公开(公告)号：KR1020110021552A

公开(公告)日：2011-03-04

申请号：KR1020090079415

申请日：2009-08-26

Applicant: 삼성전자주식회사

Inventor： 김민하 ,  박정수 ,  박흥준 ,  주성태 ,  양동헌

IPC: A47L9/18 ,  A47L9/16

CPC classification number: A47L9/1683 ,  A47L9/1633 ,  A47L9/1641 ,  A47L9/181 ,  A47L9/182 ,  A47L9/185 ,  A47L9/18 ,  A47L9/00 ,  A47L9/16

Abstract: PURPOSE: A wet-type dust collecting apparatus of a vacuum cleaner is provided to minimize the overflow of water even if the water swirls in a duct collecting apparatus and the dust collecting apparatus inclines. CONSTITUTION: A wet-type dust collecting apparatus of a vacuum cleaner comprises firs and second separating units. The first separating unit rotates air, which flows into through a first intake hole(201), to separate and discharge dust. The second centrifugal separating part(B') of the second separating unit separates the dust from the air, which has been discharged from the first separating unit. The second centrifugal separating part removes the dust using an inner water.

Abstract translation: 目的：提供一种真空吸尘器的湿式集尘装置，用于尽可能减少水的溢出，即使水在涡卷收集装置中旋转并且集尘装置倾斜。 构成：真空吸尘器的湿式集尘装置包括第一和第二分离单元。 第一分离单元旋转通过第一进气孔（201）流入的空气，以分离和排出灰尘。 第二分离单元的第二离心分离部分（B'）从已经从第一分离单元排出的空气中分离灰尘。 第二离心分离部件使用内水除去灰尘。

公开(公告)号：KR1020100045187A

公开(公告)日：2010-05-03

申请号：KR1020080104260

申请日：2008-10-23

Applicant: 삼성전자주식회사

Inventor： 서형원 ,  신수호 ,  이원우 ,  박정수

IPC: H01L27/108 ,  H01L21/8242

Abstract: PURPOSE: A semiconductor memory device is provided to reduce a chip size by using recess type balancing capacitors which has large capacitance value per unit region. CONSTITUTION: A sense amplifier block is arranged between memory cell blocks. The sense amplifier block comprises sense amplifiers interlinking the bit line of memory cell blocks. An edge sense amplifier block comprises edge sense amplifiers in which the half of bit lines of the outermost memory cell blocks among the memory cell blocks are connected to a first input. A balancing capacitor part offers a balancing bit line(BBL0-BBL2) connected to a second input of the sense amplifiers. The balancing capacitor part comprises balancing capacitors(72,73) connected to the balancing bit line. The balancing capacitors are connected through a contact(82) to the balancing bit lines.

Abstract translation: 目的：提供半导体存储器件，通过使用每单位区域具有大的电容值的凹槽型平衡电容器来减小芯片尺寸。 构成：在存储单元块之间布置读出放大器块。 读出放大器块包括将存储器单元块的位线互连的读出放大器。 边缘读出放大器块包括边沿读出放大器，其中存储单元块中的最外存储器单元块的位线的一半连接到第一输入。 平衡电容器部件提供连接到读出放大器的第二输入端的平衡位线（BBL0-BBL2）。 平衡电容器部分包括连接到平衡位线的平衡电容器（72,73）。 平衡电容器通过触点（82）连接到平衡位线。

公开(公告)号：KR1020090079697A

公开(公告)日：2009-07-22

申请号：KR1020080005855

申请日：2008-01-18

Applicant: 삼성전자주식회사 ,  연세대학교 산학협력단

Inventor： 우상옥 ,  정석윤 ,  권권택 ,  한탁돈 ,  박우찬 ,  정우남 ,  박진홍 ,  박정수

IPC: G06T1/20 ,  G06T15/00

CPC classification number: G06T15/405

Abstract: A rendering device and a method thereof are provided to obtain a depth value from a depth buffer and perform a depth test by using the read depth value as consuming a minimum memory bandwidth. A rendering device comprises a depth buffer(110) and a rendering unit(120). In the depth buffer, blocks as pixels having each depth value are compressed and stored. In consideration of frequency information which is prepared in advance while showing the number of fixed value among the depth values of the block corresponding to a fragment, the rendering unit reads the block corresponding to the fragment from the depth buffer. The rendering unit restores the read block. The rendering unit performs a depth test for the fragment in consideration of the restored block.

Abstract translation: 提供了一种渲染设备及其方法，以从深度缓冲器获得深度值，并通过使用读取的深度值来消耗最小存储器带宽来执行深度测试。 渲染设备包括深度缓冲器（110）和渲染单元（120）。 在深度缓冲器中，压缩并存储具有每个深度值的像素的块。 考虑到在显示对应于片段的块的深度值中的固定值的数量的情况下预先准备的频率信息，渲染单元从深度缓冲器读取与片段相对应的块。 渲染单元恢复读块。 考虑到恢复的块，渲染单元对片段进行深度测试。

公开(公告)号：KR100608609B1

公开(公告)日：2006-08-09

申请号：KR1020000035903

申请日：2000-06-28

Applicant: 삼성전자주식회사

Inventor： 강희철 ,  이도우 ,  박정수 ,  김용환

IPC: H01L21/56

Abstract: 본 발명은 반도체 칩 패키지 몰딩 장치에 관한 것으로서, 성형하고자 하는 반도체 칩 패키지의 외형과 동일한 모양을 한 복수의 캐비티를 갖는 상하부 캐비티 블록과, 상기 상하부 캐비티 블록을 포함하는 상하부 금형과, 상기 상하부 금형에 압력을 가하는 프레스를 포함하며, 상기 상하부 캐비티 블록의 하부 캐비티 블록은 하부면에 오목부가 형성되어 있다. 하부 캐비티 블록의 하부면에 형성된 오목부는 실질적인 압력이 필요한 부분(예컨대, 리드 프레임의 댐바(dam bar)면 또는 금형의 릴리프(relief)면)에 충분한 압력이 전달되도록 함으로써 프레스의 톤수 부족에 따른 압력을 보상한다.

公开(公告)号：KR1020040040680A

公开(公告)日：2004-05-13

申请号：KR1020020068875

申请日：2002-11-07

Applicant: 삼성전자주식회사

Inventor： 박정수

IPC: F16B35/06

CPC classification number: F16B23/0092 ,  F16B23/0015 ,  F16B23/0023 ,  F16B23/0038

Abstract: PURPOSE: A bolt is provided to allow the bolt to be screw-coupled into an object by using both wrench and driver by forming first and second holes in a head section of the bolt for a wrench and a driver respectively. CONSTITUTION: A bolt(100) includes a body section(110), and a head section(120) formed at one side of the body section(110). The body section(110) is formed at an outer peripheral surface thereof with a screw. The head section(120) has a wrench slot(124) having a hexagonal shape. A driver slot(126) is formed at a bottom of the wrench slot(124). When the wrench slot(124) is damaged, a user fastens the bolt(100) by inserting a driver into the driver slot(126). The driver slot(126) has a linear shape or a cross shape.

Abstract translation: 目的：提供螺栓，以通过在扳手和驱动器的螺栓的头部中形成第一和第二孔来通过使用扳手和驱动器将螺栓螺纹连接到物体中。 构成：螺栓（100）包括主体部分（110）和形成在主体部分（110）的一侧的头部部分（120）。 主体部（110）在其外周面形成有螺钉。 头部（120）具有六边形形状的扳手槽（124）。 扳手槽（126）形成在扳手槽（124）的底部。 当扳手槽（124）损坏时，用户通过将驱动器插入驱动器槽（126）来紧固螺栓（100）。 驱动器槽（126）具有线性形状或十字形状。

公开(公告)号：KR1020040003334A

公开(公告)日：2004-01-13

申请号：KR1020020038000

申请日：2002-07-02

Applicant: 삼성전자주식회사

Inventor： 박정수

IPC: H01L21/00

Abstract: PURPOSE: A sealing apparatus for a semiconductor manufacturing process is provided to be capable of stably conserving process atmosphere and simultaneously improving the yield of products by using a double pipe structure. CONSTITUTION: A sealing apparatus for a semiconductor manufacturing process, is provided with a process chamber(10) for carrying out corresponding processes while conserving vacuum atmosphere at the inner portion and a connecting part(20) for being connected to the process chamber from the outside. The sealing apparatus further includes the first bellows pipe(30) for connecting the process chamber with the connecting part and the second bellows pipe(40) for connecting the process chamber with the connecting part at the outer portion of the first bellows pipe. At this time, the second bellows pipe has a larger diameter than that of the first bellows pipe.

Abstract translation: 目的：提供一种用于半导体制造工艺的密封装置，其能够通过使用双管结构来稳定地保持工艺气氛并同时提高产品的产量。 构成：用于半导体制造工艺的密封装置设置有用于在保持内部的真空气氛的同时进行相应的处理的处理室（10）和用于从外部连接到处理室的连接部（20） 。 密封装置还包括用于将处理室与连接部分连接的第一波纹管（30）和用于将处理室与第一波纹管的外部部分处的连接部分连接的第二波纹管（40）。 此时，第二波纹管的直径比第一波纹管的直径大。

公开(公告)号：KR1020030091232A

公开(公告)日：2003-12-03

申请号：KR1020020029109

申请日：2002-05-25

Applicant: 삼성전자주식회사

Inventor： 박정수 ,  진교영 ,  양원석 ,  송두헌

IPC: H01L21/76

Abstract: PURPOSE: A method for fabricating a semiconductor device using a trench is provided to reduce a junction leakage current by forming an active region penetrating oxide layer or insulation layer under a junction, and to decrease parasitic capacitance by decreasing the quantity of injected impurities for forming a source/drain region. CONSTITUTION: Oxidation accelerating ions are implanted into a semiconductor substrate(210) to form an oxidation accelerating ion implantation layer(212) having a predetermined depth from the surface of the substrate. A mask pattern fro defining an active region and a trench formation region is formed on the semiconductor substrate. The semiconductor substrate is etched to form a trench by using the mask pattern as an etch mask until the oxidation accelerating ion implantation layer is exposed. The exposed oxidation accelerating ion implantation layer is selectively oxidized to form an oxide layer penetrating the inside of the active region. The trench is filled with an insulation layer.

Abstract translation: 目的：提供一种使用沟槽制造半导体器件的方法，用于通过在结下形成穿透氧化物层或绝缘层的有源区域来减少结漏电流，并且通过减少用于形成沟道的注入杂质的量来降低寄生电容 源/漏区。 构成：将氧化加速离子注入到半导体衬底（210）中以形成从衬底的表面具有预定深度的氧化加速离子注入层（212）。 在半导体衬底上形成限定有源区和沟槽形成区的掩模图案。 通过使用掩模图案作为蚀刻掩模蚀刻半导体衬底以形成沟槽，直到暴露氧化加速离子注入层。 暴露的氧化加速离子注入层被选择性地氧化以形成穿透有源区的内部的氧化物层。 沟槽填充有绝缘层。

公开(公告)号：KR3002679130000S

公开(公告)日：2000-12-15

申请号：KR3019990032446

申请日：1999-12-31

Applicant: 삼성전자주식회사

Designer： 박정수

公开(公告)号：KR1020000009645A

公开(公告)日：2000-02-15

申请号：KR1019980030198

申请日：1998-07-27

Applicant: 삼성전자주식회사

Inventor： 박정수

IPC: D06F37/24

CPC classification number: D06F37/24 ,  D06F37/203 ,  F16F9/00

Abstract: PURPOSE: A washing machine is provided to efficiently damp vibration as an elastic member placed along with the front and the rear direction of a casing has a different spring constant. CONSTITUTION: The washing machine has: a casing(1) formed with a front face opening hole(3); a plate-type top cover(5) connected to the upper end of the casing; a door(7) connected to rotate and open and close the front face opening hole; a detergent container(9) on the upper part area of the front face of the casing; a front face manipulating unit(11) having plural manipulating buttons(13) on one side of the detergent container; a buffer(18) connected on the lower side of a tub(15).

Abstract translation: 目的：提供一种洗衣机，以便随着与壳体的前后方向一起放置的弹性构件具有不同的弹簧常数来有效地衰减振动。 构成：洗衣机具有形成有前面开孔（3）的壳体（1）。 连接到所述壳体的上端的板式顶盖（5）; 连接以旋转并打开和关闭前表面开孔的门（7）; 洗涤剂容器（9），位于所述壳体的前表面的上部区域; 在所述洗涤剂容器的一侧具有多个操作按钮（13）的前面操纵部（11） 连接在桶（15）的下侧的缓冲器（18）。

公开(公告)号：KR200153680Y1

公开(公告)日：1999-08-02

申请号：KR2019950007299

申请日：1995-04-12

Applicant: 삼성전자주식회사

Inventor： 박정수 ,  이유신

IPC: D06F37/40

Abstract: 본 고안은 세탁기의 동력전달장치의 관한 것으로, 더욱 상세하게는 세탁시 회전조의 공회전방지와 탈수시 제동기능을 수행하는 일방향 롤러클러치와 밴드브레이크 대신 베어클러치를 설치하여 제동시의 소음저감과 제조원가를 감소시키는 세탁기의 동력전달장치에 관한 것이다.
본 고안에 따른 동력전달장치는 모터의 회전력을 회전조로 전달하는 중공의 탈수축에 탈수축의 탈수 회전방향과 반대방향의 회전을 억제하는 상부 베어클러치와, 탈수축의 탈수 회전방향의 회전을 억제하도록 상부 베어클러치와 반대로 설치되는 하부 베어클러치가 구비되되, 두 베어클러치는 탈수축과 함께 회전되도록 내면이 탈수축의 외면에 고정되며 그 외면이 테이퍼면으로 구성된 내륜과, 내륜의 외측에 상하로 이동 가능하게 설치되며 그 내면이 내륜의 외면과 대응하는 테이퍼면으로 구성된 외륜과, 외륜과 내륜 사이에 설치되되 외륜과 내륜의 일방향 회전을 제한할 수 있도록 일정각도 비틀리게 설치된 다수의 롤러를 구비하며, 클러치레버가 동작될 때 하부 베어클러치의 외륜이 상하로 이동되어서 하부 베어클러치의 제동이 해지될 수 있� ��록 일측이 하부베어클러치의 외륜에 접하고 타측이 클러치레버에 연결된 조절레버가 구비된 것이다.