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公开(公告)号：DE4107851A1
公开(公告)日：1992-09-17
申请号：DE4107851
申请日：1991-03-12
Applicant: BASF AG
Inventor： WUENSCH THOMAS DR , HOESSEL PETER DR , HOFFMANN GERHARD DR , LANGEN JUERGEN DR
Abstract: The invention relates to a process for making microstructures having a high aspect ratio by imagewise irradiation of polymers with high-energy parallel radiation from X-ray sources, homo- or copolyoxymethylene being used as polymer.
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