公开(公告)号：JP2008208017A

公开(公告)日：2008-09-11

申请号：JP2007235031

申请日：2007-09-11

Applicant: Tohos Sgm Kk ,  Tosoh Corp ,  東ソ−・エスジ−エム株式会社 ,  東ソー株式会社

Inventor： ARAI KAZUYOSHI ,  TAKAHATA TSUTOMU ,  HASHIMOTO SHINKICHI ,  UCHIDA MASAHITO ,  YAMADA SHUSUKE ,  HARADA YOSHINORI ,  HORIKOSHI HIDEHARU

IPC: C03B20/00

CPC classification number: C03C4/0085 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03C3/06 ,  C03C4/10 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2201/54 ,  Y02P40/57

Abstract: PROBLEM TO BE SOLVED: To inexpensively provide a fused quartz glass capable of being preferably used for preparing various optical materials utilizing ultraviolet ray, visible light and infrared ray, a member for producing a semiconductor, a member for producing a liquid crystal, a member for producing MEMS(micro-electro-mechanical system), and a glass substrate for the liquid crystal, and having high permeability of ultraviolet ray, visible light and infrared ray, high purity, high heat resistance, and a low diffusion velocity of Cu ions.
SOLUTION: The fused quartz glass has an internal transmittance of not less than 95% for ultraviolet ray of 245 nm wavelength at 10 mm depth, a viscosity coefficient at 1,215°C of not less than 10
12.0 Pa s, a Cu ion diffusion coefficient in a depth of 20-100 μm from the surface in Cu ion heat diffusion in the atmosphere at 1,050°C of not greater than 1×10
-10 cm
2 /sec, an OH content of not grater than 5 ppm, a Li, Na, K, Mg, Ca and Cu content of each less than 0.1 ppm, and preferably contains 2 ppm of Al by weight ratio. The fused quartz glass can be obtained by converting a raw material silica powder to cristobalite in advance and thereafter fusing the same in a non-reducing atmosphere.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题为了廉价地提供一种能够优选用于制备利用紫外线，可见光和红外线的各种光学材料的熔融石英玻璃，用于制造半导体的部件，用于制造液晶的部件， 用于制造MEMS（微电子机械系统）的构件和用于液晶的玻璃基板，并且具有高的紫外线，可见光和红外线的透过性，高纯度，高耐热性和低扩散速度 Cu离子。 解决方案：熔融石英玻璃对于10mm深度的245nm波长的紫外线具有不小于95％的内部透射率，1,215℃下的粘度系数不小于10 SP SP 12.0 SP > Pa时，在1050℃的大气中的Cu离子热扩散中与表面的深度为20-100μm的Cu离子扩散系数不大于1×10 -10 < SP> 2 /秒，不超过5ppm的OH含量，Li，Na，K，Mg，Ca和Cu的含量均小于0.1ppm，优选含有2ppm的Al重量比 。 熔融石英玻璃可以通过将原料二氧化硅粉末预先转化为方英石，然后在非还原气氛中将其熔融而获得。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP4093393B2

公开(公告)日：2008-06-04

申请号：JP2001308421

申请日：2001-10-04

Applicant: 東ソ−・エスジ−エム株式会社 ,  東ソー株式会社

Inventor： 秀春 堀越

IPC: C03C4/08 ,  C03B8/04 ,  C03B20/00 ,  C03C3/06 ,  G02B1/00 ,  G03F1/60 ,  H01L21/027

CPC classification number: C03C3/06 ,  C03C4/085

Abstract: PROBLEM TO BE SOLVED: To provide synthetic quartz glass for vacuum UV light which has excellent homogeneity to irradiation with vacuum UV light and is excellent in the durability to the irradiation with the vacuum UV light, a method for manufacturing the same and a mask substrate for the vacuum UV light using the same. SOLUTION: The highly homogeneous synthetic quartz glass for the vacuum UV light characterized in that the internal transmittance to the vacuum UV light of a wavelength 157 nm is >=60% per 1 cm; the difference between the maximum refractive index and minimum refractive index in a region of 200 mm diameter is per 1 cm; a birefringence quantity is shots of the vacuum UV light of the wavelength 157 nm at an energy density of 10 mJ/cm is and the change in the birefringence quantity is

公开(公告)号：JP2005067914A

公开(公告)日：2005-03-17

申请号：JP2003208905

申请日：2003-08-26

Applicant: Tohos Sgm Kk ,  Tosoh Corp ,  東ソ−・エスジ−エム株式会社 ,  東ソー株式会社

Inventor： HORIKOSHI HIDEHARU

IPC: C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03C3/06 ,  C03C4/08

CPC classification number: C03B19/1453 ,  C03B2201/03 ,  C03B2201/04

Abstract: PROBLEM TO BE SOLVED: To provide quartz glass excellent in ultraviolet ray absorption property, visible light transmittance, resistance to devitrification, and thermal resistance, and to provide a method for manufacturing the same.
SOLUTION: The quartz glass is characterized in that the content of OH groups is ≤1 ppm, the content of H
2 is ≤1×10
17 /cm
3 , the content of Cl is ≤10 ppm, the total content of metal impurities is ≤10 ppm, the transmittance per thickness of 1 cm in a wavelength region of ≤230 nm is ≤5%, and the transmittance per thickness of 1 cm in a wavelength region of ≥300 nm is ≥80%. The quartz glass can be obtained by a process comprising hydrolyzing a glass forming raw material in oxyhydrogen flame, forming a porous silica body (soot body) by depositing formed silica particulates on a target, subjecting the obtained soot body to heat treatment in an atmosphere containing gaseous hydrogen, and transparently vitrifying so as to obtain transparent quartz glass, and by irradiating the obtained transparent quartz glass with X-ray or γ-ray of an irradiation dose of ≥4×10
4 C/kg.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供优异的紫外线吸收性，可见光透射率，耐失透性和耐热性的石英玻璃，并提供其制造方法。 解决方案：石英玻璃的特征在于OH基的含量≤1ppm，H 2 的含量≤1×10 17 SP> 3 时，Cl的含量≤10ppm，金属杂质的总含量≤10ppm，波长区域≤230nm的每1cm的透射率≤5％， ≥300nm的波长区域的1cm厚度的透射率≥80％。 石英玻璃可以通过包括在氢氧焰中水解玻璃形成原料的方法获得，通过在目标上沉积形成的二氧化硅微粒而形成多孔二氧化硅体（烟灰体），使得到的烟灰体在含有 气态氢气，透明玻璃化，得到透明的石英玻璃，照射剂量为≥4×10 4 C / kg的X射线或γ射线照射得到的透明石英玻璃 。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2003292337A

公开(公告)日：2003-10-15

申请号：JP2002098893

申请日：2002-04-01

Applicant: Tohos Sgm Kk ,  Tosoh Corp ,  Tosoh Quartz Corp ,  東ソ−・エスジ−エム株式会社 ,  東ソー・クォーツ株式会社 ,  東ソー株式会社

Inventor： HASHIMOTO SHINKICHI ,  TAKAHATA TSUTOMU

IPC: C03C3/083 ,  C03C3/06 ,  C03C4/00 ,  C03C4/20 ,  C03C10/04 ,  H01L21/3065

CPC classification number: C03C3/06 ,  C03C4/20 ,  C03C2201/32

Abstract: PROBLEM TO BE SOLVED: To provide a silica glass, used for a semiconductor container, a tool, a bell jar for a plasma etcher, and the like, which has plasma resistance, particularly sufficient durability to fluorine plasma such as CF
4 /Ar/O
2 plasma, is free from metal contamination and has high viscosity at high temperatures, and to provide a method for producing the same and apparatuses for manufacturing a semiconductor or a liquid crystal comprising the plasma corrosion resisting silica glass.
SOLUTION: The plasma corrosion resisting silica glass essentially comprising SiO
2 as a glass forming substance comprises aluminum in an amount from more than 10 atomic % to 20 atomic %. The method for producing the plasma corrosion resisting silica glass and apparatuses using the same are provided.
COPYRIGHT: (C)2004,JPO

Abstract translation: 解决方案：提供一种用于半导体容器的石英玻璃，用于等离子体蚀刻器的工具，钟罩，等离子体电阻，特别是足够的氟等离子体的耐久性，例如CF 3， SB> 4 / Ar / O 2 等离子体，没有金属污染，并且在高温下具有高粘度，并且提供其制造方法以及用于制造半导体的装置 包含等离子体耐腐蚀石英玻璃的液晶。 基本上包含作为玻璃形成物质的SiO 2 SB的等离子体耐蚀性硅玻璃包含大于10原子％至20原子％的量的铝。 提供了等离子体耐蚀石英玻璃的制造方法和使用其的装置。 版权所有（C）2004，JPO