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公开(公告)号：EP2583300B1
公开(公告)日：2018-05-23
申请号：EP11796320.7
申请日：2011-06-14
Applicant: KLA-Tencor Corporation
Inventor： HILL, Andrew V. , MANASSEN, Amnon , KANDEL, Daniel , LEVINSKI, Vladimir , SELIGSON, Joel , SVIZHER, Alexander , WANG, David Y. , ROTTER, Lawrence D. , DE VEER, Johannes D.
CPC classification number: G02B27/141 , G01N21/474 , G01N21/4788 , G01N2021/4792 , G02B27/145 , G03F7/70633
Abstract: Systems and methods for discrete polarization scatterometry are provided.
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公开(公告)号：EP2745313A1
公开(公告)日：2014-06-25
申请号：EP12823553.8
申请日：2012-07-30
Applicant: Kla-Tencor Corporation
Inventor： MANASSEN, Amnon , KANDEL, Daniel , BARUCH, Moshe , LEVINSKI, Vladimir , SAPIENS, Noam , SELIGSON, Joel L. , HILL, Andy , BACHAR, Ohad , NEGRI, Daria , ZAHARAN, Ofer
IPC: H01L21/66
CPC classification number: G03F7/70633
Abstract: The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.
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公开(公告)号：EP2583300A2
公开(公告)日：2013-04-24
申请号：EP11796320.7
申请日：2011-06-14
Applicant: KLA-Tencor Corporation
Inventor： HILL, Andrew V. , MANASSEN, Amnon , KANDEL, Daniel , LEVINSKI, Vladimir , SELIGSON, Joel , SVIZHER, Alexander , WANG, David Y. , ROTTER, Lawrence D. , DE VEER, Johannes D.
IPC: H01L21/027 , H01L21/66
CPC classification number: G02B27/141 , G01N21/474 , G01N21/4788 , G01N2021/4792 , G02B27/145 , G03F7/70633
Abstract: Systems and methods for discrete polarization scatterometry are provided. One embodiment relates to an optical subsystem of a scatterometer. The optical subsystem includes one or more light sources configured to produce light having different polarizations. The optical subsystem also includes a polarizing beam splitter configured to separate the light into two different light beams having orthogonal and mutually exclusive polarizations. The optical subsystem further includes one or more second optical elements configured to control which one of the two different light beams illuminates the wafer during measurements. The optical subsystem also includes a detection subsystem configured to separately detect two different scattered light beams resulting from illumination of the wafer. The two different scattered light beams have orthogonal and mutually exclusive polarizations. All optical surfaces of the optical subsystem used for the measurements are stationary during the measurements.
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公开(公告)号：EP2457071A1
公开(公告)日：2012-05-30
申请号：EP10802847.3
申请日：2010-07-21
Applicant: KLA-Tencor Corporation
Inventor： KANDEL, Daniel , LEVINSKI, Vladimir , SAPIENS, Noam
IPC: G01J4/00
CPC classification number: G01N21/95607 , G01B11/14 , G01B11/24 , G01B2210/56 , G03F7/70633
Abstract: A method for determining an overlay offset may include, but is not limited to: obtaining a first anti-symmetric differential signal (ΔS
1 ) associated with a first scatterometry cell; obtaining a second anti-symmetric differential signal (ΔS
2 ) associated with a second scatterometry cell and computing an overlay offset from the first anti-symmetric differential (ΔS
1 ) signal associated with the first scatterometry cell and the second anti-symmetric differential signal (ΔS
2 ) associated with the second scatterometry cell.
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