公开(公告)号：JP2008233383A

公开(公告)日：2008-10-02

申请号：JP2007071031

申请日：2007-03-19

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： ITO KENJI ,  TANAKA SATOSHI ,  KOTANI TOSHIYA ,  FUJISAWA TADAHITO ,  HASHIMOTO KOJI

IPC: G03F1/68

CPC classification number: G03F1/00

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method with which a fine pattern formed by applying a side wall leaving process is efficiently and easily formed. SOLUTION: An endmost pattern 3a among a plurality of integrated circuit patterns 3 is selected. A first closest pattern 3b which is closest to the endmost pattern 3a is extracted from the respective integrated circuit patterns 3. A pattern 4 is generated which is circumscribed with the endmost pattern 3a and first closest pattern 3b. A non-overlap pattern 5 excluding portions overlapping with the endmost pattern 3a and first closest pattern 3b is generated from the circumscribed pattern 4. A second closest pattern 6 which is closest to the non-overlap pattern 5 is extracted from the respective integrated circuit patterns 3. Steps from the one of extracting the first closest pattern 3b from a second layer to the one of extracting the second closest pattern 6 are repeated until all the data of the respective integrated circuit patterns 3 are completely followed. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种图案形成方法，通过该图案形成方法能够有效且容易地形成通过施加侧壁离开处理而形成的精细图案。

解决方案：选择多个集成电路图案3中的最终图案3a。 从各集成电路图案3提取最靠近最终图案3a的第一最近图案3b。产生与最末端图案3a和第一最近图案3b相切的图案4。 从外接图案4生成除了与最终图案3a和第一最近图案3b重叠的部分的不重叠图案5.从各个集成电路图案中提取最接近非重叠图案5的第二最近图案6 重复将从第二层提取第一最近图案3b到提取第二最近图案6的步骤之间的步骤，直到完全遵循各个集成电路图案3的所有数据。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008107847A

公开(公告)日：2008-05-08

申请号：JP2008000176

申请日：2008-01-04

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： TANAKA SATOSHI ,  HASEBE SHIGERU ,  INOUE SOICHI ,  HASHIMOTO KOJI

IPC: G03F1/36 ,  G03F1/68 ,  H01L21/02 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a step management method for management from a viewpoint of a step proximity effect. SOLUTION: The method includes: a step of selecting a prescribed drawing data corresponding to a prescribed repetition pattern from the drawing data corresponding to a pattern group for modeling comprising a plurality of repetition patterns obtained by changing a first dimension defining a basic pattern of the repetition pattern and a second dimension defining the repetition of the basic pattern with respect to the drawing data corresponding to the repetition pattern, the basic pattern of the prescribed repetition pattern corresponding to a pattern which is to be formed on a wafer and has a prescribed dimension; and a step of judging whether or not a dimension difference between an actual dimension of a portion of a photomask corresponding to the prescribed drawing data and a target dimension falls in an allowable range in a photomask manufacturing step, whether or not a dimensional difference between an actual dimension of a portion of a photoresist corresponding to the prescribed drawing data and a target dimension falls in an allowable range in a lithography step, and whether or not a dimension difference between an actual dimension of a portion of pattern on the wafer corresponding to the prescribed drawing data and a target dimension falls in an allowable range in a processing step. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：从步进邻近效应的观点来获得用于管理的步骤管理方法。 解决方案：该方法包括：从对应于用于建模的图案组的绘图数据中选择与规定的重复图案相对应的规定绘图数据的步骤，包括通过改变定义基本图案的第一维度而获得的多个重复图案 以及相对于对应于重复图形的绘制数据定义基本图案的重复的第二维度，与在晶片上形成的图案相对应的规定的重复图案的基本图案，并且具有 规定尺寸 以及判断光掩模制造工序中的与规定的绘图数据对应的光掩模的一部分的实际尺寸与目标尺寸之间的尺寸差是否落入容许范围的步骤， 对应于规定的图形数据的光致抗蚀剂的一部分的实际尺寸和目标尺寸落在光刻步骤中的允许范围内，以及是否在与晶片相对应的晶片上的图案部分的实际尺寸之间的尺寸差 规定的图形数据和目标尺寸落入处理步骤的允许范围内。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008090073A

公开(公告)日：2008-04-17

申请号：JP2006272082

申请日：2006-10-03

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： SANHONGI SHOJI ,  KIYOU SUIGEN ,  TANAKA SATOSHI

IPC: G03F1/36 ,  G03F1/68 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method for creating pattern data for easily forming a complicated repetitive pattern.
SOLUTION: The method for creating the pattern data includes: (S2) creating first correction models Ci (i= 1, 2...) with respect to the design pattern data corresponding to a repetitive pattern to be formed on a wafer; (S3) creating correction pattern data Di (i= 1, 2...) by correcting the design pattern data by using the first correction models Ci; (S4) creating masks Mi (i= 1, 2...) by using the correction pattern data Di; (S5) forming repetitive patterns Pi (i= 1, 2...) on the wafer by using the masks Mi or drawing data Ei; (S6) selecting a repetitive pattern with highest fidelity to the design pattern data from the repetitive patterns Pi; (S7) correcting the first correction model Ci corresponding to the selected repetitive pattern to create a second correction model; and (S8) correcting the design pattern data by using the second correction model.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于创建用于容易地形成复杂重复图案的图案数据的方法。 解决方案：用于创建图形数据的方法包括：（S2）相对于在晶片上形成的重复图案的设计图案数据创建第一校正模型Ci（i = 1,2 ...） ; （S3）通过使用第一校正模型Ci来校正设计模式数据来产生校正图案数据Di（i = 1,2 ...） （S4）通过使用校正图案数据Di创建掩模Mi（i = 1,2 ...）; （S5）通过使用掩模Mi或绘制数据Ei在晶片上形成重复图案Pi（i = 1,2 ...） （S6）从重复图案Pi中选择对设计图案数据具有最高保真度的重复图案; （S7）对与所选重复图案相对应的第一校正模型Ci进行校正，以创建第二校正模型; 和（S8）通过使用第二校正模型来校正设计图案数据。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007312022A

公开(公告)日：2007-11-29

申请号：JP2006138030

申请日：2006-05-17

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： TANAKA SATOSHI

IPC: H04L12/70

Abstract: PROBLEM TO BE SOLVED: To flexibly perform correspondence, in response to the change of a distribution group with a simple configuration, and without requiring a large scale of configuration, such as a server device. SOLUTION: A communication apparatus 100 generates group information by a multicast group management 11, based on destination information designated by a user. A multicast address generator 12 generates a multicast address, based on the group information. When the communication apparatus 100 is at a transmission side, a network I/F 13 adds the generated multicast address to data and transmits it to a network NW. When a communication apparatus 200 at a reception side, a network I/F 23 is indicated to receive data to the generated multicast address. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了灵活地执行对应，响应于具有简单配置的分布组的改变，并且不需要诸如服务器设备的大规模配置。 解决方案：通信设备100基于用户指定的目的地信息，通过多播组管理11生成组信息。 组播地址生成器12基于组信息生成多播地址。 当通信装置100在发送侧时，网络I / F 13将所生成的组播地址添加到数据，并将其发送到网络NW。 当接收侧的通信装置200指示网络I / F23接收生成的多播地址的数据时。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007104594A

公开(公告)日：2007-04-19

申请号：JP2005295458

申请日：2005-10-07

Applicant: Toshiba Corp ,  Toshiba Solutions Corp ,  東芝ソリューション株式会社 ,  株式会社東芝

Inventor： OGISHIMA SHINJI ,  TANAKA SATOSHI ,  OKA MITSUAKI ,  SHIMAZU NOBUYUKI ,  SHIMIZU AYUMI ,  YAMASHITA KYOJI

IPC: H04L12/70

Abstract: PROBLEM TO BE SOLVED: To provide a multicast communication system capable of reducing an amount of routing information for multicast communication thereby capable of preventing resources from being pressed. SOLUTION: The multicast communication system including means for managing in advance replacement address information of sender node apparatuses regarded to be located at an equivalent distance from a network, replace a sender IP address of a multicast packet with a replacement IP address when monitoring transmission of the multicast packet and detecting it. Thus, a data amount of multicast routing table in each router can be decreased and it is possible to suppress a resource consumed amount of each router. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供能够减少多播通信的路由信息​​量的组播通信系统，从而能够防止资源被按压。 解决方案：组播通信系统包括用于预先管理被认为位于与网络相当距离的发送方节点设备的替换地址信息的装置，当监视时替换具有替换IP地址的多播分组的发送方IP地址 传输组播包并进行检测。 因此，可以减少每个路由器中的组播路由表的数据量，并且可以抑制每个路由器的资源消耗量。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007088145A

公开(公告)日：2007-04-05

申请号：JP2005273847

申请日：2005-09-21

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： FUJISE HIROHARU ,  HASHIMOTO KOJI ,  SANHONGI SHOJI ,  TANAKA SATOSHI ,  INOUE SOICHI

IPC: H01L21/3065 ,  H01L21/027 ,  H01L21/28 ,  H01L21/3213 ,  H01L21/768

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device capable of reducing a process conversion difference caused upon an etching process. SOLUTION: The method for manufacturing the semiconductor device contains the steps of forming a resist pattern 2P containing a pattern on a film 1 to be processed, changing a size of the pattern, and etching the film 1 to be processed by using the resist pattern 2P in which the size of the pattern is changed as a mask. In the step of changing the size of the pattern, the change amount of the size of the pattern is decided so that the pattern which is composed of the film 1 to be processed corresponding to the pattern which is formed by the step of etching the film 1 to be processed has a desired dimension. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够减少在蚀刻处理时引起的工艺转换差异的半导体器件的制造方法。 解决方案：制造半导体器件的方法包括以下步骤：在待加工的膜1上形成含有图案的抗蚀剂图案2P，改变图案的尺寸，并通过使用 抗蚀剂图案2P，其中图案的尺寸改变为掩模。 在改变图案的尺寸的步骤中，确定图案的尺寸的变化量，使得由与通过蚀刻薄膜的步骤形成的图案相对应的待加工薄膜1构成的图案 1被处理具有期望的尺寸。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006053248A

公开(公告)日：2006-02-23

申请号：JP2004233615

申请日：2004-08-10

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： KOTANI TOSHIYA ,  TANAKA SATOSHI ,  NOJIMA SHIGEKI ,  INOUE SOICHI

IPC: G03F1/36 ,  G03F1/68 ,  G03F1/70 ,  G06F17/50 ,  H01L21/027

CPC classification number: H01J37/3026 ,  G03F1/36 ,  G03F1/68

Abstract: PROBLEM TO BE SOLVED: To provide a method for creating design pattern data to reduce the TAT (turn around time).
SOLUTION: The method for creating design pattern data includes: a step S1 of creating first mask pattern data based on first design pattern data; a step S5 of predicting a first wafer pattern to be formed on a wafer corresponding to the first mask pattern data based on the first mask pattern data; a step S6 of judging whether the difference between the first wafer pattern and first design pattern corresponding to the first design pattern data is within a preliminarily determined permissible variation amount or not; a step S7 of correcting the first design pattern data in a part corresponding to the difference if the difference is out of the permissible variation amount; and a step S10 of synthesizing the data obtained by eliminating the first design pattern data of the part corresponding to the corrected difference from the first design pattern data, with the first design pattern data in the part corresponding to the corrected difference, to create second design pattern data.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于创建设计模式数据以减少TAT（转向时间）的方法。 解决方案：用于创建设计图案数据的方法包括：基于第一设计图案数据创建第一掩模图案数据的步骤S1; 步骤S5，基于第一掩模图案数据预测与第一掩模图案数据相对应的在晶片上形成的第一晶片图案; 判断与第一设计图案数据对应的第一晶片图案和第一设计图案之间的差是否在预先确定的允许变化量内的步骤S6; 如果差超出允许变化量，则校正与差异对应的部分中的第一设计模式数据的步骤S7; 以及步骤S10，通过从与第一设计图案数据相对应的与校正的差异相对应的部分的第一设计图案数据与通过对应于校正的差异的部分中的第一设计图案数据合成获得的数据，以创建第二设计 模式数据。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005026870A

公开(公告)日：2005-01-27

申请号：JP2003188493

申请日：2003-06-30

Applicant: Toshiba Corp ,  株式会社東芝

Inventor： TANAKA SATOSHI

IPC: H04L12/66

Abstract: PROBLEM TO BE SOLVED: To allow communications between terminals involved in different networks while mobility is secured.
SOLUTION: A mobile IP (Internet Protocol) network capable of implementing communications even if the terminal moves in the network by a Mobile IP system is assigned as a higher rank network (network C). A non-Mobile IP network capable of implementing the communications even if the terminal moves in the network by another system rather than the Mobile IP system is assigned as lower rank networks (networks A, B). Linking devices 20, 22 allowed to function as the terminal complying with the Mobile IP system with respect to the higher rank network and allowed to function as the terminals complying with another system rather than the Mobile IP system with respect to the lower rank networks are arranged between the higher rank network and the lower rank networks.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：允许在移动性得到保护的同时涉及不同网络的终端之间的通信。 即使终端在移动IP系统中在网络中移动也能够实现通信的移动IP（因特网协议）网络被分配为更高等级的网络（网络C）。 即使终端在其他系统而不是移动IP系统在网络中移动，也能够实现通信的非移动IP网络被分配为低等级网络（网络A，B）。 连接装置20,22被允许作为符合移动IP系统的终端相对于较高等级网络起作用，并被允许作为符合另一系统而不是相对于下级网络的移动IP系统的终端起作用 在高级网络和低级网络之间。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004037579A

公开(公告)日：2004-02-05

申请号：JP2002191193

申请日：2002-06-28

Applicant: Dainippon Printing Co Ltd ,  Toshiba Corp ,  大日本印刷株式会社 ,  株式会社東芝

Inventor： HIRANO TAKASHI ,  KANEMITSU SHINGO ,  TANAKA SATOSHI ,  NOJIMA SHIGEKI ,  IKEDA TAKAHIRO

IPC: G03F1/72 ,  G03F1/74 ,  H01L21/027 ,  G03F1/08

Abstract: PROBLEM TO BE SOLVED: To provide a method for modifying a defective part of a mask by which efficiency in a step for modifying a defective part of a mask is enhanced and lowering of yield in the step is easily suppressed.
SOLUTION: Respective pattern transfer images 17, 18 are simulated using defect data 15 formed on the basis of a mask image around a defect in a mask 2 and reference data 16 corresponding to the mask image in design data for fabrication of the mask 2. Dislocation of the defective simulated image 17 based on the defect data 15 from the reference simulated image 18 based on the reference data 16 is checked and whether it is necessary to modify the defective part or not is judged. When it is necessary to modify the defective part, the range of permissible error in relation to an ideal transfer simulated image is simulated using the reference data 16 and the range is compared with the mask image. A part corresponding to the region of any mask image outside the range of permissible error is modified.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2003195473A

公开(公告)日：2003-07-09

申请号：JP2001398438

申请日：2001-12-27

Applicant: TOSHIBA CORP

Inventor： KOBAYASHI SACHIKO ,  KOTANI TOSHIYA ,  TANAKA SATOSHI ,  WATANABE SUSUMU ,  YANO MITSUHIRO

IPC: G03F1/36 ,  G03F1/68 ,  G03F1/70 ,  G03F7/20 ,  G06F17/50 ,  H01L21/027 ,  G03F1/08

Abstract: PROBLEM TO BE SOLVED: To correct a design pattern to a shape suited to mask plotting or inspection by simple processing. SOLUTION: In a pattern correcting method to be executed by a computer, 1st correction for sides satisfying a prescribed condition out of sides constituting a designed pattern is performed by calculating correction values obtained considering an optical proximity effect. Then 2nd correction for sides not satisfying the prescribed condition is performed by using the correction value of the side adjacent to the side not satisfying the prescribed condition out of the sides corrected by the 1st correction and the sides corrected by the 1st correction are connected to each other with a segment. COPYRIGHT: (C)2003,JPO