Abstract:
An electro-absorption modulator (100) is provided, including: a substrate layer (110), including a silicon substrate (112) and an oxide layer (114) disposed on the silicon substrate; top-layer silicon (120), formed on the oxide layer (114), where a waveguide layer (122) is formed on the top-layer silicon (120); a doping layer, including a first doping panel (132) and a second doping panel (133), where a first-type light doping area (134) is formed on the first doping panel (132), a second-type light doping area (135) is formed on the second doping panel (133), and the first-type light doping area (134), the waveguide layer (122), and the second-type light doping area (135) form a PIN junction; and a modulation layer (140), disposed on the waveguide layer (122) and connected in parallel to the PIN junction. For an incident beam with a specific wavelength, when a modulating electrical signal is reversely applied to the PIN junction, a light absorption coefficient of the modulation layer (140) for the beam changes with the modulating electrical signal, and after the beam passes through a modulation area, optical power of the beam also correspondingly changes, so that electro-optic modulation is implemented for the beam.
Abstract:
An electroabsorption modulator comprises an absorption layer (7) between at least one layer of p-doped semiconductor (6) and at least one layer of n-doped semiconductor (8). The layers form a ridge waveguide structure. The thickness of the absorption layer is between 9 and 60 nm and the width of the ridge is between 4.5 and 12 microns.
Abstract:
An optical waveguide (1) is formed on a substrate (2) and includes a curved ridge structure (3), a curved optical path, and a buffer layer (4). The curved ridge structure is formed on the substrate so as to have a curvature in a longitudinal direction of the curved ridge structure. The curved optical path is formed along the curved ridge structure. The buffer layer covers a side of the ridge structure and has a lower refractive index than a refractive index of the substrate.
Abstract:
The device comprises a layer of silicon (3) separated from a substrate (1) by a layer of insulating material (2). A rib (4) having an upper surface (4A) and two side surfaces (4B, 4C) is formed in the layer of silicon (3) to provide a waveguide for the transmission of optical signals. A lateral doped junction (7, 9, 8) is formed between the side surfaces (4B, 4C) of the rib (4) such that an electrical signal can be applied across the junction (7, 9, 8) to control the density of charge carriers across a substantial part of the cross-sectional area of the rib (4) thereby actively altering the effective refractive index of the waveguide.
Abstract:
The invention relates inter alia to an injection modulator (10) for modulation of optical radiation (P), comprising an optical waveguide (20) and a diode structure (30), which has at least two p-doped semiconductor portions (110), at least two n-doped semiconductor portions (210) and at least one lightly doped or undoped intermediate portion (300) between the p-doped and n-doped semiconductor portions (110, 210). The p-doped semiconductor portions (110) - when viewed in the longitudinal direction (L) of the waveguide (20) - are offset with respect to the n-doped semiconductor portions (210) and the diode structure (30) is arranged in a resonance-free portion of the waveguide (20), in which - apart from waveguide attenuation - the radiation intensity of the radiation (P) guided in the waveguide (20) is constant. According to the invention, the p-doped semiconductor portions (110) lie on one side of the waveguide (20) - when viewed in the longitudinal direction (L) of the waveguide (20) and with respect to the waveguide center - , the n-doped semiconductor portions (210) lie on the other side of the waveguide (20) and the intermediate portion (300) lies in the region of the waveguide center, each semiconductor portion (110, 210) extends transversely with respect to the waveguide longitudinal direction (L) in the direction of the waveguide center of the waveguide (20) and no p-doped semiconductor portion (110) - when viewed in the longitudinal direction (L) of the waveguide (20) - overlaps any n-doped semiconductor portion (210).