公开(公告)号：JP2010286500A

公开(公告)日：2010-12-24

申请号：JP2010189979

申请日：2010-08-26

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： ISOMURA IKUNAO

IPC: G01N21/956

Abstract: PROBLEM TO BE SOLVED: To provide an efficient inspection by preventing the occurrence of quasi-defects due to a position alignment error. SOLUTION: A sample inspection device includes: a measurement image generating section for generating a measurement image by measuring a sample pattern; a comparator for comparing the measuring image with a reference image and determining a sample which is defective, when the difference between them exceeds a threshold; a position displacement measuring section for measuring a displacement amount between area images with a fixed area that are segmented from the measuring image and the reference image and determining reliability information, indicating the reliability of the position displacement amount between them; and a position aligning section for aligning the positions of the area images, by utilizing the reliability information and the position displacement amount. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：通过防止由位置对准误差引起的准缺陷的发生来提供有效的检查。 检测装置包括：测量图像生成部，其通过测量样本图形来生成测定图像; 比较器，用于将测量图像与参考图像进行比较，并且当它们之间的差异超过阈值时确定有缺陷的样本; 位置测量部分，用于测量具有从测量图像分割的固定区域的区域图像与参考图像之间的位移量，并且确定可靠性信息，指示它们之间的位置偏移量的可靠性; 以及通过利用可靠性信息和位置偏移量来对准所述区域图像的位置的位置对准部。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010256716A

公开(公告)日：2010-11-11

申请号：JP2009108144

申请日：2009-04-27

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： NAGAO TAKURO ,  ISOMURA IKUNAO

IPC: G03F1/84 ,  H01L21/027 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To provide a device which performs a pattern inspection for reducing false defects.
SOLUTION: A pattern inspection device 100 includes: an optical image acquisition part 150 which obtains optical image data in a pattern-formed photomask 101; a development circuit 111 which develops design data of a pattern to image data to generate developed image data; a distortion image generation circuit 140 which performs distortion processing to the developed image data to generate distortion image data; a dissimilar index calculation circuit 142 which calculates a dissimilar index showing difference between the developed image data and the distortion image data by each pixel; a reference image generation circuit 112 which performs data processing to the developed image data to generate reference image data to be compared with the optical image data; and a comparison circuit 108 which compares the optical image data with the reference image data under criteria according to the dissimilar index by each pixel.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种执行模式检查以减少假缺陷的装置。 解决方案：图案检测装置100包括：光学图像获取部分150，其在图案形成的光掩模101中获得光学图像数据; 开发电路111，其开发用于图像数据的图案的设计数据以生成显影图像数据; 失真图像生成电路140，其对显影图像数据进行失真处理，生成失真图像数据; 不同索引计算电路142，其计算显示出的图像数据和失真图像数据之间的差异的各个像素的不同索引; 参考图像生成电路112，对显影图像数据进行数据处理，生成与光学图像数据进行比较的参考图像数据; 以及比较电路108，其根据各像素的不同索引，将光学图像数据与基准图像数据进行比较。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010175571A

公开(公告)日：2010-08-12

申请号：JP2010115066

申请日：2010-05-19

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： KATAOKA AKIRA ,  ISOMURA IKUNAO ,  HIRANO RYOICHI ,  KIKUIRI NOBUTAKA ,  IIDA SUSUMU

IPC: G01N21/956

Abstract: PROBLEM TO BE SOLVED: To perform pattern inspection in which a false image of a measurement image occurring temporarily is eliminated.
SOLUTION: The sample inspection device includes a measurement image generating part for measuring a pattern of a sample to generate the measurement image, and a comparing part for comparing the measurement image with a reference image. The measurement image generating part includes a light receiving device where two or more time delay integration sensors using two or more stages of line sensors each of which is composed of two or more pixels are connected. The measurement image generating part sets, as the measurement image, the average value of pixel values excluding an abnormal pixel value, or the average value of pixel values excluding a pixel value exceeding a reference value as an abnormal pixel value, for the pixels of respective time delay integration sensors, or sets, as the measurement image, the average value of pixel values excluding a pixel value exceeding a reference value as an abnormal pixel value using the sum of the average value of pixel values and a predetermined value as the reference value, or sets, as the measurement image, the average value of pixel values excluding a pixel value as an abnormal pixel value, where the absolute value of the difference between the pixel value and the average value of the pixel values of all time delay integration sensors exceeds a reference value.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：执行消除临时发生的测量图像的假图像的图案检查。 解决方案：样本检查装置包括用于测量样本的图案以产生测量图像的测量图像生成部分和用于将测量图像与参考图像进行比较的比较部分。 测量图像生成部分包括光接收装置，其中连接有两个或更多个由两个或更多像素组成的线传感器的两级或更多级的延时积分传感器。 测量图像生成部将作为测量图像的除了异常像素值以外的像素值的平均值或除了超过基准值的像素值以外的像素值的平均值作为异常像素值，设定为各个像素 使用像素值的平均值和预定值的和作为参考值，将作为测量图像的除了超过参考值的像素值的像素值的平均值用作测量图像作为异常像素值， ，或者将作为测量图像的像素值的除以像素值的平均值设定为异常像素值，其中像素值与所有时间延迟积分传感器的像素值的平均值之间的差的绝对值 超过参考值。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009294158A

公开(公告)日：2009-12-17

申请号：JP2008150072

申请日：2008-06-09

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： HARABE NOBUYUKI

IPC: G01N21/956 ,  G03F1/84 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To discriminate an assist pattern from patterns of a sample using a transmitted image and a reflected image.
SOLUTION: This pattern discriminator includes an optical image acquiring part for simultaneously acquiring the transmitted image and reflected image of the sample having the pattern and an assist pattern discriminating part for discriminating the assist pattern from the pattern shapes of the transmitted image and the reflected image by the discriminating condition of the specific pattern. This inspection device of the sample includes the optical image acquiring part for simultaneously acquiring the transmitted image and reflected image of the sample having the pattern, and the assist pattern discriminating part for discriminating the assist pattern from the pattern shapes of the transmitted image and the reflected image by the discriminating condition of the pattern, a desense region setting part for setting the assist pattern to a desense region, and a comparative determining part for performing the comparative inspection of the pattern in the desense region.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：使用透射图像和反射图像来区分辅助图案与样本的图案。 解决方案：该图案鉴别器包括用于同时获取发送图像的光学图像获取部分和具有图案的样本的反射图像，以及辅助图案识别部分，用于根据所发送的图像的图案形状和辅助图案 通过特定模式的辨别条件反射图像。 该样本的检查装置包括用于同时获取发送图像的光学图像获取部分和具有图案的样本的反射图像，以及辅助图案识别部分，用于鉴别辅助图案与发送图像的图案形状和反射的 通过图案的识别条件形成图像，将分割区域设定部分用于将辅助图案设置到去区域;以及比较确定部分，用于执行对纹理区域中的图案的比较检查。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009244155A

公开(公告)日：2009-10-22

申请号：JP2008092253

申请日：2008-03-31

Applicant: Advanced Mask Inspection Technology Kk ,  Nuflare Technology Inc ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社 ,  株式会社ニューフレアテクノロジー

Inventor： IIDA SUSUMU ,  KUBOTA SHUNSAKU

IPC: G01N21/956 ,  G03F1/84

CPC classification number: G01N21/95607 ,  G01N2021/95676

Abstract: PROBLEM TO BE SOLVED: To provide a lightweight and inexpensive mask inspection apparatus having highly efficient environmental radiation resistance. SOLUTION: This mask inspection apparatus is one for inspecting for mask defects and includes a light source, an illuminating optical system for irradiating a mask with an inspection light emitted from the light source, a magnifying optical system for causing the inspection light with which the mask is irradiated to form an image as an optical image, and an image sensor 10 for acquiring the optical image. The image sensor 10 has an environmental radiation shielding member of heavy metal having a specific gravity equal to or greater than that of tantalum (Ta) at least on a side opposite to a receiving surface of a sensor chip. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有高效环境辐射阻力的轻质且便宜的掩模检查装置。 解决方案：该掩模检查装置是用于检查掩模缺陷的掩模检查装置，包括光源，用于从光源发射的检查光照射掩模的照明光学系统，用于使检查光与 掩模被照射以形成作为光学图像的图像，以及用于获取光学图像的图像传感器10。 图像传感器10至少在与传感器芯片的接收表面相对的一侧上具有重量等于或大于钽（Ta）的重金属的环境辐射屏蔽构件。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009229159A

公开(公告)日：2009-10-08

申请号：JP2008072884

申请日：2008-03-21

Applicant: Advanced Mask Inspection Technology Kk ,  Nuflare Technology Inc ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社 ,  株式会社ニューフレアテクノロジー

Inventor： KIMURA MASAYOSHI ,  TSUJI YOSHITAKE ,  WATANABE TOSHIYUKI

IPC: G01N21/956 ,  G01B11/00 ,  G03F1/84

Abstract: PROBLEM TO BE SOLVED: To provide a reticle flaw inspection device capable of detecting the positional shift flaw of an isolated pattern, and a reticle flaw inspection method. SOLUTION: In the aligning means 13a of a detection part 13, the alignment of an optical image acquired by TDI sensors 11a and 11b with a reference image produced by a reference image producing part 15 is performed at every frame wherein the striplike stripe of a reticle 2 is finely divided. In an allowable range calculation means 13c, the aligning quantity corresponding to one stripe is subjected to primary regression to calculate the reference aligning quantity corresponding to one stripe. In a positional shift flaw detection means 13d, the pattern of the frame, wherein the aligning quantity is differentiated from the reference aligning quantity by a predetermined value or above, is detected as the positional shift flaw of the pattern. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够检测隔离图案的位置偏移缺陷的掩模版缺陷检查装置和掩模版缺陷检查方法。 解决方案：在检测部分13的对准装置13a中，由TDI传感器11a和11b获取的光学图像与由参考图像产生部分15产生的参考图像的对准在每个帧执行，其中带状条带 的标线片2细分。 在允许范围计算装置13c中，对与一个条纹相对应的对准量进行一次回归，计算与一个条纹对应的基准对准量。 在位置偏移检测装置13d中，将对准量与基准对准量不同的预定值以上的帧的图案作为图案的位置偏移检测。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009223095A

公开(公告)日：2009-10-01

申请号：JP2008068919

申请日：2008-03-18

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： OGAWA TSUTOMU

IPC: G02B27/09 ,  G02B5/30

CPC classification number: G02B27/286 ,  G01N21/21 ,  G01N21/956

Abstract: PROBLEM TO BE SOLVED: To control the polarization state independently in many areas in a light flux without increasing the number of divisions of a divided wavelength plate.
SOLUTION: A polarization controller includes a straight polarization generation device which generates a straight polarized light beam, and a pair of 4-division type 1/2 wavelength plates divided into four regions by two orthogonal boundary lines, divides the straight polarized light beam into eight areas, and changes the polarization state of each area into a circumferential or radial shape by passing the light beam through the pair of 4-division type 1/2 wavelength plates. Alternatively, the polarization controller comprises a pair of 2-division type 1/2 wavelength plate divided into two regions by one boundary line, divides a straight polarization light beam into four areas by passing the light beam through the pair of 2-division type 1/2 wavelength plate, and changes the polarization state of each area into a circumferential or radial shape.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：在不增加划分的波长板的分割数的情况下，在光束的许多区域中独立地控制极化状态。 解决方案：偏振控制器包括产生直线偏振光束的直线偏振产生装置和通过两个正交边界线分成四个区域的一对4分割型1/2波长板，将直线偏振光 通过使光束通过一对4分割型1/2波长板，将每个区域的偏振状态改变为圆周或径向的形状。 或者，偏振控制器包括一对分成两个区域的一个边界线的2分割型1/2波长板，通过使光束通过一对2分割型1将直线偏振光束分成四个区域 / 2波长板，并且将每个区域的偏振状态改变为圆周或径向形状。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009216411A

公开(公告)日：2009-09-24

申请号：JP2008057393

申请日：2008-03-07

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： KATAOKA AKIRA ,  ISOMURA IKUNAO ,  HIRANO RYOICHI ,  KIKUIRI NOBUTAKA ,  IIDA SUSUMU

IPC: G01N21/956 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To perform pattern inspection capable of excluding the temporarily produced false image of a measured image.
SOLUTION: The sample inspection device is equipped with a measured image forming part for measuring the pattern of a sample to form the measured image, a measured image pixel difference calculation part for calculating the difference value of the adjacent pixels of the measured image, and a comparison part for comparing the measured image with a reference image and constituted so as to again measure the pattern of a pixel-containing region in a case that the difference value of the adjacent pixels of the measured image exceeds a predetermined value. Alternatively, the sample inspection device is equipped with the measured image forming part for measuring the pattern of the sample to form the measured image, a difference image pixel difference calculation part for calculating the difference image of the measured image and the reference image and calculating the difference image of the adjacent pixels of the difference image, and a comparison part for comparing the measured image with the reference image and constituted so as to again measure the pattern of the pixel-containing region in a case that the difference value of the adjacent pixels of the difference image exceeds a predetermined value.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：执行能够排除所测量的图像的暂时产生的假图像的图案检查。 解决方案：样本检查装置配备有测量图像形成部分，用于测量样本的图案以形成测量图像;测量图像像素差计算部分，用于计算测量图像的相邻像素的差值 以及比较部，用于将测量图像与参考图像进行比较，并构成为在被测图像的相邻像素的差值超过预定值的情况下再次测量像素含有区域的图案。 或者，样本检查装置配备有用于测量样本的图案的测量图像形成部分以形成测量图像;差分图像像素差分计算部分，用于计算测量图像和参考图像的差分图像，并计算 差分图像的相邻像素的差分图像和比较部分，用于将测量图像与参考图像进行比较，并且构成为在相邻像素的差值的情况下再次测量像素包含区域的图案 的差分图像超过预定值。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009121902A

公开(公告)日：2009-06-04

申请号：JP2007295223

申请日：2007-11-14

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： ISOMURA IKUNAO

IPC: G01N21/956 ,  G01B11/24

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and a method for conducting a pattern test capable of reducing false defects. SOLUTION: The pattern test apparatus 100 is equipped with: an optical image acquiring section 150 for acquiring optical image data of a test sample formed in a pattern; a level adjusting circuit 140 which inputs the optical image data and reference image data corresponding to the optical image data, and adjusts at least one of a pixel value level of the optical image data and a pixel value level of the reference image data from a relation between a plurality of pixel values of the optical image data and a plurality of pixel of values of the reference image data; and a comparing circuit 108 for comparing the optical image data with the reference image data being respectively adjusted in the pixel value level. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供用于进行能够减少假缺陷的图案测试的装置和方法。 图案测试装置100装备有：用于获取以图案形成的测试样本的光学图像数据的光学图像获取部分150; 电平调整电路140，其输入与光学图像数据对应的光学图像数据和参考图像数据，并且从关系中调整光学图像数据的像素值电平和参考图像数据的像素值电平中的至少一个 在所述光学图像数据的多个像素值与所述参考图像数据的值的多个像素之间; 以及用于将光学图像数据与分别在像素值水平上调​​整的参考图像数据进行比较的比较电路108。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009071208A

公开(公告)日：2009-04-02

申请号：JP2007240466

申请日：2007-09-18

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： HIRONO MASATOSHI

IPC: H01L21/027 ,  G03F1/22 ,  G03F1/24

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  Y10T428/31616

Abstract: PROBLEM TO BE SOLVED: To provide an Extreme Ultra Violet (EUV) exposure mask which improves contrast for ultraviolet rays of inspection light and improves the inspection performance of the mask, and an EUV exposure mask blank for manufacturing the mask. SOLUTION: The EUV exposure mask blank 10 includes a substrate 12, a reflective layer 14 which is prepared on the substrate 12 and reflects EUV light, and an absorption layer 16 which is prepared on the reflective layer 14 and absorbs EUV light, wherein the reflectance ratio of light having 150 nm or longer and 300 nm or shorter of a wavelength is higher in the absorption layer 16 than in the reflective layer 14, and the EUV exposure mask 20 which is manufactured by processing the blank. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供极度超紫（EUV）曝光掩模，其提高检查光的紫外线的对比度，并提高掩模的检查性能，以及用于制造掩模的EUV曝光掩模坯料。 解决方案：EUV曝光掩模空白10包括基板12，准备在基板12上并反射EUV光的反射层14和制备在反射层14上并吸收EUV光的吸收层16， 其中，在吸收层16中比在反射层14中具有150nm以上且300nm以下的波长的光的反射率比通过处理坯料而制造的EUV曝光掩模20高。 版权所有（C）2009，JPO＆INPIT