Abstract:
A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument. In such instrument, the spectrophotometer and ellipsometer share a radiation source, and radiation from the source can be focused by either the spectrophotometer or the ellipsometer to the same focal point on a sample. Preferred embodiments of the ellipsometer employ a rotating, minimal-length Rochon prism as a polarizer, and include a spectrometer with an intensified photodiode array to measure reflected radiation from the sample, and a reference channel (in addition to a sample channel which detects radiation reflected from the sample).
Abstract:
A device for ellipsometric two-dimensional display of a sample placed in an incident medium, observed between an analyser and a polarizer intersected by convergent light reflection, wherein the ellipsometric parameters of the assembly formed by the sample and a substrate whereon it is placed, are used. The substrate comprises a support and a stack of base layers and its ellipsometric properties are known. The ellipsometric properties of the substrate are such that variations of the sample ellipsometric parameters are displayed with contrast higher that the contrast produced in the absence of the substrate. The invention also concerns a display method and an ellipsometric measurement method with spatial resolution.
Abstract:
The disclosure is directed to systems and methods for precisely measuring birefringence properties of large-format samples of optical elements. A gantry-like configuration is employed for precise movement of birefringence measurement system components relative to the sample. There is also provided an effective large-format sample holder that adequately supports the sample to prevent induced birefringence therein while still presenting a large area of the sample to the unhindered passage of light.
Abstract:
Disclosed is a residual stress measuring system for measuring the residual stress in an optical fiber. The residual stress measuring system comprises a light source for generating light used to measure the residual stress, a lens system for converting the generated light into a plane wave, a polarimeter for transforming the converted light to an input polarized light, which is incident on the optical fiber, a rotational measuring section for rotating the optical fiber so as to enable the polarized light to transmit through the optical fiber in various directions, and a detector for detecting the residual stress from a phase shift of the transmitted light.
Abstract:
A method for determining at least one optical property of an optical device comprises providing an optical input signal that includes first and second signal components that are modulated at first and second frequencies, respectively, and that have first and second polarization states, respectively. The optical input signal is passed to an optical device. An optical output signal from the optical device is separated into first and second output signals that have third and fourth polarization states, respectively. The first and second output signals are each compared with reference signals at the first and second frequencies to provide four phase shift and amplitude measurements that can be used to determine the at least one optical property of the optical device as a function of wavelength.
Abstract:
Light from a light source 10 is linearly polarized by a polarizer 11. Then it propagates via a half-mirror 12 almost parallel to the normal to a reflective liquid-crystal panel 13 and falls on the reflective liquid-crystal panel 13. The reflected light reflected by the reflective liquid-crystal panel 13 is received by a detector 15 via the half-mirror 12 and an analyzer 14. In this state, the reflective liquid-crystal panel 13 is rotated about an axis almost parallel to the normal to the reflective liquid-crystal panel 13 and an angle (extinction angle) at which the output signal of detector 15 reaches minimum is measured. Then, the gap of the reflective liquid-crystal panel 13 is detected based on the measured extinction angle. It is also possible to measure the output signals of detector 15 by arranging the analyzer 14 in a state in which the transmission axis thereof is almost parallel to the polarization direction of the incident light and a state in which it is almost perpendicular thereto and to detect the gap of the reflective liquid-crystal panel 13 based on the measured signals.
Abstract:
A method and apparatus are disclosed for accurately and repeatably determining the thickness of a thin film on a substrate. A rotating compensator ellipsometer is used which generates both 2null and 4null output signals. The 4null omega signal is used to provide an indication of the temperature of the sample. This information is used to correct the analysis of the thin film based on the 2null signal. These two different signals generated by a single device provide independent measurements of temperature and thickness and can be used to accurately analyze a sample whose temperature is unknown.
Abstract:
Highly accurate calibration of a polarimeter of the type having at least four detectors involves using four known states of polarisation of an input light signal (calibration polarisations) and at least one further state of polarisation. All input states of polarisation to the polarimeter have unity normalised power of the light signal and unity degree of polarisation. A Stokes matrix for the four calibration polarisations is generated with at least one variable correction parameter, and a correction matrix is determined from the Stokes matrix and a corresponding detector current matrix measured by the polarimeter. An optimisation criterion that is a function of the degrees of polarisation for the states of polarisation as measured by the polarimeter is generated. The correction parameter is varied iteratively to minimise the optimisation criterion so that the polarimeter is calibrated to produce unity power and degree of polarisation for any input state of polarisation.
Abstract:
Faraday rotators each have a Faraday element which rotates light and a magnetic field generator for applying a magnetic field to the Faraday element. A wavelength plate is disposed between the Faraday rotators and it retards the light. A polarizer transmits, of the light, light having a predetermined plane of polarization which has been rotated by the Faraday rotators and retarded by the wavelength plate. An optical receiver receives the light transmitted by the polarizer and outputs a light receiving signal which corresponds to the amount of light received. A signal generator outputs a control signal for polarizing the light to be measured into at least four polarization states to the magnetic field generator. A signal processor determines Stokes parameters which indicate the polarization state of the light to be measured based on the four polarization states, and the light receiving signal corresponding to each of the four polarization states.
Abstract:
A system and method for precisely measuring low-level linear and circular birefringence properties (retardance and direction) of optical materials (26). The system incorporates a photoelastic modulator (24) for modulating polarized light that is then directed through a sample (26). The beam (nullBinull) propagating from the sample is separated into two parts, with one part (nullB1null) having a polarization direction different than the polarization direction of the other beam part (nullB2null). These separate beam parts are then processed as distinct channels. Detection mechanisms (32, 50) associated with each channel detect the time varying light intensity corresponding to each of the two parts of the beam. This information is combined for calculating a precise measure of the linear and/or circular retardance induced by the sample, as well as the sample's fast axis orientation and direction of circular retardance.