Abstract:
PURPOSE:To reduce the size and weight of this device and to reduce the cost with simple constitution by causing the transmission or reflection of irradiation light and return light to and from a recording medium by a wavelength selection element in recording and reproducing. CONSTITUTION:Optical wavelength multiplex recording by a two-photon recording method is conducted by irradiating the optical wavelength multiplex recording medium 4 with the recording light of the selected wavelength from a light source section by condensing this light thereto via the wavelength selection element 2. At this time, the return from the recording medium 4 is rotated 90 deg. in the plane of polarization and transmits the wavelength selection element 2. This return beam is partly reflected by a beam splitter 23 and is made incident on a detecting section 28, by which a servo signal is obtd. At the time of reproducing, the laser beam from the light source 1 is reflected by the wavelength selection element 2 and the fluorescence generated beam from the recording medium 4 is rotated 90 deg. in the plane laser beam is transmitted through the wavelength selection element 2 and is introduced via a filter 26 and a condenser lens 27 to a photodetecting section 3, by which the recorded information at the respective wavelengths is detected. At this time, the selecting element 2 reflects the reproducing light without allowing the transmission and allows the transmission of only the excited fluorescence. As a result, the recording and reproducing are conducted with the simple constitution.
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor light emitting device capable of improving carrier concentration, and reducing electric resistance. SOLUTION: An n-type clad layer 12 is formed into a superlattice layer formed by alternately laminating first semiconductor layers 12A and second semiconductor layers 12B. The first semiconductor layer 12A mainly contains a Se mixed crystal without containing Te, and is formed by containing, for instance, Be x1 Mg x2 Zn x3 Se mixed crystal (0≤x1≤1, 0≤x2≤1, 0≤x3≤1 and x1+x2+x3=1). The second semiconductor layer 12B mainly contains a Te mixed crystal, and formed by containing, for instance, a Be x4 Mg x5 Zn x6 Te mixed crystal (0≤x4≤1, 0≤x5≤1, 0≤x6≤1 and x4+x5+x6=1). COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor light emitting device having an excellent temperature characteristic and high in color purity and wavelength stability even when a quaternary mixed crystal is used for an active layer. SOLUTION: This semiconductor light emitting device includes an active layer 15 with a plurality of quantum dots 15B formed in a bulk 15A. The bulk 15A is mainly formed of a group II-VI quaternary mixed crystal containing Be of a composition ratio of x1 (0≤x1
Abstract:
PROBLEM TO BE SOLVED: To provide an n-type clad layer structure, its corresponding active layer, and a p-type clad for easily manufacturing the semiconductor optical element, and device that have excellent luminescence property and the like and high activation rate for Cl doping, that is, high reliability with less crystal defects without using any materials applicable to the RoHS directive. SOLUTION: The semiconductor light-emitting element is a group II-VI compound semiconductor mainly consisting of the group II-VI compound that is lattice-matched on an InP substrate, wherein the group II atom comprises Mg, Zn and Be, while the group VI atom comprises Se and Te for an n-type layer on the light-emitting element. Such a semiconductor element can constrain the Type II luminescence with a large energy gap and high lowest limit of a conduction band and obtain the high-quality crystalline property with high carrier density and less crystal defects. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor laminated structure with a high effective acceptor concentration. SOLUTION: A buffer layer 11, a p-type semiconductor layer 12 and a p-type contact layer 13 are laminated on one side of a substrate 10 in this order. The p-type semiconductor layer 12 is constituted by laminating a first semiconductor layer 12A having oxide semiconductor as its principal constituent and a second semiconductor layer 12B consisting of non-oxide semiconductor and showing p-type electric conductivity alternately on the buffer layer 11 repeatedly, and the first semiconductor layer 12A and the second semiconductor layer 12B are provided with super lattice structure. According to this method, a hole in the second semiconductor layer 12B is excited by the valence band of the first semiconductor layer 12A. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To achieve a laminated structure for room-temperature continuous oscillation of a Be-based group II-VI semiconductor laser using an InP substrate. SOLUTION: A basic structure of a semiconductor laser is composed by using a lattice-matched group II-VI semiconductor including Be on the InP substrate. In order to enhance carrier injection efficiency into an active layer, the laminated structure is composed as follows: the active layer, a light guide layer, and a clad layer are composed by a double-hetero structure having an I-type band lineup. It is composed so as to have the active layer, the light guide layer, and the clad layer that strengthen light trapping into the active layer. The clad layer is composed of a bulk crystal. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor laser device capable of outputting beams having a desired luminous-intensity distribution from the beams emitted from a broad-area semiconductor laser changing the luminous-intensity distribution with the lapse of the time after an oscillation. SOLUTION: The semiconductor laser device 1A has the broad-area semiconductor laser 2 emitting laser beams, and a shutter 3 changing over the shielding and passage of laser beams emitted from the semiconductor laser 2. The semiconductor laser device 1A further has a pulse controller 4 opening and closing the shutter 3 in synchronism with the pulse driving of the semiconductor laser 2, at a timing preset in response to the time after the semiconductor laser 2 starts its oscillation and the change of the luminous-intensity distribution (an NFP) on an outgoing end face, and at the timing of bringing the NFP close to a uniform distribution. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor laser device capable of reducing speckle noise, and to provide a method for driving a semiconductor laser element. SOLUTION: The semiconductor laser device includes the semiconductor laser element 1 and a driving circuit 2. The semiconductor laser element 1 includes a laser structure for forming a single belt shape light emission region 12A, and two belt shape electrodes (the p-side electrode 15A and a p-side electrode 15B) arranged in a region corresponding to the light emission region 12A. The driving circuit 2 independently supplies a pulse current to each electrode of the semiconductor laser element 1. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a semiconductor laser apparatus wherein the effect by a returned light can be suppressed. SOLUTION: An external resonator is configured by perpendicularly arranging a glass plate 21 to a light LB emitted from a semiconductor laser element 10 and resonating part of the light LB between the glass plate 21 and an end face 10R of the semiconductor laser element 10 at the opposite side. A distance L between the glass plate 21 and the end face 10R of the semiconductor laser element 10 at the opposite side, that is, the resonator length L of the external resonator is adjusted by moving the glass plate 21 in a direction A in parallel with the light LB on the basis of the stimulation state of the semiconductor laser element 10. The luminous quantity of the light resonated in the external resonator may be adjusted by using a transmissivity control element such as a liquid crystal optical element or a variable ND filter. Or the phase of the light resonated in the external resonator may be adjusted by a phase compensation plate. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor light emitting element wherein an accurate refractive index distribution is formed in a semiconductor layer with a simple step. SOLUTION: An impurity region 30 containing impurities for adjustment of refractive index is formed by heat diffusion in a semiconductor layer 20. The impurity region 30 is selectively irradiated with a laser beam LB to cause a heat distribution 40 in the semiconductor layer 20. The refractive index adjusting impurities are relocated with a concentration distribution corresponding to the heat distribution 40 to provide a refractive index distribution to an end face of a light emission region 21A. A desired refractive index distribution is easily realized according to the type and quantity of the refractive index adjusting impurities and the irradiation conditions of the laser beam LB. The refractive index distribution may be provided by implanting ions from a front end face into the semiconductor layer 20 and selectively heat treating the layer to cause a heat distribution, and by restoring the crystallization of the end face of the light emission region 21A according to the heat distribution. COPYRIGHT: (C)2005,JPO&NCIPI