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公开(公告)号:DE3789102D1
公开(公告)日:1994-03-24
申请号:DE3789102
申请日:1987-12-03
Applicant: SOLVAY
Inventor: TYTGAT DANIEL , REIGNIER MARIANNE , DUJARDIN FRANCOIS
Abstract: Baths comprising, in aqueous solution, a mixture of hydrochloric acid, phosphoric acid, nitric acid and sulphosalicylic acid and at least one abietic compound.
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公开(公告)号:NO173025C
公开(公告)日:1993-10-13
申请号:NO875201
申请日:1987-12-14
Applicant: SOLVAY
Inventor: TYTGAT DANIEL , REIGNIER MARIANNE , DUJARDIN FRANCOIS
Abstract: Baths comprising, in aqueous solution, a mixture of hydrochloric acid, phosphoric acid, nitric acid and sulphosalicylic acid and at least one abietic compound.
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公开(公告)号:PT97999A
公开(公告)日:1992-03-31
申请号:PT9799991
申请日:1991-06-17
Applicant: SOLVAY
Inventor: BARTHELEMY NATHALIE , TYTGAT DANIEL
Abstract: Baths for the chemical polishing of stainless steel surfaces which comprise a mixture of hydrochloric acid, nitric acid and phosphoric acid, a substituted or unsubstituted hydroxybenzoic acid and an amine in aqueous solution.
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公开(公告)号:NO904579L
公开(公告)日:1991-04-25
申请号:NO904579
申请日:1990-10-23
Applicant: SOLVAY
Inventor: TYTGAT DANIEL , MAGNUS STEFAAN
Abstract: Baths for chemical polishing of copper or copper alloy surfaces, comprising, in aqueous solution, hydrogen peroxide, phosphoric acid and tetraborate ions.
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55.
公开(公告)号:CA2028195A1
公开(公告)日:1991-04-25
申请号:CA2028195
申请日:1990-10-22
Applicant: SOLVAY
Inventor: TYTGAT DANIEL , MAGNUS STEFAAN
Abstract: Bains et procéde pour le polissage chimique de surfaces en cuivre ou en alliage de cuivre Bains pour le polissage chimique de surfaces en cuivre ou en alliage de cuivre, comprenant, en solution aqueuse, du peroxyde d'hydrogène, de l'acide phosphorique et des ions tétraborate. Pas de figure.
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公开(公告)号:AT55419T
公开(公告)日:1990-08-15
申请号:AT86200920
申请日:1986-05-27
Applicant: SOLVAY
Inventor: TYTGAT DANIEL , LEFEVRE PIERRE
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公开(公告)号:DK529488D0
公开(公告)日:1988-09-23
申请号:DK529488
申请日:1988-09-23
Applicant: SOLVAY
Inventor: TYTGAT DANIEL , MAGNUS STEFAAN
Abstract: Baths for the chemical polishing of copper or copper alloy surfaces, comprising, in aqueous solution, hydrogen peroxide, chloride ions, phosphoric acid and phosphate and hydrogenphosphate ions, in quantities adjusted so as to impart a pH of between 1.25 and 3 to the bath.
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公开(公告)号:FI884332A0
公开(公告)日:1988-09-21
申请号:FI884332
申请日:1988-09-21
Applicant: SOLVAY
Inventor: TYTGAT DANIEL , MAGNUS STEFAAN
Abstract: Baths for the chemical polishing of copper or copper alloy surfaces, comprising, in aqueous solution, hydrogen peroxide, chloride ions, phosphoric acid and phosphate and hydrogenphosphate ions, in quantities adjusted so as to impart a pH of between 1.25 and 3 to the bath.
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公开(公告)号:BR8706782A
公开(公告)日:1988-07-19
申请号:BR8706782
申请日:1987-12-14
Applicant: SOLVAY
Inventor: TYTGAT DANIEL , REIGNIER MARIANNE , DUJARDIN FRANCOIS
Abstract: Baths comprising, in aqueous solution, a mixture of hydrochloric acid, phosphoric acid, nitric acid and sulphosalicylic acid and at least one abietic compound.
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公开(公告)号:NO875201L
公开(公告)日:1988-06-16
申请号:NO875201
申请日:1987-12-14
Applicant: SOLVAY
Inventor: TYTGAT DANIEL , REIGNIER MARIANNE , DUJARDIN FRANCOIS
Abstract: Baths comprising, in aqueous solution, a mixture of hydrochloric acid, phosphoric acid, nitric acid and sulphosalicylic acid and at least one abietic compound.
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