플라스마 처리를 이용한 전도성 고분자의 고상 도핑 방법 및 이를 위한 장치
    55.
    发明公开
    플라스마 처리를 이용한 전도성 고분자의 고상 도핑 방법 및 이를 위한 장치 无效
    使用等离子体和导电聚合物的导电聚合物的固体掺杂方法

    公开(公告)号:KR1020110045668A

    公开(公告)日:2011-05-04

    申请号:KR1020090102333

    申请日:2009-10-27

    Abstract: PURPOSE: A solid doping method of conductive polymers using plasma is provided to enlarge the field of application of conductive polymers by solid doping conductive polymers using plasma treatment of conjugated conductive polymers which have high dispersibility in a solvent and does not have conductivity. CONSTITUTION: A solid doping method of conductive polymers using plasma comprises the steps of: manufacturing conductive polymer nanoparticles or solid molded materials containing conductive polymer nanoparticles; and treating the conductive polymer nanoparticles or solid molded materials containing conductive polymer nanoparticles with plasma.

    Abstract translation: 目的:提供使用等离子体的导电聚合物的固体掺杂方法,以通过使用在溶剂中具有高分散性并且不具有导电性的共轭导电聚合物的等离子体处理来扩大使用固体掺杂导电聚合物的导电聚合物的应用领域。 构成:使用等离子体的导电聚合物的固体掺杂方法包括以下步骤:制备导电聚合物纳米颗粒或含有导电聚合物纳米颗粒的固体模塑材料; 并用等离子体处理含有导电聚合物纳米粒子的导电聚合物纳米颗粒或固体模塑材料。

    전자 주게 및 전자 받게를 포함하는 폴리엔 화합물을 포함하는 결정의 성장 특성 조절 방법
    56.
    发明公开
    전자 주게 및 전자 받게를 포함하는 폴리엔 화합물을 포함하는 결정의 성장 특성 조절 방법 失效
    用于控制含有电子和电子受体的聚烯烃化合物的晶体的生长特性的方法

    公开(公告)号:KR1020110016712A

    公开(公告)日:2011-02-18

    申请号:KR1020090074345

    申请日:2009-08-12

    Inventor: 권오필 최은영

    Abstract: PURPOSE: A method for controlling growth characteristics of crystals is provided to obtain crystals containing polyene compounds with a thick thickness suitable as broadband THz generation sources. CONSTITUTION: A method for controlling growth characteristics of crystals comprises a step for growing polyene compounds including electron-donors represented by chemical formula 1 and electron-acceptors in the presence of metal salt additives in a solvent. In chemical formula 1, n is 1, 2, 3 or 4; R1 and R2 are selected from the group consisting of H, deuterium, -OH, ester group, C1~4 alkoxy group, -NH2, -NHR4, -NR5R6, and per-halogenated, halogenated or non-halogenated aliphatic group or aromatic group; and R3 is -OH, ester group, C1~4 alkoxy group, -NH2, -NHR7, and -NR8R9.

    Abstract translation: 目的:提供一种控制晶体生长特性的方法,以获得具有适合作为宽带THz发生源的厚度的含有多烯化合物的晶体。 构成:用于控制晶体生长特性的方法包括在溶剂中在金属盐添加剂存在下生长包括由化学式1表示的电子给体的多烯化合物和电子受体的步骤。 化学式1中,n为1,2,3或4; R 1和R 2选自H,氘,-OH,酯基,C 1-4烷氧基,-NH 2,-NHR 4,-NR 5 R 6和全卤代,卤代或非卤代脂族基团或芳族基团 ; 并且R 3是-OH,酯基,C 1-4烷氧基,-NH 2,-NHR 7和-NR 8 R 9。

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