公开(公告)号：EP3394676B1

公开(公告)日：2020-09-09

申请号：EP16797561.4

申请日：2016-11-17

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans ,  BUKKEMS, Björn, Hubertus, Maria ,  DE HOON, Cornelius, Adrianus, Lambertus ,  WIJCKMANS, Maurice, Willem, Jozef, Etiënne

IPC: G03F7/20

公开(公告)号：EP3084525B1

公开(公告)日：2019-04-17

申请号：EP14802416.9

申请日：2014-11-21

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans ,  BREUKERS, Marcus Joseph Elisabeth Godfried ,  HEERTJES, Marcel François

IPC: G03F7/20

公开(公告)号：EP4293424A1

公开(公告)日：2023-12-20

申请号：EP22178555.3

申请日：2022-06-13

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans ,  VAN ZON, Alexander, Martinus, Antonius

IPC: G03F9/00 ,  G03F7/20

Abstract: Method of spatially aligning a patterning device and a substrate, wherein the patterning device and the substrate are separated by an optical path comprising one or more moveable optical components, the method comprising:
- projecting a radiation beam from the patterning device along the optical path;
- performing a displacement of the one or more moveable optical components along a predetermined trajectory;
- determining an optical characteristic of the radiation beam as received by a sensor on a substrate table supporting the substrate at a plurality of instants during the displacement of the one or more moveable optical components;
- spatially aligning the patterning device and the substrate based on the optical characteristic as determined at the plurality of instants.

公开(公告)号：EP3611770A1

公开(公告)日：2020-02-19

申请号：EP18189293.6

申请日：2018-08-16

Applicant: ASML Netherlands B.V.

Inventor： JANSEN, Bas ,  BUTLER, Hans ,  DIJKSHOORN, Alexander Pascal

IPC: H01L41/09 ,  G03F7/20

Abstract: The disclosed piezo actuator (40) comprises a piezoelectric material (42), preferably cube-shaped, having first and second surfaces (44, 46) along first and second directions (x, y). A first set of electrodes (410) is arranged on the first and second surfaces to elongate the piezoelectric material in a third direction (z), perpendicular to the first and second directions, by providing at least two different voltages or charges simultaneously. A second electrode set (420) is arranged on further surfaces (430, 432) to shear the piezoelectric material in the first or second direction. The actuator is useful for mask or substrate supports of a lithographic apparatus.

公开(公告)号：EP3377942A1

公开(公告)日：2018-09-26

申请号：EP16787344.7

申请日：2016-09-30

Applicant: ASML Netherlands B.V.

Inventor： KANEHARA, Junichi ,  BUTLER, Hans ,  DE WIT, Paul Corné Henri ,  VAN DER PASCH, Engelbertus Antonius Fransiscus

IPC: G03F7/20

CPC classification number: G03F7/0002 ,  G03F7/70341 ,  G03F7/70733 ,  G03F7/70925 ,  G03F9/7042

Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.

公开(公告)号：EP3189247A1

公开(公告)日：2017-07-12

申请号：EP15744599.0

申请日：2015-08-04

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans ,  VAN DUIJNHOVEN, Martinus

IPC: F16F15/027

CPC classification number: F16F15/027

Abstract: The invention relates to a vibration isolation system to support a structure on a basis. The vibration isolation system being provided with a low frequency support. The vibration isolation system comprises: a force sensor to provide a force signal representative of the force; an internal force actuator for applying an internal force in parallel to the force; and, an internal force controller operably connected to the force sensor and the internal force actuator and the internal force controller is configured to control the internal force actuator on the basis of the force signal.

Abstract translation: 本发明涉及在基础上支撑结构的振动隔离系统。 隔振系统配备低频支架。 该振动隔离系统包括：力传感器，用于提供表示力的力信号; 用于平行于力施加内力的内力致动器; 以及可操作地连接到所述力传感器和所述内力致动器以及所述内力控制器的内力控制器被配置为基于所述力信号来控制所述内力致动器。

公开(公告)号：EP4508496A1

公开(公告)日：2025-02-19

申请号：EP23710065.6

申请日：2023-03-14

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans ,  REIJNDERS, Marinus, Petrus ,  TINNEMANS, Patricius, Aloysius, Jacobus

IPC: G03F9/00 ,  G03F7/20

公开(公告)号：EP4455784A1

公开(公告)日：2024-10-30

申请号：EP23169554.5

申请日：2023-04-24

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans

IPC: G03F7/00 ,  B23K26/04

Abstract: A method of controlling an image positioning error in an optical system is described. The optical system comprises a first component, a second component and a third component arranged in an optical path of the optical system. The method comprises:
- determining an image positioning error of the first component and feeding through of the image positioning error of the first component to a control loop of the second component to at least partly compensate the image positioning error of the first component; and
- determining an image positioning error of the second component and feeding through of the image positioning error of the second component to a control loop of the third component to at least partly compensate the image positioning error of the second component.

公开(公告)号：EP4441768A1

公开(公告)日：2024-10-09

申请号：EP22808796.1

申请日：2022-10-24

Applicant: ASML Netherlands B.V.

Inventor： GRASMAN, Jasper, Hendrik ,  BOSCH, Niels, Johannes, Maria ,  PHILIPS, Patrick, Peter, Hubert, Helena ,  HEMPENIUS, Peter, Paul ,  SANS MERCADER, Joan ,  SARS, Gerardus, Wilhelmus ,  BUTLER, Hans ,  URBANUS, Willem Henk

IPC: H01J37/16 ,  H01J37/20

CPC classification number: H01J2237/2820130101 ,  H01J37/16 ,  H01J2237/021620130101 ,  H01J37/20

公开(公告)号：EP4303659A1

公开(公告)日：2024-01-10

申请号：EP22183960.8

申请日：2022-07-08

Applicant: ASML Netherlands B.V.

Inventor： BUTLER, Hans ,  MUTSAERS, Marinus, Engelbertus, Cornelis ,  DE JONGH, Robertus, Johannes, Marinus

IPC: G03F7/20

Abstract: A method of determining a parasitic force of an actuator of an optical component is described, whereby the actuator is mounted to a first frame and is configured to control a position of the optical component relative to a second frame. The method comprises:
- obtaining a first position signal representing a position of the optical component relative to the first frame;
- performing a low-pass filtering to the first position signal;
- obtaining a second position signal representing a position of the optical component relative to the second frame;
- performing a high-pass filtering to the second position signal, the high-pass filtering being complementary to the low-pass filtering;
- determining the parasitic force of the actuator, based on the combined low-pass filtered first position signal and the high-pass filtered second position signal.