ULTRAVIOLET RADIATION LAMP AND SOURCE MODULE AND TREATMENT SYSTEM CONTAINING SAME
    52.
    发明申请
    ULTRAVIOLET RADIATION LAMP AND SOURCE MODULE AND TREATMENT SYSTEM CONTAINING SAME 审中-公开
    ULTRAVIOLET辐射灯和源模块及其处理系统

    公开(公告)号:WO2007025376A2

    公开(公告)日:2007-03-08

    申请号:PCT/CA2006/001420

    申请日:2006-08-31

    Abstract: The invention relates to an ultraviolet radiation lamp. The lamp comprises a substantially sealed cavity comprising a mercury-containing material; a filament disposed in the sealed cavity; and an electrical control element in contact with the filament, the electrical control element configured to adjust or maintain a temperature of the mercury-containing material with respect to a prescribed temperature. Such a constructions allows the present ultraviolet radiation lamp to be operated at optimal efficiency without the need to use additional components to add heat to and/or remove heat from the mercury-containing material.

    Abstract translation: 本发明涉及一种紫外线辐射灯。 该灯包括包含含汞材料的基本上密封的空腔; 设置在密封空腔中的细丝; 以及与灯丝接触的电气控制元件,所述电气控制元件构造成调节或维持含汞材料相对于规定温度的温度。 这种结构允许本发明的紫外线辐射灯以最佳的效率运行,而不需要使用额外的部件来加热和/或从含汞材料中去除热量。

    OPTICAL RADIATION SENSOR SYSTEM AND METHOD FOR MEASURING RADIATION TRANSMITTANCE OF A FLUID
    53.
    发明申请
    OPTICAL RADIATION SENSOR SYSTEM AND METHOD FOR MEASURING RADIATION TRANSMITTANCE OF A FLUID 审中-公开
    光学辐射传感器系统和测量流体辐射传输的方法

    公开(公告)号:WO2005100956A1

    公开(公告)日:2005-10-27

    申请号:PCT/CA2005/000595

    申请日:2005-04-19

    Abstract: There is disclosed a process for measuring transmittance of a fluid in a radiation field comprising polychromatic radiation - i.e., radiation at a first wavelength and radiation at a second wavelength different from the first wavelength. The process comprises the steps of: (i) positioning a polychromatic radiation source and a polychromatic radiation sensor element in a spaced relationship to define a first thickness of fluid in the radiation field; (ii) detecting a first . radiation intensity corresponding to radiation at the first wavelength received by the sensor element at the first thickness; (iii) detecting a second radiation intensity corresponding to radiation at the second wavelength received by the sensor element at the first thickness; (iv) altering the first thickness to define a second thickness; (v) detecting a third radiation intensity corresponding to radiation at the first wavelength received by the sensor element at the second thickness; (vi) detecting a fourth radiation intensity corresponding to radiation at the second wavelength received by the sensor element at the second thickness; and (vii) calculating radiation transmittance of the fluid in the radiation field from the first radiation intensity, the second radiation intensity, the third radiation intensity and the fourth radiation intensity. Thus, the present process relates to a novel manner to measure UV transmittance of a fluid in an on-line or random measurement manner.

    Abstract translation: 公开了一种用于测量包括多色辐射 - 即第一波长的辐射和不同于第一波长的第二波长的辐射的辐射场中的流体的透射率的方法。 该方法包括以下步骤:(i)以间隔关系定位多色辐射源和多色辐射传感器元件,以在辐射场中限定第一厚度的流体; (ii)检测第一。 辐射强度对应于传感器元件以第一厚度接收的第一波长的辐射; (iii)检测对应于由传感器元件以第一厚度接收的第二波长的辐射的第二辐射强度; (iv)改变所述第一厚度以限定第二厚度; (v)检测对应于由传感器元件以第二厚度接收的第一波长的辐射的第三辐射强度; (vi)检测对应于由第二厚度传感器元件接收的第二波长的辐射的第四辐射强度; 和(vii)从第一辐射强度,第二辐射强度,第三辐射强度和第四辐射强度计算辐射场中的流体的辐射透射率。 因此,本方法涉及以在线或随机测量方式测量流体的UV透射率的新颖方式。

    FLUID TREATMENT SYSTEM
    54.
    发明申请
    FLUID TREATMENT SYSTEM 审中-公开
    流体处理系统

    公开(公告)号:WO2005087277A1

    公开(公告)日:2005-09-22

    申请号:PCT/CA2005/000375

    申请日:2005-03-14

    Abstract: The present invention relates to a fluid treatment system comprising: an inlet; an outlet; and a fluid treatment zone disposed between the inlet and the outlet. The fluid treatment zone has disposed therein: (i) an. elongate first radiation source assembly having a first longitudinal axis, and (ii) an elongate second radiation source assembly having a second longitudinal axis. The first longitudinal axis and the second longitudinal axis are non-parallel to each other and to a direction of fluid flow through the fluid treatment zone. The present fluid treatment system has a number of advantages including: it can treat large volumes of fluid (e.g., wastewater, drinking water or the like); it requires a relatively small "footprint"; it results in a relatively lower coefficient of drag resulting in an improved hydraulic pressure loss/gradient over the length of the fluid treatment system; and it results in relatively lower (or no) forced oscillation of the radiation sources thereby obviating or mitigating of breakage of the radiation source and/or protective sleeve (if present). Other advantages are discussed in the specification.

    Abstract translation: 本发明涉及一种流体处理系统,包括:入口; 一个出口 以及设置在入口和出口之间的流体处理区。 流体处理区设置在其中:(i) 具有第一纵向轴线的细长的第一辐射源组件,和(ii)具有第二纵向轴线的细长的第二辐射源组件。 第一纵向轴线和第二纵向轴线彼此不平行,并且流过流体处理区域的流体的方向。 本流体处理系统具有许多优点,包括:它可以处理大量流体(例如,废水,饮用水等); 它需要相对较小的“足迹”; 它导致相对较低的阻力系数导致在流体处理系统的长度上改善的液压损失/梯度; 并且其导致辐射源的相对较低(或不)强制振荡,从而消除或减轻辐射源和/或保护套筒(如果存在)的断裂。 其他优点在说明书中讨论。

    SYSTEM FOR PREDICTING REDUCTION IN CONCENTRATION OF A TARGET MATERIAL IN A FLOW OF FLUID
    55.
    发明申请
    SYSTEM FOR PREDICTING REDUCTION IN CONCENTRATION OF A TARGET MATERIAL IN A FLOW OF FLUID 审中-公开
    流体流中目标物质浓度减少预测系统

    公开(公告)号:WO2005084720A1

    公开(公告)日:2005-09-15

    申请号:PCT/CA2005/000364

    申请日:2005-03-10

    Abstract: An ultraviolet fluid treatment system having feedback control using a kinetic model and a reactor model that interact with one another. The kinetic model uses readily measured fluid properties upstream and downstream of a radiation zone to calculate the conversion of a target contaminant as it passes through the fluid treatment system. This obviates the need to measure the contaminant concentration directly, which generally is too slow to permit real-time control. A reactor model relates system operating cost to system operating parameters, such as electrical power consumption and/or rate of oxidant addition, where applicable. The reactor model is linked to the kinetic model and is used to optimize operating cost by adjusting system operating parameters based on a comparison between the conversion obtained from the kinetic model and the overall treatment objectives. A control center, an ultraviolet fluid treatment apparatus, and a method of treating a fluid are also disclosed.

    Abstract translation: 具有使用动力学模型和相互作用的反应器模型的反馈控制的紫外线流体处理系统。 动力学模型使用辐射区上游和下游的容易测量的流体特性来计算目标污染物通过流体处理系统时的转化率。 这避免了直接测量污染物浓度的需要,这通常太慢,无法实时控制。 反应器模型将系统运行成本与系统运行参数(如适用的电力消耗和/或氧化剂添加速率)相关联。 反应器模型与动力学模型相关联,并且用于通过基于从动力学模型获得的转化与总体处理目标之间的比较来调整系统操作参数来优化操作成本。 还公开了一种控制中心,紫外线流体处理装置和处理流体的方法。

    FLUID TREATMENT SYSTEM AND RADIATION SOURCE MODULE FOR USE THEREIN
    56.
    发明申请
    FLUID TREATMENT SYSTEM AND RADIATION SOURCE MODULE FOR USE THEREIN 审中-公开
    流体处理系统及其使用的辐射源模块

    公开(公告)号:WO2004000735A1

    公开(公告)日:2003-12-31

    申请号:PCT/CA2003/000925

    申请日:2003-06-19

    Abstract: A radiation source module comprising a support member, a radiation source assembly connected to the support member, the radiation source assembly comprising at least one elongate radiation source having a source longitudinal axis and a module-to-surface seal disposed on a first elongate surface of the module, the first elongate surface comprising a first longitudinal axis transverse to the source longitudinal axis, the seal operable to provide a substantially fluid tight seal between the first surface and a second surface which is adjacent to the first surface. A fluid treatment system employ the radiation source module is also described.

    Abstract translation: 辐射源模块,包括支撑构件,连接到所述支撑构件的辐射源组件,所述辐射源组件包括至少一个细长辐射源,所述辐射源组件具有源纵向轴线和模块到表面密封件,所述辐射源组件设置在第一细长表面上 所述模块,所述第一细长表面包括横向于所述源纵向轴线的第一纵向轴线,所述密封件可操作以在所述第一表面与邻近所述第一表面的第二表面之间提供基本上流体密封的密封。 还描述了采用辐射源模块的流体处理系统。

    CLEANING FORMULATION AND METHOD OF CLEANING SURFACES
    57.
    发明申请
    CLEANING FORMULATION AND METHOD OF CLEANING SURFACES 审中-公开
    清洁配方和清洁表面的方法

    公开(公告)号:WO2003078559A1

    公开(公告)日:2003-09-25

    申请号:PCT/CA2003/000394

    申请日:2003-03-20

    Abstract: A cleaning formulation comprising a cleaning agent, a particulate clay material and an aqueous carrier. In a preferred embodiment, the formulation has a pH less than about 1.0 and is characterized by: (i) at least a 90% reduction in viscosity at 25°C at a shear rate of up to about 0.10 s -1 , and (ii) a substantially unchanged viscosity for a period of at least 60 days. The cleaning formulation is thixotropic and has a highly desirable combination of acid stability, temperature stability, electrolyte stability and ultraviolet radiation stability.

    Abstract translation: 一种清洁制剂,其包含清洁剂,颗粒状粘土材料和水性载体。 在优选的实施方案中,制剂具有小于约1.0的pH,其特征在于:(i)在剪切速率高达约0.10s -1的情况下在25℃下至少90%的粘度降低,以及 (ii)至少60天的时间内基本上不变的粘度。 清洗配方是触变性的,具有很好的酸稳定性,温度稳定性,电解液稳定性和紫外线辐射稳定性的组合。

    OPTICAL RADIATION SENSOR DEVICE
    58.
    发明申请
    OPTICAL RADIATION SENSOR DEVICE 审中-公开
    光学辐射传感器设备

    公开(公告)号:WO1995019553A1

    公开(公告)日:1995-07-20

    申请号:PCT/CA1995000020

    申请日:1995-01-13

    Abstract: An optical radiation sensor comprising a housing having an inlet which allows radiation to enter the housing, and further comprising the following elements serially disposed after the inlet in the path of the radiation: attenuating aperture means, filter means and sensor means. The attenuating aperture means reduce the amount of UV radiation on the sensor means and improve the sensors resistance to degradation in a high intensity UV radiation environment. A fluid disinfection system incorporating the sensor is also described.

    Abstract translation: 一种光辐射传感器,包括具有允许辐射进入壳体的入口的壳体,并且还包括以下元件,其串联地布置在辐射路径中的入口之后:衰减孔口装置,过滤装置和传感器装置。 衰减孔径意味着减少传感器装置上的UV辐射量并且改善传感器在高强度紫外线辐射环境中的降解性能。 还描述了结合传感器的流体消毒系统。

    UV DISINFECTION UNIT
    59.
    发明申请
    UV DISINFECTION UNIT 审中-公开
    UV消毒装置

    公开(公告)号:WO1995019188A1

    公开(公告)日:1995-07-20

    申请号:PCT/CA1995000005

    申请日:1995-01-13

    Abstract: A fluid disinfection unit comprising a fluid treatment housing, an electrical supply module and electrical connection means connecting the fluid treatment housing and the electrical supply module; the fluid treatment housing comprising a fluid inlet and a fluid outlet in communication with a reaction chamber, an ultraviolet radiation lamp disposed in the reaction chamber and having a first electrical connection receiving means at a first end thereof and a second end thereof being closed, the second end of the ultraviolet radiation lamp being received and held in place by fixture means; the electrical supply module comprising ballast means and a second electrical connection receiving means; and the electrical connection means comprising lamp receptacle connector means at one end thereof for removable connection to the ultraviolet radiation lamp and electrical connection receiving means for connection to the electrical supply module.

    Abstract translation: 流体消毒单元,包括流体处理壳体,电源模块和连接流体处理壳体和电源模块的电连接装置; 流体处理壳体包括与反应室连通的流体入口和流体出口,设置在反应室中的紫外线辐射灯,并且在其第一端处具有第一电连接接收装置,其第二端被封闭, 紫外线灯的第二端由固定装置接收并保持就位; 所述电源模块包括镇流器装置和第二电连接接收装置; 并且所述电连接装置在其一端包括灯插座连接器装置,用于可拆卸地连接到紫外线灯和用于连接到电源模块的电连接接收装置。

    FLUID TREATMENT SYSTEM AND PROCESS
    60.
    发明申请
    FLUID TREATMENT SYSTEM AND PROCESS 审中-公开
    流体处理系统和流程

    公开(公告)号:WO1994020208A1

    公开(公告)日:1994-09-15

    申请号:PCT/CA1994000125

    申请日:1994-03-04

    Abstract: A fluid treatment system includes one or more radiation sources arranged in an irradiation zone within a treatment zone through which fluid to be treated passes and is irradiated. The irradiation zone has a closed cross section to maintain the fluid within a predefined maximum distance from the radiation source. Preferably, the irradiation zone comprises a reduced cross-sectional area perpendicular to the direction of fluid flow and thus the fluid flow velocity is increased through the irradiation zone. This allows the fluid to enter the treatment zone at relatively low speed, traverse the irradiation zone at high speed and exit the treatment zone again at relatively low speed to minimize the loss of hydraulic head throughout the system. Fluid entering the treatment zone passes through an inlet transition region wherein the cross-sectional area is reduced prior to entering the irradiation zone and fluid exiting the irradiation zone passes through an outlet transition region wherein the cross-sectional area is increased. Each transition region is designed to reduce hydraulic head losses as the fluid flow velocity is increased and decreased. In the irradiation zone, radiation sources are mounted on radiation modules which are arranged to provide improved accessibility for maintenance. The radiation modules may also be provided with cleaning assemblies which are operable to remove materials fouling the radiation sources in situ while the radiation sources are in the irradiation zone.

    Abstract translation: 流体处理系统包括布置在处理区域内的照射区域中的一个或多个辐射源,通过该处理区域照射待处理的流体。 照射区域具有封闭的横截面,以将流体保持在与辐射源预定的最大距离内。 优选地,照射区域包括垂直于流体流动方向的减小的横截面面积,因此流体流速通过照射区域增加。 这允许流体以相对低的速度进入处理区域,以高速穿过照射区域,并以相对低的速度再次离开处理区域,以最小化整个系统中液压头的损失。 进入处理区的流体通过入口过渡区,其中在进入照射区之前横截面积减小,并且离开照射区的流体通过其横截面积增加的出口过渡区。 每个过渡区域被设计成随着流体流速的增加和减小而减小液压头损失。 在照射区域中,辐射源安装在辐射模块上,辐射模块被布置成提供改进的维护可达性。 辐射模块还可以设置有清洁组件,其可操作以在放射源处于照射区域的同时移除原位污染辐射源的材料。

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