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公开(公告)号：DE4107851A1
公开(公告)日：1992-09-17
申请号：DE4107851
申请日：1991-03-12
Applicant: BASF AG
Inventor： WUENSCH THOMAS DR , HOESSEL PETER DR , HOFFMANN GERHARD DR , LANGEN JUERGEN DR
Abstract: The invention relates to a process for making microstructures having a high aspect ratio by imagewise irradiation of polymers with high-energy parallel radiation from X-ray sources, homo- or copolyoxymethylene being used as polymer.
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公开(公告)号：ES2111601T3
公开(公告)日：1998-03-16
申请号：ES92120404
申请日：1992-11-30
Applicant: BASF AG
Inventor： HOESSEL PETER DR , HOFFMANN GERHARD DR , LANGEN JUERGEN DR , REINECKE HOLGER DR
Abstract: The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with x-rays, where the polymers employed are aliphatic polyesters.
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公开(公告)号：DE4229244A1
公开(公告)日：1994-03-03
申请号：DE4229244
申请日：1992-09-02
Applicant: BASF AG
Inventor： HOESSEL PETER DR , STEPHAN OSKAR , HOFFMANN GERHARD DR , LANGEN JUERGEN DR
IPC: B29C35/08 , B29C43/18 , B29C59/16 , B29C70/78 , B81B1/00 , B81C1/00 , G03F7/16 , G03F7/20 , H01L21/027 , G03F7/004
Abstract: The invention relates to a process for making microstructures having structure depths ranging from several mu m up into the mm region by imagewise irradiation of polymers with X-rays and removal of the imagewise irradiated regions of the polymers. Before the imagewise irradiation, the polymers, which have layer thicknesses ranging from several mu m up into the mm region are applied under pressure to an electrically conductive base and firmly anchored by melting in a frame and using a pressure ram. The process according to the invention is suitable, in particular, for making microstructures having structure depths of between 3 mu m and 2000 mu m and very fine lateral dimensions of less than 10 mu m.
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Patent Agency Ranking
公开(公告)号：DE4227868A1
公开(公告)日：1994-02-24
申请号：DE4227868
申请日：1992-08-22
Applicant: BASF AG
Inventor： WUENSCH THOMAS DR , HOFFMANN GERHARD DR , HOESSEL PETER DR , LANGEN JUERGEN DR , REINECKE HOLGER DR
Abstract: In selective dissolution of homo- or copolyoxymethylene (I), irradiated with actinic radiation, the liq. organic developer medium consists of a phenol deriv. (II) with free phenolic OH gps. and at least one other substit. in the phenol ring. Synchrotron radiation is used. To make micro-mouldings, (I) is irradiated selectively with actinic parallel radiation from x-ray sources in an erosion depth of 10-2000 microns with lateral dimensions to less than 10 microns and developed in (II). USE/ADVANTAGE - The process is used for making micro-mouldings with high aspect ratio (claimed). Cpds. of (II) type are less toxic than phenol, have less odour, are readily available and give structures of better quality.
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公开(公告)号：DE4141352A1
公开(公告)日：1993-06-17
申请号：DE4141352
申请日：1991-12-14
Applicant: BASF AG
Inventor： HOESSEL PETER DR , HOFFMANN GERHARD DR , LANGEN JUERGEN DR , REINECKE HOLGER DR
Abstract: The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with x-rays, where the polymers employed are aliphatic polyesters.
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公开(公告)号：DE59209181D1
公开(公告)日：1998-03-12
申请号：DE59209181
申请日：1992-11-30
Applicant: BASF AG
Inventor： HOESSEL PETER DR , HOFFMANN GERHARD DR , LANGEN JUERGEN DR , REINECKE HOLGER DR
Abstract: The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with x-rays, where the polymers employed are aliphatic polyesters.
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公开(公告)号：AT163096T
公开(公告)日：1998-02-15
申请号：AT92120404
申请日：1992-11-30
Applicant: BASF AG
Inventor： HOESSEL PETER DR , HOFFMANN GERHARD DR , LANGEN JUERGEN DR , REINECKE HOLGER DR
Abstract: The invention relates to a process for the production of microstructure elements having structure depths of from several mu m into the mm region by imagewise irradiation of polymers with x-rays, where the polymers employed are aliphatic polyesters.
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公开(公告)号：DE4107662A1
公开(公告)日：1992-09-10
申请号：DE4107662
申请日：1991-03-09
Applicant: BASF AG
Inventor： HOESSEL PETER DR , HOFFMANN GERHARD DR , WUENSCH THOMAS DR , LANGEN JUERGEN DR
IPC: B29C35/08 , B29C39/00 , B29C43/00 , B29C45/00 , B29C47/00 , B29C59/16 , B29K23/00 , C08G75/22 , C08J7/00 , G03F7/039 , G03F7/20
Abstract: The invention relates to a process for the production of micromouldings having a high aspect ratio by imagewise irradiation of polymers with high-energy parallel radiation from X-ray sources, the polymers employed being copolymers of SO2 and one or more ethylenically unsaturated organic compounds.
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