IMPROVEMENTS IN THE MANUFACTURE OF INTEGRATED CIRCUITS USING HOLOGRAPHIC TECHNIQUES

    公开(公告)号:GB2215484A

    公开(公告)日:1989-09-20

    申请号:GB8902379

    申请日:1989-02-03

    Abstract: Apparatus for the manufacture of integrated circuits using holographic techniques in which a holographic image formed on a first recording medium provided on a glass slab is replayed by being scanned in order to reproduce an image of the holographic image on a second recording medium provided on a silicon slice. The replay source provides a a collimated narrow circular beam or elongated beam which passes normally through a face of the prism, through an index matching liquid located between the prism and the glass slab before being totally internally reflected at the other surface of the glass slab. The collimated replay beam provides control over the effective numerical aperture thus preventing wide angle radiation from degrading the quality of the printed image.

    Method and apparatus for increasing the effective efficiency of holograms

    公开(公告)号:GB0103125D0

    公开(公告)日:2001-03-28

    申请号:GB0103125

    申请日:2001-02-08

    Abstract: A method is disclosed for reconstructing an image from a total internal reflection hologram that includes the steps of arranging the hologram in relation to the first face of a coupling body, generating a substantially collimated illumination beam, directing the beam through a second face of the coupling body so that it reconstructs the image recorded in the hologram, recycling at least once the light in the illumination beam that is reflected from the hologram by redirecting it through the second face of the coupling body so that it also reconstructs the image recorded in the hologram, and scanning the illumination and recycled beams across the hologram, for the purpose of increasing the effective reconstruction efficiency of the total internal reflection hologram.

    Method for printing of a pattern of features

    公开(公告)号:GB2293459A

    公开(公告)日:1996-03-27

    申请号:GB9419086

    申请日:1994-09-22

    Abstract: A method for printing a pattern of features that includes providing a mask defining the pattern of features, recording the pattern in a TIR hologram 9, printing the pattern from the TIR hologram into a photosensitive layer on a substrate by illuminating the TIR hologram with a scanning laser beam having a constant intensity and a constant speed, measuring the departures of the linewidths of the printed features from their desired values, and printing the pattern of features from the TIR hologram into a photosensitive layer 13 on another substrate by illuminating the TIR hologram with a scanning beam 17 and modulating the exposure energy density imparted by the scanning laser beam, either by varying the intensity of the scanning laser beam or by varying its speed, such that the dimensions of the features printed into this photosensitive layer have their desired values.

    Manufacture of alignment marks for holographic lithography

    公开(公告)号:GB2272535B

    公开(公告)日:1995-06-07

    申请号:GB9304716

    申请日:1993-03-08

    Abstract: A method for forming alignment marks and a total internal reflection hologram in a holographic recording layer (14) for a lithographic process such that the alignment marks are readily detectable by an alignment system, including defining alignment marks (10) in a mask (11), said mask also defining the pattern (12) to be reconstructed from said TIR hologram, locating said holographic recording layer and said mask in a TIR hologram recording system, forming a TIR hologram of the mask pattern in the holographic recording layer and transferring the alignment marks in the mask into the holographic recording layer by illuminating the mask with an object beam (18); wherein the features of the alignment marks in the mask are of sufficient size that the alignment marks recorded in the holographic recording layer are well-defined regions of different refractive index and/or layer thickness.

    Apparatus for and a method of transverse position measurement in proximity lithographic systems

    公开(公告)号:GB2249387B

    公开(公告)日:1995-01-25

    申请号:GB9022154

    申请日:1990-10-11

    Abstract: Apparatus for transverse position measurement in a proximity lithographic system including a prism (10) having a glass plate (14) index matched beneath the prism on which a T.I.R. hologram (13) is pre-recorded. A laser source (12) provides a replay beam. A silicon wafer (16) is situated below the hologram and parallel therewith. A second laser source (17) produces through optics (18) a beam with gaussian intensity profile to generate a collimated strip of light (19) at the hologram plane. Elemental grating structures (20) are provided at different locations over the surface of the wafer. Detectors (22,24) collect parts of the lightfield resulting from the interaction of the laser beam with the grating structures. A piezo device (26) operated from a micro-processor (28) moves the silicon wafer in small increments in a direction substantially parallel to the hologram following measurements made by the two detectors which are processed by the micro-processor to produce an alignment signal for the piezo device.

    Total internal reflection holograms

    公开(公告)号:GB2271648A

    公开(公告)日:1994-04-20

    申请号:GB9221561

    申请日:1992-10-14

    Abstract: A method for the manufacture of TIR holograms includes the division of an input laser beam into an object beam and a reference beam, the direction of the beams to a holographic recording layer so that the object beam is incident on a surface of the holographic recording layer following transmission through an object mask, so that the reference beam is incident on the other surface of the holographic recording layer at an angle such that following passage through the holographic recording layer it is totally internally reflected back into the holographic recording layer and so that the two beams are superposed at the holographic recording layer, and the displacement of the input laser beam causing the object and reference beams to traverse together the holographic recording layer. The method is especially useful for obtaining a high uniformity of exposure of the holographic recording layer.

    MANUFACTURE OF ALIGNMENT MARKT FOR HOLOGRAPHIC LITHOGRAPHY

    公开(公告)号:GB9304716D0

    公开(公告)日:1993-04-28

    申请号:GB9304716

    申请日:1993-03-08

    Abstract: A method for forming alignment marks and a total internal reflection hologram in a holographic recording layer (14) for a lithographic process such that the alignment marks are readily detectable by an alignment system, including defining alignment marks (10) in a mask (11), said mask also defining the pattern (12) to be reconstructed from said TIR hologram, locating said holographic recording layer and said mask in a TIR hologram recording system, forming a TIR hologram of the mask pattern in the holographic recording layer and transferring the alignment marks in the mask into the holographic recording layer by illuminating the mask with an object beam (18); wherein the features of the alignment marks in the mask are of sufficient size that the alignment marks recorded in the holographic recording layer are well-defined regions of different refractive index and/or layer thickness.

    ANTI-REFLECTION MASKS
    59.
    发明专利

    公开(公告)号:GB9011165D0

    公开(公告)日:1990-07-04

    申请号:GB9011165

    申请日:1990-05-18

    Abstract: In order to reduce or eliminate undesired fringe patterns occurring in images generated by total internal reflection holograms, the mask (20) is provided with an anti-reflection coating (19) on at least one of its underside surface (26) and top surface (16). An anti-reflection coating (19) provided on the underside surface (26) of the mask (20) may also increase the depth of focus of images generated by total internal reflection holograms.

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