Abstract:
PROBLEM TO BE SOLVED: To facilitate the patterning of a word line by a method wherein a gate is formed on a substrate to form the first metallic silicide layer on the gate and further to form the second metallic silicide layer having silicon in higher concentration than that of the first metallic silicone layer on the first metallic silicide layer. SOLUTION: A substrate having a gate oxide layer 24 and a polysilicon word line 26 is prepared so as to form a refractory metallic silicide layer i.e., a tungsten silicide is formed on the word line 26. Next, a silicon rich metallic silicide or pure silicon layer 30 is formed on the upper surface of the metallic silicide layer 28. This pure silicon layer 30 has silicon on higher concentration than that of the metallic silicide layer 28. Next, an uppermost oxide layer 32 is formed on the upper part surface of the pure silicon layer 30. Resultantly, the formation of tungsten oxide can be avoided thereby facilitating the patterning of the word line. Furthermore, the surface of the oxide layer can be made smooth.
Abstract:
PROBLEM TO BE SOLVED: To widen a charge storage area, without widening the surface of a substrate in such a manner that a trunk conductive member of a charge storage capacitor connected to a transfer transistor has lower and upper trunk layers and an L-letter shaped branch conductive layer is connected to the upper trunk layer. SOLUTION: A first storage electrode 49a and a second storage electrode 49b of a DRAM storage capacitor have lower trunk-polysilicon layers 26a, 26b, upper trunk-polysilicon layers 46a, 46b, and branch polysilicon layers 40a, 40b, respectively. Each of the branch polysilicon layers 40a, 40b has L-shape cross section and has a vertical expanding part which extends toward a top face 11 of a substrate 10 and a horizontal extension part which is in direct contact with the inner face of each of the trunk upper polysilicon layers 46a, 46b. The lower trunk polysilicon layers 26a, 26b, each having a T-shape cross section are in direct contact with drain regions 16a, 16b of the DRAM transfer transistor, respectively.
Abstract:
PROBLEM TO BE SOLVED: To increase a charge storage area by providing a transfer transistor having source and drain regions, formed on a substrate, and a tree-type capacitor electrically connected to one of the source and drain regions of the transfer transistor. SOLUTION: A storage electrode has a trunk-shaped polysilicon layer 44, having a substantially T-shaped cross section and a branch-shaped polysilicon layer 38 having a substantially L-shaped cross section. The bottom of the trunk- shape polysilicon layer 44 is electrically connected to a drain region 16 of the transfer transistor of the DRAM cell. Sections of the branch-shaped polysilicon layer 38 extend sideward from a vertical portion and extend downward toward a substrate 10. Next, a dielectric layer 46 is formed over the entire exposed surfaces of the trunk-shaped polysilicon layer 44 and the sections of the branch shaped polysilicon layer 38. Next, a polysilicon layer 48 as an oppositely located electrode to the storage electrodes 44 and 38 is formed over the entire dielectric layer 46.
Abstract:
PROBLEM TO BE SOLVED: To correct data errors selectively in accordance with the type of an optical disk. SOLUTION: As a method for correcting data errors, first an old data sequence and the incidental old eraser pointer are received from an optical disk drive (first step). Next, the old data sequence and the incidental eraser sequence are decoded, outputting a set of new data sequence and an eraser pointer corrected parameter (second step). After that, on the basis of this set, plural eraser pointers are decided that are incidental to the new data sequence (third step). In addition, this device is so structured as to contain a decoding circuit 210 for performing the first step, logical mapping conversion circuit 220 for performing the second step, and a multiplexer 230 for outputting this logical mapping conversion circuit or selectively outputting the old eraser pointer.
Abstract:
PURPOSE: To harmonize the generation of sounds with twinkles of diodes, etc., to obtain a true-to-life effect by including a sound/frequency transforming circuit, etc., and modifying the twinkle frequency of the twinkle controller to harmonize it with the volume and mass of the shots, in an integral circuit for shots and twinkles of a toy gun. CONSTITUTION: A sound level/mass detector 10 for detecting the input sound level and mass starts along with the start of a shot synthesizer 50. Different selected signals are outputted from a plurality of frequency selecting output terminals SELA, SELB and inputted to a frequency generator 20. The frequency generator 20 modifies the output frequency in correspondence with the input selecting signals, gets to start along with the start of the shot synthesizer 50, outputs the modified frequency which is inputted to a twinkle controller 60. The twinkle controller 60 modifies the activating frequency in correspondence with the input frequency, with which the various diodes 61-63 connected to the various output terminals modify the twinkle frequency.
Abstract:
PROBLEM TO BE SOLVED: To provide a method for selectively correcting a layout pattern. SOLUTION: A first layout pattern including at least a first group and a second group is provided. Each of the first group and the second group includes a plurality of members. All members in the first group and the second group are individually subjected to a simulation process and a correction process to obtain a corrected first group and a corrected second group. The corrected first group and the corrected second group are verified whether the groups reach the target or not. After verification, a layout pattern including the corrected first group reaching the target and the corrected second group reaching the target is output. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor device which has a trench-type element separation structure with improved electric characteristics, and to provide its manufacturing method. SOLUTION: A groove 4 is covered with a first silicon oxide film 6 and heated. A joint 7 formed on the first silicon oxide film 6 is covered with a second silicon oxide film 8 and heated again. Thus, the first silicon oxide film 6 and the second silicon oxide film 8 are made to be high in density, and the groove 4 is covered with them as a rigid element isolation oxide film 9 with an uniform etching rate. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method of forming a porous low-permittivity layer. SOLUTION: A CVD process is introduced to a substrate to which a frame precursor and a porogen precursor are supplied. In the supply stop period of the frame precursor, the value of at least one deposition parameter which is negatively correlated with the density of a product of the CVD process decreases. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal alignment layer by which powders and particles are prevented from producing on an organic alignment layer and a patterning process can be conducted on an inorganic alignment layer so as to increase the latitude of design of the inorganic alignment layer. SOLUTION: The method for manufacturing the liquid crystal alignment layer includes a step to conduct an ion implantation process after furnishing a step to provide an organic or inorganic material layer on a substrate for the purpose of imparting alignment treatment to the organic or inorganic material layer. As the alignment treatment is a kind of noncontact method, it reduces probability of damaging the organic alignment layer so as to prevent the production of powder and particles. Furthermore, the inorganic material layer is formed on the substrate before the alignment treatment, and thereby the inorganic material layer is pattern formed before the alignment treatment. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a data carrier which can correctly recognize a position relation of surface/backside judgement by a card reader side and independently have a first function corresponding to the surface side of a card and a second function corresponding to the backside individually. SOLUTION: A non-contact type data carrier 1 receives radio waves 20 transmitted from a card reader 1 by an antenna and an information communication part to acquire required power and information. Required processing is carried out by a control part based on the acquired information and information stored in a multi-value memory. By a surface/backside judging part, surface or backside of the data carrier 1 is detected based on the direction of electric current flowing in a coil L. Based on the detection result, different functions are carried out. COPYRIGHT: (C)2008,JPO&INPIT