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    Method of producing cristobalite containing silica glass
    51.
    发明授权
    Method of producing cristobalite containing silica glass 失效
    生产含方石英的石英玻璃的方法

    公开(公告)号：US5876473A

    公开(公告)日：1999-03-02

    申请号：US727552

    申请日：1996-10-25

    Applicant: Kyoichi Inaki ,  Tohru Segawa ,  Nobumasa Yoshida ,  Mamoru Endo

    Inventor： Kyoichi Inaki ,  Tohru Segawa ,  Nobumasa Yoshida ,  Mamoru Endo

    IPC: C03B20/00 ,  C03B32/02 ,  C03C3/06 ,  C03C14/00 ,  C03B5/00 ,  C03C10/14

    CPC classification number: C03C14/004 ,  C03B20/00 ,  C03B32/02 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2214/20 ,  C03C2214/30

    Abstract: Cristobalite-containing silica glass is provided wherein .alpha.-cristobalite in the shape of a small sphere or a small, round-edged or sharp-edged, three-dimensional region is dispersed in the silica glass matrix. The diameter of each .alpha.-cristobalite sphere or region is, in the range of 0.1 um to 1000 um, and the content of the .alpha.-cristobalite is at least 10 wt. %. The cristobalite-containing silica glass is produced by heating a mixture of two kinds or more of crystalline silicon dioxide powder with melting points different from each other by 20.degree. C. or more. The mixture contains silicon dioxide having the highest melting point in the range of 10 wt. % to 80 Wt. % and is heated at temperatures ranging from the lowest melting point to a temperature lower than the highest melting point.

    Abstract translation: PCT No.PCT / EP96 / 00794 Sec。 371日期1996年10月25日第 102（e）日期1996年10月25日PCT 1996年2月27日PCT公布。 公开号WO96 / 26908 日本1996年9月6日提供了含方石英的二氧化硅玻璃，其中将小球形或小圆形边缘或锐边三维区域形成的α-方英石分散在石英玻璃基质中。 每个α-方解石球体或区域的直径在0.1μm至1000μm的范围内，并且α-方英石的含量为至少10wt。 ％。 通过将两种以上的结晶二氧化硅粉末的熔点彼此不同的混合物加热20℃以上来制造含方石英的石英玻璃。 该混合物含有熔点最高在10wt。％范围内的二氧化硅。 至80 Wt。 并且在从最低熔点到低于最高熔点的温度的温度下加热。

    Process for producing opaque silica glass
    52.
    发明授权
    Process for producing opaque silica glass 失效
    生产不透明石英玻璃的方法

    公开(公告)号：US5772714A

    公开(公告)日：1998-06-30

    申请号：US682962

    申请日：1996-07-18

    Applicant: Tatsuhiro Sato ,  Akira Fujinoki ,  Kyoichi Inaki ,  Nobumasa Yoshida ,  Tohru Yokota

    Inventor： Tatsuhiro Sato ,  Akira Fujinoki ,  Kyoichi Inaki ,  Nobumasa Yoshida ,  Tohru Yokota

    IPC: C03B5/02 ,  C03B5/08 ,  C03B19/09 ,  C03B20/00 ,  C03C3/06

    CPC classification number: C03B5/08 ,  C03B19/09 ,  C03B20/00 ,  C03B5/021 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/80 ,  Y10S501/904 ,  Y10S501/905 ,  Y10T428/249969

    Abstract: A process for producing opaque silica glass in which a quartz raw material grain having a particle size of 10 to 350 .mu.m is filled into a heat resistant mold, the quartz raw material grain is heated in a non-oxidizing atmosphere from a room temperature up to a temperature lower by 50.degree. to 150.degree. C. than a temperature at which the above raw material grain is melted at a temperature-increase speed not exceeding 50.degree. C./minute, then, slowly heated up to a temperature higher by 10.degree. to 80.degree. C. than the temperature at which the quartz raw material grain is melted at the speed of 10.degree. C./minute or less, and the heated quartz raw material grain is further maintained at the temperature higher by 10.degree. to 80.degree. C. than the temperature at which the quartz raw material grain is melted, followed by cooling down to the room temperature. Especially, in the case of producing a large scale opaque silica glass block, a quartz raw material grain filled into a heat-resistant mold is heated by a belt-like heating source located perpendicularly to a trunk of a filling layer of the quartz raw material grain so as to form a moving heating zone in the filling layer and the heating zone is successively moved either upwardly starting at the lower end portion of the filling layer or downwardly starting at the upper end portion thereof in a non-oxidizing atomosphere.

    Abstract translation: 将具有10〜350μm粒径的石英原料颗粒填充到耐热性模具中的不透明石英玻璃的制造方法，将石英原料颗粒从室温下在非氧化性气氛中加热 比上述原料颗粒以不超过50℃/分钟的升温速度熔化的温度低于50℃至150℃的温度，然后缓慢加热至高于10℃的温度 相对于石英原料粒子以10℃/分钟以下的速度熔融的温度为80℃以下，加热的石英原料粒子进一步保持在10〜80℃ 比石英原料晶粒熔化的温度高，然后冷却至室温。 特别是，在生产大型不透明石英玻璃块的情况下，填充在耐热性模具中的石英原料颗粒通过垂直于石英原料填充层的树干的带状加热源加热 从而在填充层中形成移动的加热区域，并且加热区域从填充层的下端部开始向上移动，或者从非氧化性空气的上端向下移动。

    Alkali-free glass substrate
    56.
    发明授权
    Alkali-free glass substrate 有权

    公开(公告)号：US11718553B2

    公开(公告)日：2023-08-08

    申请号：US16819696

    申请日：2020-03-16

    Applicant: AGC INC.

    Inventor： Motoyuki Hirose ,  Takashi Enomoto

    IPC: C03C3/091 ,  C03B5/225 ,  G11B5/73

    CPC classification number: C03C3/091 ,  C03B5/2252 ,  G11B5/73921 ,  C03C2201/80

    Abstract: An alkali-free glass substrate contains, as represented by mass % based on oxides: 54% to 68% of SiO2; 10% to 25% of Al2O3; 0.1% to 5.5% of B2O3; and 8% to 26% of MgO+CaO+SrO+BaO. The alkali-free glass substrate has β-OH of 0.15 mm−1 to 0.35 mm−1, and a Cl content of 0.15 to 0.3 mass %. A bubble growth index I of the alkali-free glass substrate given by the following formula is 320 or more: I=590.5×[β-OH]+874.1×[Cl]−5.7×[B2O3]−33.3. In the formula, [β-OH] is β-OH of the alkali-free glass substrate in mm−1, [Cl] is the Cl content of the alkali-free glass substrate in mass %, and [B2O3] is a B2O3 content of the alkali-free glass substrate in mass %.

    SINGLE-CRYSTAL SILICON PULLING SILICA CONTAINER AND PRODUCING METHOD THEREOF
    58.
    发明申请
    SINGLE-CRYSTAL SILICON PULLING SILICA CONTAINER AND PRODUCING METHOD THEREOF 审中-公开
    单晶硅拉丝二氧化硅容器及其制造方法

    公开(公告)号：US20140182510A1

    公开(公告)日：2014-07-03

    申请号：US14122509

    申请日：2013-02-19

    Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

    Inventor： Shigeru Yamagata

    IPC: C30B15/10 ,  C03B19/02

    CPC classification number: C03B19/02 ,  C03B19/095 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/54 ,  C03C3/06 ,  C03C8/02 ,  C03C10/0009 ,  C03C21/008 ,  C03C23/007 ,  C03C2201/02 ,  C03C2201/54 ,  C03C2201/80 ,  C03C2203/10 ,  C30B15/10 ,  C30B29/06 ,  Y02P40/57 ,  Y10T117/1032

    Abstract: A single-crystal silicon pulling silica container including: a transparent silica glass layer in the inner side of the silica container; and an opaque silica glass layer containing gaseous bubbles in the outer side of the silica container, wherein the transparent layer constitutes of a high-OH group layer placed on an inner surface side of the silica container containing the OH group at a concentration of 200 to 2000 ppm by mass and a low-OH group layer having the OH group concentration lower than the high-OH group layer containing Ba at a concentration of 50 to 2000 ppm by mass. Resulting in the silica container used for pulling single-crystal silicon, providing the silica container improves etching corrosion resistance of the container inner surface to silicon melt when the entire inner surface of transparent silica glass of the container is crystallized short after using the container and method for such silica container.

    Abstract translation: 一种单晶硅拉硅石容器，其包括：二氧化硅容器的内侧的透明石英玻璃层; 以及在二氧化硅容器的外侧含有气泡的不透明二氧化硅玻璃层，其中，所述透明层构成高OH基层，所述高OH基层位于含有浓度为200〜200的OH基团的二氧化硅容器的内表面侧 2000质量ppm，OH基浓度低于含有浓度为50〜2000质量ppm的Ba的高OH基层的低-OH基层。 导致用于拉拔单晶硅的二氧化硅容器，当容器内透明石英玻璃的整个内表面在使用容器之后结晶短时，提供二氧化硅容器提高容器内表面对硅熔体的耐蚀刻腐蚀性和方法 用于这种二氧化硅容器。

    SYNTHETIC OPAQUE QUARTZ GLASS AND METHOD FOR PRODUCING THE SAME
    60.
    发明申请
    SYNTHETIC OPAQUE QUARTZ GLASS AND METHOD FOR PRODUCING THE SAME 审中-公开
    合成OPAQUE QUARTZ玻璃及其制造方法

    公开(公告)号：US20100316858A1

    公开(公告)日：2010-12-16

    申请号：US12515727

    申请日：2007-12-04

    Applicant: Tatsuhiro Sato ,  Nobumasa Yoshida ,  Katsuhide Orikasa ,  Makoto Tanaka

    Inventor： Tatsuhiro Sato ,  Nobumasa Yoshida ,  Katsuhide Orikasa ,  Makoto Tanaka

    IPC: C03B20/00 ,  C03B8/04 ,  C03C11/00 ,  B32B17/00

    CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/80 ,  Y10T428/24967 ,  Y10T428/249969

    Abstract: Provided is a method for producing a synthetic opaque quartz glass where flame processing can be performed in high purity with a simple way and even a large sized one can be produced, and the synthetic opaque quartz glass.A method for producing a synthetic opaque quartz glass which comprises the step of heating and burning a quartz glass porous body under a pressure of from 0.15 MPa to 1000 MPa at a temperature of from 1200° C. to 2000° C. The quartz glass porous body is prepared by depositing quartz glass particles which are produced by hydrolyzing a silicon compound with an oxyhydrogen flame.

    Abstract translation: 提供一种制造合成不透明石英玻璃的方法，其中可以以简单的方式进行高纯度的火焰加工，甚至可以制造大尺寸的方法，以及合成的不透明石英玻璃。 一种合成不透明石英玻璃的制造方法，其特征在于，在1200℃〜2000℃的温度下，在0.15MPa〜1000MPa的压力下对石英玻璃多孔体进行加热燃烧的工序。 通过沉积通过用氢氧焰水解硅化合物而制备的石英玻璃颗粒来制备体。

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