Abstract:
A method of making a variable emittance window comprising providing a metal foil substrate, applying an antireflection material layer onto the metal foil substrate, applying a protection material layer onto the antireflection material layer, applying a variable emittance material layer onto the protection material layer, annealing to form a two-step variable emittance layer, applying a transparent low emittance material layer to the two-step variable emittance layer, adhering a transparent substrate to the transparent low emittance material layer, and removing the metal foil substrate.
Abstract:
An infrared camera architecture includes, for an embodiment, an infrared detector, a substrate, a plurality of electrical components coupled to the substrate, and a pedestal made of a thermally conductive material and having a leg coupled to the substrate. The infrared detector is supported by and thermally coupled to the pedestal, with the pedestal thermally isolating the infrared detector from the plurality of electrical components.
Abstract:
An infrared detector useful in, e.g., infrared cameras, includes a substrate having an array of infrared detectors and a readout integrated circuit interconnected with the array disposed on an upper surface thereof, for one or more embodiments. A generally planar window is spaced above the array, the window being substantially transparent to infrared light. A mesa is bonded to the window. The mesa has closed marginal side walls disposed between an outer periphery of a lower surface of the window and an outer periphery of the upper surface of the substrate and defines a closed cavity between the window and the array that encloses the array. A solder seal bonds the mesa to the substrate so as to seal the cavity.
Abstract:
An infrared camera architecture includes, for an embodiment, an infrared detector, a substrate, a plurality of electrical components coupled to the substrate, and a pedestal made of a thermally conductive material and having a leg coupled to the substrate. The infrared detector is supported by and thermally coupled to the pedestal, with the pedestal thermally isolating the infrared detector from the plurality of electrical components.
Abstract:
In a device for detecting thermal radiation, at least one membrane is provided on which at least one thermal detector element is mounted for the conversion of the thermal radiation into an electric signal and at least one circuit support for carrying the membrane and for carrying at least one readout circuit for reading out the electrical signal, the detector element and the readout circuit being connected together electrically by an electric contact which passes through the membrane. In addition, a method of producing the device with the following method steps is provided: a) provision of the membrane with the detector element and of at least one electrical through-connection and provision of the circuit support and b) bringing together the membrane and the circuit support in such a manner that the detector element and the readout circuit are connected together electrically by an electrical contact passing through the membrane. Production activity is preferably carried out at wafer level: functionalised silicon substrates are stacked upon one another, firmly bonded to one another and then divided into individual elements. Preferably, the detector elements comprise of pyro-electrical detector elements. The device finds application in motion detectors, presence detectors and in thermal imaging cameras.
Abstract:
A bolometer type ultra-sensitive silicon sensor pixel of a multi-pixel sensor wherein each pixel includes a detector stage, an intermediate stage, and a heat bath stage. The detector stage, the intermediate stage and a portion of the heat bath stage are generally co-planar and are interconnected by I-beam bridges so as to permit mutually co-planar rotation in response to stress and strain. Electrical coupling is improved between a micro-antenna and the detector stage by a two stage transformer assembly that couples the micro-antenna to the detector stage.
Abstract:
Un procédé de fabrication d'un détecteur apte à détecter une gamme de longueurs d'onde [λ 8 ; λ 14 ] centrée sur une longueur d'onde λ 10 , le détecteur comprenant un dispositif de détection apte à détecter ladite gamme [λ 8 ; λ 14 ] et un boitier hermétique sous une pression prédéterminée dans laquelle est logé ledit dispositif, ledit boitier étant formé d'un substrat, de parois latérales solidaires du substrat et d'un capot supérieur solidaire des parois latérales et comprenant une partie au droit du dispositif qui est transparente dans ladite gamme [λ 8 ; λ 14 ], le procédé comprenant : - la réalisation dudit dispositif sur le substrat, ladite réalisation comprenant le dépôt d'une couche sacrificielle noyant totalement ledit dispositif ; - la réalisation du capot sur la couche sacrificielle, ledit capot étant constitué d'un empilement de première, seconde et troisième structures optiques transparentes dans ladite gamme [λ 8 ; λ 14 ], la seconde et la troisième structures optiques ayant des indices de réfraction équivalents à la longueur d'onde λ 10 respectivement supérieur ou égal à 3,4 et inférieur ou égal à 2,3 ; - suite à la réalisation d'une partie du capot comprenant au moins la première structure optique, la réalisation d'un évent d'accès à la couche sacrificielle au travers de ladite partie du capot, suivie de l'application, au travers de l'évent, d'une gravure pour retirer en totalité la couche sacrificielle. - l'épaisseur optique de la première structure optique est supérieure ou égale à λ 10 /10 ; - l'indice de réfraction équivalent n e q 1 à la longueur d'onde λ 10 de la première structure optique est inférieur ou égal à 2,6 ; et - la face de la première structure optique formée sur la couche sacrificielle, est inerte à la gravure mise en oeuvre pour retirer la couche sacrificielle.
Abstract:
A bolometer type ultra-sensitive silicon sensor including a detector stage (14), an intermediate stage (16), and a heat bath stage (17). The detector stage, the intermediate stage and a portion of the heat bath stage are generally co-planar and are interconnected by I-beam bridges so as to permit mutually co-planar rotation. Mechanical and electrical coupling is improved between a micro-antenna and the detector stage by a two stage transformer assembly (L1-L2, L5-L6) coupled between the micro-antenna and a detector element of the detector stage.
Abstract:
A conduction structure for infrared microbolometer sensors and a method for sensing electromagnetic radiation may be provided. The microbolometer may include a first conductor layer (64) and a second conductor layer (68). The microbolometer further may include a bolometer layer (62) between the first conductor layer and the second conductor layer.