Abstract:
Two grooves (10) are dice-cut along a light passing direction in a crystal dummy phase matching element (1) to thereby form a protrusion (11), held between the two grooves (10), on the upper surface side in Figures as shown in Figs. 4 (b), (c); and a ridge type waveguide (9) is formed within the protrusion. When light is allowed to pass through the waveguide (9), the light passes through a crystal axis reversal portion (polarization reversal region) (4) while being confined in the waveguide (9) to undergo wavelength conversion. A light energy can be kept high within a wavelength conversion element to ensure a high wavelength conversion efficiency.
Abstract:
A semiconductor-based gain optical phase-shifting device, method and apparatus. In one aspect of the present invention, an apparatus according to an embodiment of the present invention includes a semiconductor substrate through which an optical beam is to be directed along an optical path through the semiconductor substrate. A plurality of floating charge modulated regions are disposed along the optical path. A phase of the optical beam is responsive to a charge concentration in each of the plurality of floating charge modulated regions. A plurality of tunneling insulation layers (117) are disposed between each of the plurality of floating charge modulated regions and the semiconductor substrate. A plurality of control (121) nodes are disposed proximate to the plurality of floating charge modulated regions. Each of the control nodes control the charge concentration in a respective one of the plurality of floating charge modulated regions. A plurality of blocking insulation layers (119) disposed between each of the plurality of control nodes and the plurality of floating charge modulated regions.
Abstract:
An electro-optic device comprising a substrate (2, 3, 4) and an integrated optical waveguide (1) extending across the substrate (2, 3, 4), two doped regions (14, 15) being provided so that an electrical signal can be applied across the doped regions (14, 15), to alter the density of charge carriers within the waveguide (1), the doped regions (14, 15) each comprising a plurality of doped areas (14A, 14B, 14C, 14D; 15A, 15B, 15C, 15D) spaced apart from each other along the length of the wageguide (1) to improve the performance of the device by reducing the level of current between each pair (14A, 15A etc.) of doped regions.
Abstract:
Une structure guidante (16, 18, 20, 22) de ce composant inclut une structure de coeur (18) s'étendant jusqu'à des faces de couplage (8, 10). Elle comporte au moins trois couches à haut indice (30, 34, 38) présentant des indices de réfraction accrus par rapport aux milieux environnants (16, 32, 36, 20) pour augmenter dans ces couches la densité de puissance d'une lumière devant subir un traitement tel qu'une modulation d'amplitude. Ces couches à haut indice ont des compositions leur permettant de réaliser ce traitement en réponse à une excitation électrique tout en ayant des épaisseurs supérieures à celles de puits quantiques. Elles sont séparées par des couches de dilution (32, 36) à indice de réfraction plus faible et à épaisseurs plus grandes telles qu'un seul mode de propagation de la lumière soit guidé par la structure guidante. Ce mode présente une épaisseur adaptée à un couplage à un élément optique externe tout en confinant une majorité de la puissance de la lumière dans l'épaisseur de la structure de coeur pour favoriser le traitement.
Abstract:
A semiconductor optical guided-wave device comprises a semiconductor substrate (101), at least one ridge type semiconductor optical waveguide formed thereon, and a pair of electrodes (108,110). The ridge (131) is formed by a selective crystal growth process. The ridge can be formed using a mask (201) having an opening (202) where the ridge is to be formed, and the crystal growth of material for forming the ridge is made by a crystal growth technology such as the MOVPE method. The mask is preferably a thin dielectric film, such as SiO₂ film. The device comprises grown layers including a first semiconductor cladding layer (102), a semiconductor guiding layer (103) and a second semiconductor cladding layer (104) grown in this order, and a ridge (131) having a third semiconductor cladding layer (105) and a semiconductor capping layer (106) laminated in this order on the second semiconductor cladding layer. The device can be formed as an optical phase modulator a directional coupler or a Mach-Zehnder type optical modulator. The device can be small with low power loss, and suitable for large-scale integration and mass production.
Abstract:
The present invention provides an optical modulator including a substrate and a phase modulation portion on the substrate. The phase modulation portion includes an optical waveguide comprised of a first clad layer, a semiconductor layer that is laminated on the first clad layer and has a refraction index higher than the first clad layer and a second clad layer that is laminated on the semiconductor layer and has a refraction index lower than the semiconductor layer, a first traveling wave electrode, and a second traveling wave electrode. The semiconductor layer includes a rib that is formed in the optical waveguide in an optical axis direction and is a core of the optical waveguide, a first slab that is formed in the optical axis direction in one side of the rib, a second slab that is formed in the optical axis direction in the other side of the rib, a third slab that is formed in the first slab in the optical axis direction at the opposite side to the rib, and a fourth slab that is formed in the second slab in the optical axis direction at the opposite side to the rib. The first slab is formed to be thinner than the rib and the third slab, and the second slab is formed to be thinner than the rib and the fourth slab.
Abstract:
A wavelength selective switch and a wavelength selection method are provided, where the wavelength selective switch includes: a dual-microring resonator, including a first microring (111) and a second microring (112) that are connected in series, where the first microring (111) and the second microring (112) are silicon-based microrings and respectively include one annular PN junction, and a direction of the annular PN junction of the first microring is the same as that of the annular PN junction of the second microring; an electric tuning module (120), where a first electric port of the electric tuning module (120) is connected to a P zone of the first microring (111) and an N zone of the second microring (112), a second electric port of the electric tuning module (120) is connected to an N zone of the first microring (111) and a P zone of the second microring (112), and the electric tuning module (120) is configured to apply bias voltages with reverse directions to the annular PN junction of the first microring 111 and the annular PN junction of the second microring (112); and a thermal tuning module (130), configured to adjust an operating temperature of the dual-microring resonator. The switch is suitable for a high-density integrated optical interconnection.