OPTICAL FILTER
    51.
    发明专利

    公开(公告)号:JPH09325211A

    公开(公告)日:1997-12-16

    申请号:JP7604597

    申请日:1997-03-27

    Inventor: NOMURA FUMIYASU

    Abstract: PROBLEM TO BE SOLVED: To obtain an optical filter which efficiently reflects a near IR region and suppresses the reflectivity of visible light by specifying the luminous reflectance to reflect a near IR region over the specified ratio and to prevent the reflection of a visible light region to a specific value or below. SOLUTION: This optical filter has =50% near IR region and to prevent the reflection of the visible light region. This filter has preferably >=2 times of the combinations of (HL) or (LH) as the film constitution of the films to reflect the near IR rays on one surface. Here, H is a high-refractive index layer having the refractive index higher than the refractive index of the substrate and its optical film thickness (optical film thickness = the refractive index of the thin film × a physical film thickness) is λ/4; L is a low-refractive index layer having the refractive index lower than the refractive index of the substrate and its optical film thickness is λ/4; λis from 600nm to 1200nm. The optical filter is made of plastic and the base body of the optical filter is preferably a base body formed by subjecting its surface to half coating.

    MANUFACTURING DEVICE FOR SUBSTRATE PROVIDED WITH OPTICAL THIN FILM

    公开(公告)号:JPH08136710A

    公开(公告)日:1996-05-31

    申请号:JP30314094

    申请日:1994-11-11

    Abstract: PURPOSE: To provide a manufacturing device for substrate provided with an optical thin film capable of manufacturing in high productivity the substrate provided with the optical thin film such as antireflection filter by using a relatively small manufacturing device. CONSTITUTION: A source 2 generating a film forming particles flux and a moving means for a substrate to be film-formed moving the substrates 210 and 210' to be film-formed so that the substrates pass through a region in which the substrates are exposed to the film forming particles flux 5 generated by the source 2 for generating film forming particles flux, a film forming monitor plate 208 movable in a range including the outside of the range in which the substrate to be film-formed is exposed to the film forming particles flux 5, an optical interference film thickness measuring device 7, an optical fiber bandle 240 bonding optically between the measuring device 7 and the monitor plate 208 and a film forming process controlling means 260 controlling the film forming processing based on a film thickness of a monitor thin film formed on the monitor plate 208 and measured by the measuring device 7 are provided.

    ANTIREFLECTION PLASTIC OPTICAL PARTS

    公开(公告)号:JPH06337303A

    公开(公告)日:1994-12-06

    申请号:JP12957993

    申请日:1993-05-31

    Abstract: PURPOSE:To provide optical parts having light resistance and weather resistance without after-yellowing with sun ray and UV rays, having excellent wear resistance, adhesion property and dyeing property, causing no after-yellowing nor decrease in transparency by haze, and having excellent external appearance without showing interference fringes. CONSTITUTION:This antireflection plastic optical part consists of a plastic transparent substrate and films (A) and (B) described below laminated on the substrate in this order. The plastic transparent substrate consists of a polymer obtd. by vinyl polymn. of urethane (meth)acryl monomers prepared by the reaction of (meth)acryl monomers expressed by formula and polyfunctional isocyanate. In formula, R , R are hydrogen or methyl groups, m and n are integers the total of which is 0 to 4, X is chlorine, iodine or bromine. (A): films essentially consisting of organopolysiloxane and fine particles of inorg. oxide. (B): multilayered antireflection films consisting of inorg. oxide at least one layer of which contains titanium oxide.

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