公开(公告)号：US20170285489A1

公开(公告)日：2017-10-05

申请号：US15627054

申请日：2017-06-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Siebe LANDHEER ,  Marcel BECKERS ,  Jeroen Peter Johannes BRUIJSTENS ,  Ivo Adam Johannes THOMAS ,  Franciscus Johannes Joseph JANSSEN

IPC: G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

公开(公告)号：US20160209761A1

公开(公告)日：2016-07-21

申请号：US15080258

申请日：2016-03-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Timotheus Franciscus SENGERS ,  Marcus Adrianus VAN DE KERKHOF ,  Mark KROON ,  Kees VAN WEERT

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70058 ,  G03F7/70191 ,  G03F7/70341 ,  G03F7/7055 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.

公开(公告)号：US20160054647A1

公开(公告)日：2016-02-25

申请号：US14933956

申请日：2015-11-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Siebe LANDHEER ,  Marcel BECKERS ,  Jeroen Peter Johannes BRUIJSTENS ,  Ivo Adam Johannes THOMAS ,  Franciscus Johannes Joseph JANSSEN

IPC: G03B27/52

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

公开(公告)号：US20140327908A1

公开(公告)日：2014-11-06

申请号：US14335711

申请日：2014-07-18

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Maurits VAN DER SCHAAR ,  Andreas FUCHS ,  Martyn John COOGANS

IPC: G01N21/47

CPC classification number: G03F7/7065 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70633 ,  G03F9/7049 ,  G03F9/7088

Abstract: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.

公开(公告)号：US20140313500A1

公开(公告)日：2014-10-23

申请号：US14322625

申请日：2014-07-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Willem Jurrianus VENEMA ,  Bearrach MOEST ,  Vasco Miguel Miguel MATIAS SERRAO ,  Cedran BOMHOF

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  B21B38/00 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7026 ,  G03F9/7088 ,  G03F9/7092 ,  H01J2235/062

Abstract: A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.

Abstract translation: 光刻设备包括至少一个图像对准传感器，用于接收从掩模版上的对准标记投射的辐射。 处理器处理来自传感器的信号以解决投影对准标记中的空间信息，以建立用于测量基板支撑件和图案化位置之间的位置关系的参考。 传感器的示例包括光电检测器的线阵列。 单个阵列可以解析传感器（X，Y方向）和垂直（Z）方向的平面内的空间信息。 在保持基板支撑固定的同时执行建立基准位置的至少最后一步。 避免了现有技术传感器的机械扫描引起的错误和延迟。 或者（未示出），传感器相对于基板支撑件移动以进行机械扫描，而与主定位系统无关。