Method of making a material
    43.
    发明申请
    Method of making a material 失效
    制作材料的方法

    公开(公告)号:US20040028817A1

    公开(公告)日:2004-02-12

    申请号:US10629392

    申请日:2003-07-29

    CPC classification number: B41M5/5254 B41M5/5236 C08J9/04

    Abstract: The invention provides a method of making a material. The method comprises the step of coating a support with a solution comprising a hydrophilic polymer and a blowing agent. Either prior to or after the step of coating the support, the solution is interacted with in some way e.g. heated, to cause the blowing agent to generate gas bubbles within the solution, causing foaming of the hydrophilic polymer.

    Abstract translation: 本发明提供一种制造材料的方法。 该方法包括用包含亲水性聚合物和发泡剂的溶液涂覆载体的步骤。 在涂覆载体的步骤之前或之后,溶液以某种方式相互作用,例如, 加热,使发泡剂在溶液内产生气泡,引起亲水性聚合物的发泡。

    Methods for producing submicron metal line and island arrays
    44.
    发明申请
    Methods for producing submicron metal line and island arrays 失效
    生产亚微米金属线和岛阵列的方法

    公开(公告)号:US20040009298A1

    公开(公告)日:2004-01-15

    申请号:US10404858

    申请日:2003-04-01

    CPC classification number: C23C18/1882 C23C18/1879 H05K3/182

    Abstract: This process results in directed electroless plating of the metal to form discrete metal structures over the entire surface. Because the surface is pre-patterned with passivated regions inert to metal deposition, the metal is directed only to the unstamped regions. This allows the formation of unconnected metal structures without any chemical etching steps. These metallic arrays are varied in size, separation and shape by using gratings of different periodicities and blaze angles as the stamp templates. A variety of well-defined geometric patterns have been fabricated and imaged using scanning probe, scanning electron, and optical microscopies.

    Abstract translation: 该过程导致金属的定向化学镀以在整个表面上形成离散的金属结构。 由于表面被预先图案化,具有对金属沉积惰性的钝化区域,所以金属仅被引导到无印迹区域。 这允许在没有任何化学蚀刻步骤的情况下形成未连接的金属结构。 这些金属阵列通过使用不同周期性和闪耀角的光栅作为印模模板而在尺寸,分离和形状上变化。 已经使用扫描探针,扫描电子和光学显微镜制造并成像了各种明确定义的几何图案。

    Method for forming soldering layer of fiber arrays
    45.
    发明申请
    Method for forming soldering layer of fiber arrays 审中-公开
    形成光纤阵列焊接层的方法

    公开(公告)号:US20030194494A1

    公开(公告)日:2003-10-16

    申请号:US10411257

    申请日:2003-04-11

    Abstract: ABSTRACT OF THE DISCLOSURE A method for forming the soldering layer of fiber array substrate surface has been disclosed herein. A plurality of fiber array bases having V-shape grooves are formed on a substrate, and a solder layer is formed on the whole substrate via chemical plating method of following steps: forming a layer of nickel/chromium (Ni/Cr) alloy or aluminum (Al) metal on said substrate through evaporation or sputtering; treating said surface of said substrate having V-shape grooves with a sensitizing solution for plating said surface with Sn2null, wherein said sensitizing solution comprises deionized water and SnCl2; treating said sensitized surface of said substrate with an activating solution for precipitating catalytic element Pd0 on said surface, wherein said sensitizing solution comprises 2 to 10 g/l of PdCl2 and 0.01 to 0.1 M HCl; and (E) immersing said treated surface into an electroless nickel plating solution to form a nickel metal layer on said treated surface.

    Abstract translation: 发明内容本文已经公开了形成光纤阵列基板表面的焊接层的方法。 在基板上形成多个具有V形槽的光纤阵列基板,通过以下步骤的化学镀方法在整个基板上形成焊料层:形成镍/铬(Ni / Cr)合金或铝 (Al)金属通过蒸发或溅射在所述衬底上; 用所述表面用Sn 2+>的敏化溶液处理具有V形槽的所述基板的所述表面,其中所述敏化溶液包含去离子水和SnCl <下标2。 用所述表面上沉淀催化元素Pd 0>的活化溶液处理所述基材的所述敏化表面,其中所述敏化溶液包含2至10g / l的PdCl 和0.01至0.1 M HCl; 和(E)将所述处理的表面浸入无电镀镍溶液中以在所述处理的表面上形成镍金属层。

    Electroless deposition method
    46.
    发明申请

    公开(公告)号:US20030190426A1

    公开(公告)日:2003-10-09

    申请号:US10117710

    申请日:2002-04-03

    Abstract: Methods and apparatus are provided for forming a metal or metal silicide layer by an electroless deposition technique. In one aspect, a method is provided for processing a substrate including depositing an initiation layer on a substrate surface, cleaning the substrate surface, and depositing a conductive material on the initiation layer by exposing the initiation layer to an electroless solution. The method may further comprise etching the substrate surface with an acidic solution and cleaning the substrate of the acidic solution prior to depositing the initiation layer. The initiation layer may be formed by exposing the substrate surface to a noble metal electroless solution or a borane-containing solution. The conductive material may be deposited with a borane-containing reducing agent. The conductive material may be used as a passivation layer, a barrier layer, a seed layer, or for use in forming a metal silicide layer.

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