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公开(公告)号：GB2272535A
公开(公告)日：1994-05-18
申请号：GB9304716
申请日：1993-03-08
Applicant: HOLTRONIC TECHNOLOGIES LTD
Inventor： OMAR BASIL ARTHUR
Abstract: A method for forming alignment marks and a total internal reflection hologram in a holographic recording layer (14) for a lithographic process such that the alignment marks are readily detectable by an alignment system, including defining alignment marks (10) in a mask (11), said mask also defining the pattern (12) to be reconstructed from said TIR hologram, locating said holographic recording layer and said mask in a TIR hologram recording system, forming a TIR hologram of the mask pattern in the holographic recording layer and transferring the alignment marks in the mask into the holographic recording layer by illuminating the mask with an object beam (18); wherein the features of the alignment marks in the mask are of sufficient size that the alignment marks recorded in the holographic recording layer are well-defined regions of different refractive index and/or layer thickness.
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公开(公告)号：GB2256475A
公开(公告)日：1992-12-09
申请号：GB9108760
申请日：1991-04-24
Applicant: HOLTRONIC TECHNOLOGIES LTD
Inventor： OMAR BASIL ARTHUR , HAMIDI MASSOUD
IPC: G01B11/14
Abstract: A method of measuring small distances between two parallel or near-parallel semi-reflecting surfaces includes the steps of: positioning one of said surfaces in juxtaposition to a surface of a prism 3, directing an incident beam of coherent radiation 1 having a spherical wavefront onto said surfaces, whose distance therebetween is to be measured, and analyzing the interference pattern produced by the reflection of said incident beam of radiation onto said surfaces by means of a phase shifting technique, thereby obtaining a measurement of the distance of separation therebetween. An apparatus for carrying out the method is also disclosed. The invention is particularly applicable to measuring focus by optical means in T.I.R. holographic systems which employ a prism.
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公开(公告)号：GB2272535B
公开(公告)日：1995-06-07
申请号：GB9304716
申请日：1993-03-08
Applicant: HOLTRONIC TECHNOLOGIES LTD
Inventor： OMAR BASIL ARTHUR
Abstract: A method for forming alignment marks and a total internal reflection hologram in a holographic recording layer (14) for a lithographic process such that the alignment marks are readily detectable by an alignment system, including defining alignment marks (10) in a mask (11), said mask also defining the pattern (12) to be reconstructed from said TIR hologram, locating said holographic recording layer and said mask in a TIR hologram recording system, forming a TIR hologram of the mask pattern in the holographic recording layer and transferring the alignment marks in the mask into the holographic recording layer by illuminating the mask with an object beam (18); wherein the features of the alignment marks in the mask are of sufficient size that the alignment marks recorded in the holographic recording layer are well-defined regions of different refractive index and/or layer thickness.
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公开(公告)号：GB2256475B
公开(公告)日：1995-11-29
申请号：GB9108760
申请日：1991-04-24
Applicant: HOLTRONIC TECHNOLOGIES LTD
Inventor： OMAR BASIL ARTHUR , HAMIDI MASSOUD
IPC: G01B11/14
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