NON-LITHOGRAPHIC FORMATION OF THREE-DIMENSIONAL CONDUCTIVE ELEMENTS
    46.
    发明申请
    NON-LITHOGRAPHIC FORMATION OF THREE-DIMENSIONAL CONDUCTIVE ELEMENTS 有权
    非线性形成三维导电元件

    公开(公告)号:US20150221551A1

    公开(公告)日:2015-08-06

    申请号:US14686222

    申请日:2015-04-14

    Applicant: Tessera, Inc.

    Abstract: A method of forming a conductive element on a substrate and the resulting assembly are provided. The method includes forming a groove in a sacrificial layer overlying a dielectric region disposed on a substrate. The groove preferably extends along a sloped surface of the substrate. The sacrificial layer is preferably removed by a non-photolithographic method, such as ablating with a laser, mechanical milling, or sandblasting. A conductive element is formed in the groove. The grooves may be formed. The grooves and conductive elements may be formed along any surface of the substrate, including within trenches and vias formed therein, and may connect to conductive pads on the front and/or rear surface of the substrate. The conductive elements are preferably formed by plating and may or may not conform to the surface of the substrate.

    Abstract translation: 提供了在基板上形成导电元件的方法和所得到的组件。 该方法包括在覆盖设置在基板上的电介质区域上的牺牲层中形成凹槽。 槽优选地沿着衬底的倾斜表面延伸。 牺牲层优选通过非光刻方法去除,例如用激光烧蚀,机械研磨或喷砂。 在沟槽中形成导电元件。 可以形成凹槽。 凹槽和导电元件可以沿着衬底的任何表面形成,包括在其中形成的沟槽和通孔内,并且可以连接到衬底的前表面和/或后表面上的导电焊盘。 导电元件优选通过电镀形成,并且可以或可以不与基板的表面一致。

Patent Agency Ranking