage supply, a bias voltage is applied to the bias electrode, with the bias voltage applied so that it is matched to the arc current such that essentially, no material build-up takes place on the surface.

    Abstract translation: 要解决的问题:为了解决可用于基于电弧蒸发源的制造系统的经济问题。 解决方案:本发明涉及一种真空处理系统中的工件的表面处理方法,该真空处理系统具有实施为目标的第一电极,该第一电极是电弧蒸发源的一部分; 借助于第一电极,电弧通过电弧电流工作并将来自目标的材料从至少部分地和间歇地沉积到工件上并具有被实施为工件保持器的第二电极,并与 工件构成偏置电极; 借助于电压源,偏置电压施加偏置电压,施加偏置电压使其与电弧电流相匹配,从而基本上在表面上不发生材料积聚。 版权所有(C)2012,JPO&INPIT

    CARBON SPARK EVAPORATION
    3.
    发明申请
    CARBON SPARK EVAPORATION 审中-公开
    碳无线电扩展

    公开(公告)号:WO2012139707A8

    公开(公告)日:2013-11-28

    申请号:PCT/EP2012001322

    申请日:2012-03-26

    Abstract: The invention relates to a method for operating a pulsed discontinuous spark discharge. The spark is fed via a capacitor. Between the pulses there are switched-off time intervals during which no spark current flows. Within the pulses, that is to say during the switched-on time intervals, the supply of charge is stopped upon a current threshold being reached and is restarted, with the result that subpulses occur within the pulses. The time intervals and subpulses are chosen according to the invention such that when the capacitor is switched on again, the spark discharge readily ignites again.

    Abstract translation: 本发明涉及一种操作脉冲间歇火花放电的方法。 火花通过电容器供给。 有在这期间流过无火花电流脉冲的时间间隔之间关闭。 内的脉冲,在期间被激活的时间间隔即在电荷供给将实现电流阈值断开并再次接通,从而将有脉冲内的子脉冲。 的时间间隔和子脉冲被创造性地选择,使得当所述电容器的一个新的连接时,火花放电再次容易点燃。

    ARC PVD COATING WITH ENHANCED REDUCING FRICTION AND REDUCING WEAR PROPERTIES
    4.
    发明申请
    ARC PVD COATING WITH ENHANCED REDUCING FRICTION AND REDUCING WEAR PROPERTIES 审中-公开
    ARC PVD涂层,具有增强的摩擦力和减少磨损特性

    公开(公告)号:WO2014032753A1

    公开(公告)日:2014-03-06

    申请号:PCT/EP2013002217

    申请日:2013-07-25

    Abstract: The present invention relates to a oated body comprising a body (1) with a body surface (3) and a coating system (20) deposited on at least a portion of the body surface (3), said coating system (20) comprising at least one hard friction reducing coating deposited as an outermost layer (9) which exhibits droplets (10) at its surface, characterized in that said outermost layer (9) comprises molybdenum copper nitride and/or molybdenum nitride and copper nitride, and at least some of the droplets (10) consist mainly of copper, preferably most of the largest droplets (10) consist mainly of copper.

    Abstract translation: 本发明涉及一种包括具有主体表面(3)的本体(1)和沉积在体表(3)的至少一部分上的涂层系统(20)的浇注体,所述涂覆系统(20)包括: 沉积作为其表面具有液滴(10)的最外层(9)的至少一个硬摩擦减小涂层,其特征在于,所述最外层(9)包括钼酸铜和/或氮化钼和氮化铜,以及至少一些 的液滴(10)主要由铜组成,优选大部分最大的液滴(10)主要由铜组成。

    COATING WITH ENHANCED SLIDING PROPERTIES
    5.
    发明申请
    COATING WITH ENHANCED SLIDING PROPERTIES 审中-公开
    涂层具有增强的滑动性能

    公开(公告)号:WO2013135364A3

    公开(公告)日:2013-12-05

    申请号:PCT/EP2013000711

    申请日:2013-03-11

    Abstract: The present invention relates to coated sliding parts having coating systems which allow better sliding performance under dry and/or under lubricated conditions. The coating systems according to the present invention being characterized by having an outermost layer which - is a smooth oxide-containing layer in case of sliding applications under lubricated conditions, or - is a self-lubricated layer comprising molybdenum nitride, in case of sliding applications under dry or lubricated conditions. is a self-lubricated layer with a structured surface comprising a multitude of essentially circular recesses with diameters of several micrometers or below, the recesses randomly distributed over the surface.

    Abstract translation: 本发明涉及具有涂层系统的涂层滑动部件,所述涂层系统在干燥和/或润滑条件下允许更好的滑动性能。 根据本发明的涂层体系的特征在于具有最外层 - 在润滑条件下滑动应用的情况下为光滑的含氧化物层,或者 - 在滑动应用情况下为包含氮化钼的自润滑层 在干燥或润滑的条件下。 是具有结构化表面的自润滑层,所述结构化表面包括多个直径为几微米或更小的基本圆形的凹部,所述凹部随机分布在所述表面上。

    CUTTING TOOL
    6.
    发明申请
    CUTTING TOOL 审中-公开
    切割用具

    公开(公告)号:WO2008138789A2

    公开(公告)日:2008-11-20

    申请号:PCT/EP2008055455

    申请日:2008-05-05

    Abstract: The invention provides a single or a multilayer PVD coated sharp edged cutting tool, which can at the same time exhibit satisfactory wear and thermochemical resistance as well as resistance to edge chipping. The cutting tool comprises a sintered body made of a cemented carbide, a CBN, a cermet or a ceramic material having a cutting edge with an edge radius Re, a flank and a rake face and a multilayer coating consisting of a PVD coating comprising at least one oxidic PVD layer covering at least parts of the surface of the sintered body. In one embodiment the edge radius Re is smaller than 40 µm, preferably smaller than or equal to 30 µm. The covered parts of the surface preferably comprise at least some parts of the sharp edge of the sintered body.

    Abstract translation: 本发明提供了一种单层或多层PVD涂层的锐边切割工具,同时可以显示令人满意的耐磨性和耐热化学性以及耐边缘切屑。 切削工具包括由硬质合金,CBN,金属陶瓷或陶瓷材料制成的烧结体,其具有边缘半径为Re的切削刃,侧面和前刀面以及由PVD涂层组成的多层涂层,所述PVD涂层至少包括 一个氧化PVD层覆盖烧结体表面的至少部分。 在一个实施例中,边缘半径Re小于40μm,优选小于或等于30μm。 表面的被覆盖部分优选地包括烧结体的锋利边缘的至少一些部分。

    METHOD FOR REMOVING HARD CARBON LAYERS
    7.
    发明申请
    METHOD FOR REMOVING HARD CARBON LAYERS 审中-公开
    去层用于硬质涂层

    公开(公告)号:WO2012167886A8

    公开(公告)日:2014-01-23

    申请号:PCT/EP2012002305

    申请日:2012-05-31

    CPC classification number: C23G5/00

    Abstract: The invention relates to a method for removing carbon layers, in particular ta-C layers, from substrate surfaces of tools and components. The substrate to be de-coated is accordingly arranged on a substrate support in a vacuum chamber, the vacuum chamber is charged with at least one reactive gas assisting the evacuation of carbon in gaseous form and a low-voltage plasma discharge is created in the vacuum chamber to activate the reactive gas and hence assist the required chemical reaction or reactions to de-coat the coated substrate. The low-voltage plasma discharge is a dc low-volt arc discharge, the substrate surfaces to be de-coated are bombarded substantially exclusively with electrons and oxygen, nitrogen and hydrogen are used as reactive gas.

    Abstract translation: 一种用于汽提的碳层,特别是工具和组件基板表面的TA-C层的方法。 的被剥离基板被相应配置的基板支架上在真空室中,真空室中的至少一种加入气态形式支持反应气体中去除碳和低电压等离子放电在所述真空室的反应气体的激发,并因此支持所需的化学反应或 创建用于经涂覆的基材的剥离反应。 低压等离子体放电为直流低电压电弧放电,与电子轰击被剥离仅基底表面并基本上作为反应气体,氧,氮和氢被使用。

    METHOD FOR PRODUCING CUBIC ZIRCONIA LAYERS
    8.
    发明申请
    METHOD FOR PRODUCING CUBIC ZIRCONIA LAYERS 审中-公开
    用于生产立方氧化锆层

    公开(公告)号:WO2011036246A3

    公开(公告)日:2011-06-16

    申请号:PCT/EP2010064136

    申请日:2010-09-24

    Abstract: In order to produce zirconia-based layers on a deposition substrate, wherein reactive spark deposition using pulsed spark current and/or the application of a magnetic field that is perpendicular to the spark target are employed, a mixed target comprising elemental zirconium and at least one stabilizer is used, or a zirconium target comprising elemental zirconium is used, wherein in addition to oxygen, nitrogen is used as the reactive gas. As an alternative, it is also possible, combined with the use of the mixed target, to use nitrogen as the reactive gas in addition to oxygen.

    Abstract translation: 用于在沉积基底上生产氧化锆类层,其中反应性电弧蒸镀脉冲正常的电弧电流和/或应用到无线电目标磁场,一个元素锆和至少一种稳定剂的综合混合靶使用或元素锆,其中的一个Zirkoniumtarget 然后用氧气,氮气作为反应性气体一起使用。 可替代地,通过使用混合靶的组合,也可用于除氧气,氮气作为反应性气体。

    PERMEATION BARRIER LAYER
    10.
    发明申请
    PERMEATION BARRIER LAYER 审中-公开
    渗透障碍层

    公开(公告)号:WO2009092816A2

    公开(公告)日:2009-07-30

    申请号:PCT/EP2009050820

    申请日:2009-01-26

    Inventor: RAMM JUERGEN

    Abstract: The method for manufacturing a hydrogen permeation barrier comprises the steps of a) depositing on a substrate (SUB) a layer system (LS) comprising at least one layer (L1,L2,L3); characterized in that step a) comprises the step of b) depositing at least one hydrogen barrier layer (HPBL) comprising an at least ternary oxide. The apparatus comprises a sealable volume and a wall forming at least a portion of a boundary limiting said volume, wherein said wall comprises a hydrogen permeation barrier comprising a layer system (LS) comprising at least one layer, wherein said layer system comprises at least one hydrogen barrier layer (HPBL) comprising an at least ternary oxide. Preferably, said at least ternary oxide is substantially composed of Al, Cr and 0, and said depositing said at least one hydrogen barrier layer (HPBL) is carried out using a physical vapor deposition method, in particular a cathodic arc evaporation method. Preferably, step a) comprises depositing on said substrate at least one of : an adhesion layer (AdhL), a hydrogen storage layer (HStL), a protective layer (ProtL), in particular a thermal barrier layer (ThBL), a diffusion barrier layer (DBL), an oxidation barrier layer (OxBL), a chemical barrier layer (ChBL), a wear resistance layer (WRL). Excellent hydrogen permeation barrier properties can be achieved, and the layer system can be tailored as required by an envisaged application.

    Abstract translation: 用于制造氢渗透阻挡层的方法包括以下步骤:a)在衬底(SUB)上沉积包括至少一层(L1,L2,L3)的层系统(LS); 其特征在于步骤a)包括以下步骤:b)沉积包含至少三元氧化物的至少一个氢阻挡层(HPBL)。 该装置包括可密封体积和形成限制所述体积的边界的至少一部分的壁,其中所述壁包括氢渗透屏障,其包括包含至少一层的层系统(LS),其中所述层系统包括至少一个 包含至少三元氧化物的氢阻挡层(HPBL)。 优选地,所述至少三元氧化物基本上由Al,Cr和O组成,并且所述沉积所述至少一个氢阻挡层(HPBL)是使用物理气相沉积法,特别是阴极电弧蒸发法进行的。 优选地,步骤a)包括在所述衬底上沉积以下至少一种:粘合层(AdhL),储氢层(HStL),保护层(ProtL),特别是热阻挡层(ThBL),扩散阻挡层 层(DBL),氧化阻挡层(OxBL),化学阻挡层(ChBL),耐磨层(WRL)。 可以实现优异的氢渗透阻隔性能,并且层系统可以根据设想的应用的要求进行定制。

Patent Agency Ranking