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公开(公告)号：KR1020070111922A
公开(公告)日：2007-11-22
申请号：KR1020060045370
申请日：2006-05-19
Applicant: 충남대학교산학협력단
CPC classification number: C08J3/24 , B81B7/00 , B82B3/0038
Abstract: A method for producing an inorganic fluid pattern structure is provided to obtain a microstructure having excellent resistance against organic solvent permeation, heat stability and friction/wear characteristics through a cost-efficient process applied to plastic materials. A method for producing an inorganic fluid pattern structure comprises the steps of: (a) coating an inorganic polymer precursor onto a substrate having a nano-/micro-pattern; (b) carrying out crosslinking of the inorganic polymer by using any one process selected from a thermal crosslinking process and optical crosslinking process; and (c) separating the substrate from the crosslinked inorganic polymer to allow the pattern to be transferred to the crosslinked inorganic polymer. The crosslinked inorganic polymer is pyrolyzed at 600-1200°C under a non-activated gas.
Abstract translation: 提供了一种制备无机流体图形结构的方法，以通过应用于塑料材料的成本有效的方法获得具有优异的耐有机溶剂渗透性，热稳定性和摩擦/磨损特性的微结构。 一种制备无机流体图形结构的方法包括以下步骤：（a）将无机聚合物前体涂覆到具有纳米/微图案的基底上; （b）使用选自热交联法和光学交联法的任何一种方法进行无机聚合物的交联; 和（c）将基底与交联的无机聚合物分离以使图案转移到交联的无机聚合物中。 交联的无机聚合物在600-1200℃下在非活性气体下热解。
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公开(公告)号：KR1020130028359A
公开(公告)日：2013-03-19
申请号：KR1020110091852
申请日：2011-09-09
Applicant: 충남대학교산학협력단
CPC classification number: B01J19/0093 , B01J10/02 , B01J19/0053 , B01J2219/00781 , C07C245/04
Abstract: PURPOSE: A micro-reactor, a manufacturing method thereof, and a photooxygenation reaction method using thereof are provided to secure the safety for the toxicity of fluid by coating an inner wall of a dual channel divided by a gas transparent film with a chemical resistance material. CONSTITUTION: A micro-reactor includes an upper layer channel(1), a lower layer channel(2), and a gas transparent film(3) installed in between the channels. A coating layer(5) coated with a chemical resistance material is located on the upper inside surface of the upper layer channel. The chemical resistance material is selected from polyvinylsilazane, polycarbosilane, polyethylene glycol, tetraethyl orthosilicate, or a transparent fluoropolymer.
Abstract translation: 目的：提供微反应器及其制造方法和使用其的光氧化反应方法，以通过用耐化学性材料涂覆双通道分隔的气体透明膜的内壁来确保流体的毒性的安全性 。 构成：微反应器包括上层通道（1），下层通道（2）和安装在通道之间的气体透明薄膜（3）。 涂覆有耐化学性材料的涂层（5）位于上层通道的上内表面上。 耐化学性材料选自聚乙烯硅氮烷，聚碳硅烷，聚乙二醇，原硅酸四乙酯或透明含氟聚合物。
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公开(公告)号：KR1020120079503A
公开(公告)日：2012-07-13
申请号：KR1020110000708
申请日：2011-01-05
Applicant: 충남대학교산학협력단
CPC classification number: B01J19/0093 , B81B7/00
Abstract: PURPOSE: A method for manufacturing a film type micro reactor with three dimensional multi-layered micro-channels is provided to improve the chemical characteristic, the thermal characteristic, and the mechanical characteristic of the micro-channels by implementing a single bonding process. CONSTITUTION: A method for manufacturing a film type micro reactor with three dimensional multi-layered micro-channels includes the following: a polymer film is etched to form one or more kinds of micro-channels; three or more polymer films with micro-channels are stacked using a metal pin; and a single bonding process is implemented to the stacked polymer films. The polymer film includes polyimide, polyethylene, fluorinated ethylene propylene, polypropylene, poly(ethylene terephthalate), poly(ethylene naphthalate), or polysulfone.
Abstract translation: 目的：提供一种制造具有三维多层微通道的薄膜式微反应器的方法，通过实施单一粘合工艺来提高微通道的化学特性，热特性和机械特性。 构成：制造具有三维多层微通道的薄膜型微反应器的方法包括：将聚合物薄膜蚀刻以形成一种或多种微通道; 使用金属针堆叠三个或更多个具有微通道的聚合物膜; 并且对堆叠的聚合物膜实施单个粘合工艺。 聚合物膜包括聚酰亚胺，聚乙烯，氟化乙烯丙烯，聚丙烯，聚（对苯二甲酸乙二醇酯），聚萘二甲酸乙二醇酯或聚砜。
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Patent Agency Ranking
公开(公告)号：KR100928184B1
公开(公告)日：2009-11-25
申请号：KR1020090006902
申请日：2009-01-29
Applicant: 오사카 유니버시티 , 충남대학교산학협력단
CPC classification number: B29C33/3842 , B81C1/0046 , B82Y40/00
Abstract: PURPOSE: A high-durable replica mold for nano-imprint lithography and a manufacturing method thereof are provided to form the pattern whose size is less than 100nm by executing the pattern transfer within a short time. CONSTITUTION: A manufacturing method of a high-durable replica mold for nano-imprint lithography is composed of the steps of forming a resin layer of the chemical formula 1 by dropping organic-inorganic hybrid resin on a substrate(1), and hardening by irradiating UV(Ultraviolet) light(4) to the resin layer while a master mold(3) is pressed to the resin layer with a pressure less than 0.2MPa.
Abstract translation: 目的：提供用于纳米压印光刻的高耐久性复制模具及其制造方法，以通过在短时间内执行图案转印来形成尺寸小于100nm的图案。 构成：用于纳米压印光刻的高耐久性复制模具的制造方法由以下步骤构成：通过在基板（1）上滴加有机 - 无机杂化树脂形成化学式1的树脂层，并通过照射 UV（紫外）光（4）到树脂层，而母模（3）以低于0.2MPa的压力被压到树脂层上。
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公开(公告)号：KR100837830B1
公开(公告)日：2008-06-13
申请号：KR1020080016388
申请日：2008-02-22
Applicant: 충남대학교산학협력단
Abstract: 본 발명은 광가교형 무기고분자형 포토레지스트(photoresist)를 노광 공정(Photolithography), 마이크로 트랜스퍼몰딩(micro-transfer molding; μ-TM), 임프린트 리소그래피 (imprint lithography)공정, 스테레오리소그래피 (stereolithography) 등과 같은 방법으로 각종 기능성 패턴과 구조물을 제조하는 것이다. 성형된 패턴과 구조물은 후경화 혹은 고온 열처리 공정을 거침으로서 화학적, 열적 안정성 및 광투과성을 지닌 무기고분자 혹은 세라믹 조성의 미세유체 패턴과 소자를 제조한다. 또한 유사한 공정을 친수성 고분자에 적용하여 친수성 나노유체 패턴 및 소자를 제조함으로서 향후 각종 MEMS/NEMS소자에 사용한다.
소프트리소그래피, 무기고분자, 세라믹, 세라믹 전구체, MEMS, 미세유체소자, 초친수성 고분자, 나노채널-
公开(公告)号：KR100817440B1
公开(公告)日：2008-03-31
申请号：KR1020060099965
申请日：2006-10-13
Applicant: 충남대학교산학협력단
CPC classification number: C04B38/0035 , B82Y40/00 , C04B35/571 , C04B35/589
Abstract: A method for producing a nano-structural ceramic material is provided to allow the production of a porous nano-structural ceramic material with excellent high temperature stability, having various shapes and various thickness. A method for producing a nano-structural ceramic material with nanopores comprises the steps of: preparing a polyvinyl silazane-block-polystyrene copolymer(PVSZ-b-PS) as a precursor; and heat-treating the prepared precursor to convert the polyvinyl silazane inorganic block into a ceramic barrier and polystyrene organic block into pores and therefore to form an arranged mesoporous ceramic. In the method, the polyvinyl silazane-block-polystyrene copolymer has a nano arrangement structure by self-assembly action of a hydrophilic-hydrophobic block, and is synthesized by a reversible addition fragmentation transfer(RAFT) polymer reaction.
Abstract translation: 提供一种纳米结构陶瓷材料的制造方法，能够制造具有各种形状和各种厚度的优异的高温稳定性的多孔纳米结构陶瓷材料。 用纳米孔制备纳米结构陶瓷材料的方法包括以下步骤：制备聚乙烯基硅氮烷 - 嵌段 - 聚苯乙烯共聚物（PVSZ-b-PS）作为前体; 对所制备的前体进行热处理，将聚乙烯基硅氮烷无机嵌段转化成陶瓷阻挡层和聚苯乙烯有机嵌段成孔，从而形成布置的介孔陶瓷。 在该方法中，聚乙烯基硅氮烷 - 嵌段 - 聚苯乙烯共聚物通过亲水 - 疏水嵌段的自组装作用具有纳米排列结构，并且通过可逆加成断裂转移（RAFT）聚合物反应合成。
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公开(公告)号：KR1020080021102A
公开(公告)日：2008-03-06
申请号：KR1020080016388
申请日：2008-02-22
Applicant: 충남대학교산학협력단
Abstract: A method for manufacturing an inorganic fluidic pattern structure is provided to produce micro-fluidic patterns and structures having stable characteristics, and reduce production expense and time as compared with the conventional manufacturing method. A method for manufacturing an inorganic fluidic pattern structure includes the steps of: (a) coating a glass or silicon substrate with a light-crosslinkable or heat-crosslinkable inorganic polymer precursor to form a coating layer; (b) masking the inorganic polymer precursor, and then performing exposure using a long-wavelength exposure light source; and (c) developing uncrosslinked channels of the resultant with an organic solvent to obtain micro-fluidic channels and patterns.
Abstract translation: 提供一种制造无机流体图案结构的方法，以制造与常规制造方法相比具有稳定特性的微流体图案和结构，并且降低生产成本和时间。 一种制造无机流体图案结构的方法包括以下步骤：（a）用可光交联或热交联的无机聚合物前体涂覆玻璃或硅基底以形成涂层; （b）掩蔽无机聚合物前体，然后使用长波长曝光光源进行曝光; 和（c）用有机溶剂开发所得物的未交联通道以获得微流体通道和图案。
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公开(公告)号：KR100634846B1
公开(公告)日：2006-10-16
申请号：KR1020050053822
申请日：2005-06-22
Applicant: 충남대학교산학협력단
Abstract: Inorganic polymer type of negative photoresist composition is provided to produce ceramic pattern/structure of two or three-dimensional microfine inorganic polymer employed in lithography process by chemically introducing various photo-sensitive functional group in the inorganic polymer and embodying rapid cross-linking the polymer with UV at ordinary temperature. The photo-polymerization type of negative photoresist reformed polymer is generated by reaction of a polymer containing a repeating unit represented by the formula(1) with any one compound represented the formula(2). In the formula(1), Ra, Rb and Rc are independently selected from H, ORd, NHRd, vinyl or linear or branched lower alkyl group with 1-10 carbon atoms; Rd is H or linear or branched lower alkyl group having 1-10 carbon atoms; n, m and k are integers of 1 to 200, and in the formula(2), the compound is one compound selected from: (a) acryl compound; (b) epoxy compound; (c) vinyl compound; and (d) cinnamoyl compound. The negative photoresist composition comprises the negative photoresist reformed polymer, organic solvent and photo-initiator.
Abstract translation: 提供无机聚合物类型的负性光致抗蚀剂组合物以通过在无机聚合物中化学引入各种光敏官能团并且使聚合物与聚合物快速交联而产生用于光刻过程的二维或三维微细无机聚合物的陶瓷图案/结构 常温UV。 光聚合型负型光致抗蚀剂重整聚合物通过含有式（1）表示的重复单元的聚合物与式（2）表示的任何一种化合物的反应而产生。 在式（1）中，Ra，Rb和Rc独立地选自H，ORd，NHRd，乙烯基或具有1-10个碳原子的直链或支链低级烷基; Rd是H或具有1-10个碳原子的直链或支链低级烷基; n，m和k是1至200的整数，并且在式（2）中，所述化合物是选自以下的一种化合物：（a）丙烯酰基化合物; （b）环氧化合物; （c）乙烯基化合物; 和（d）肉桂酰化合物。 负性光刻胶组合物包含负性光刻胶重整聚合物，有机溶剂和光引发剂。
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