Abstract:
PURPOSE:To improve yield by reducing the step of forming TFT loads in a title device. CONSTITUTION:Gates of respective MOS transistors Q1, Q2 forming TFT loads and drains 3d, 4d channels 3C, 4C and sources 3S, 4S are formed in a single polycrystalline silicon layer 2.
Abstract:
PURPOSE:To enable a static RAM where a bottom gate MOSTFT is made to serve a memory cell load to be lessened in an OFF-state current by lessening a channel polysilicon layer in thickness at a channel section and decreased in resistance by making the channel polysilicon layer other than the channel section thick. CONSTITUTION:A selective oxide film 6 is provided to the surface of the channel sections of a channel polysilicon layer 5 of a bottom gate type MOSTFT. The channel polysilicon layer 5 becomes thin at a channel section where the selective oxide film 6 is formed, so that the source and the drain of a TFT and a power supply wire can be lessened in resistance lessening the TFT in an OFF-state current.
Abstract:
PURPOSE:To enable the alignment to be made normally in a lithographic process to form a wiring to be connected to a conductive layer by a method wherein an alignment mark is formed using a recession provided in the second insulating layer covering the conductive layer and a first insulating layer. CONSTITUTION:In the title semiconductor integrated circuit device composed of a conductive layer 5, the first insulating film 2 adjacent to the conductive layer 5, the second insulating layer 7 covering the conductive layer 5 and the first insulating layer 2, a contact hole C provided on the part corresponding to the conductive layer 5 out of the second insulating layer 7 and an alignment mark M, the alignment mark M is constituted at least of a recession provided in the second insulating layer 7. For example, the interlayer insulating film 7 is etched away by RIE process to form a contact hole C on the diffused layer 5 simultaneously the alignment mark M is formed on the insulating film 2. Finally, the selective CVD of W is performed by reduction-reacting WF6 to selectively deposit W only inside the contact hole C to form an Al wiring 10 later.
Abstract:
PURPOSE:To form a pattern with high accuracy by conducting alignment and exposure in a state in which a film mainly comprising nitrogen and titanium and having thickness of 42 nm or less is formed under a photoresist layer. CONSTITUTION:Alignment and exposure are performed under the state in which a film mainly comprising nitrogen and titanium and thickness of 42 nm or less is formed under a photoresist layer. That is, it is preferable that reflectivity at the time of alignment extends over 20% or more and it is desirable that reflectivity at the time of exposure inversely extends over 20% or less in reduction projection exposure. Since He-Ne laser beams having a wavelength of 633 nm are used as beams for alignment and the G beams of an ultrahigh pressure mercury lamp having a wavelength of 436 nm as beams for exposure, the thickness of a TiON film satisfying both conditions of reflectivity of 20% or more to beams having the wavelength of 633 nm and reflectivity of 20% or less to beams having the wavelength of 436 nm is brought to 42 nm or less.
Abstract:
PROBLEM TO BE SOLVED: To solve the problem that in a printing device printing visible information on a label surface of a disk like recording medium which is rotationally driven by ejecting ink drops from an ejection nozzle provided on a printing head, it is difficult to adapt the ejection frequency of the ink drops to the optical disk rotationally driven at high speed and satisfactory printing quality can not be obtained since rotational speed of a spindle motor is lowered and its rotation is not stabilized when the optical disk is rotationally driven at a speed corresponding to a prescribed ejection frequency. SOLUTION: A print control part 53 is provided, ejecting the ink drops from the printing head 21 with a prescribed ejection frequency and controlling the ink drops so that the ink drop is dropped at prescribed intervals in a peripheral direction in a first rotation (Fig.14A) of an optical disk 101 and the ink drop is dropped on a part left in the first rotation in a second periphery (Fig.14B). COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a recording medium drive apparatus and a method of printing a label surface for printing visible information on the label surface of an optical disk. SOLUTION: The recording medium drive apparatus comprises a recording and/or reproducing part 140 which at least records a data signal onto a recording surface of a recording medium or reproduces the data signal from the recording surface; a printing part 110 which prints the visible information on a main surface different from the recording surface of the recording medium by an ink jet system; a driver 134 which drives the recording medium; and a rotation control part 180 which switches the driving speed of the driver depending on a printing mode for printing the visible information on the main surface or a recording or reproducing mode for recording or reproducing the data signal on the recording surface. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To record/play a disk and to perform printing on a print surface of the disk. SOLUTION: This recorder and/or player is provided with a disk tray 3 for rotatably holding an optical disk 10, wherein one surface disposed on the device main body 2 is a recording/reproducing surface 10b and the other surface is the print surface 10c, a tray moving mechanism 4 for moving the disk tray 3 over between the inside and outside of the device main body 2 through an opening part 12 of the device main body 2, a recording/playing part 5 arranged at a side facing the recording/reproducing surface 10b of the optical disk 10 held by the disk tray to perform recording/playing of the optical disk 10 at a recording/playing position at which the disk tray 3 is housed in the device main body 2, and a printing part 6 arranged at a side facing the print surface 10c of the optical disk 10 held by the disk tray 3 at a position going along the opening part 12 in the device main body 2 to print visible data on the print surface 10c of the optical disk 10. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide an inspection and measurement device of a particulate semiconductor and an inspection and measurement method of the particulate semiconductor in which a spherical semiconductor can be held in non-contact separating the vacuum space of a specific gap without using a large-scaled clean room. SOLUTION: The inspection and measurement device 100 of the particulate semiconductor comprises a local vacuum mechanism 5 for holding a particular semiconductor 3 in non-contact separating the vacuum space of the specific gap. The local vacuum mechanism 5 is constituted of a curved surface 15 recessed in the surface of a block body 22 to oppose an external plane of the particular semiconductor 3, an electron beam path perforated in the block body 22 to open to the curved surface 15, an exhaust port 19 provided in the curved surface 15 in its circumferential direction about the electron beam path, and an admission port 21 provided outside the exhaust port 19 in its circumferential direction about the electron beam path. COPYRIGHT: (C)2004,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide an electron beam irradiation device and its method preventing drop in vacuum in the mounting/demounting of an irradiation object without enlarging a rotating table by arranging an exhaust block at the end of an electron optics lens barrel in the electron beam irradiation device with the rotating table. SOLUTION: This electron beam irradiation device is equipped with the rotating table 31, the electron optics lens barrel 1 irradiating electron beams to the irradiation object 36 on the rotating table; the exhaust block 11 exhausting air in a gap between the electron optics lens barrel and the irradiation object, moving mechanisms 38, 39 moving the irradiation object between a working position facing the electron optics lens barrel and the mounting/ demounting position where the irradiation object is apart from the electron optics lens barrel; and cover members 51, 61 adhering closely to the rotating table or the irradiation object in order to prevent drop in vacuum when the rotating table is moved from the working position to the mounting/demounting position.
Abstract:
PROBLEM TO BE SOLVED: To provide a small-sized and simply constituted electron beam plotting device improving productivity by arranging an electron gun and an objective lens converging an electron beam emitted from the electron gun and irradiating it on a resist layer in the environment decompressed than the air and providing the part made a helium atmosphere between the objective lens and a substrate. SOLUTION: The electron beam emitted from the electron gun 11 is converged by a condenser lens 12 being an electrostatic lens to arrive at an aperture 14 through an electron beam modulation means 13. The electron beam transmittied through the aperture 14 is moved to an electron beam convergent part 20 in the state that a beam size is converged. A first area 2a housing an electron beam generation part 10 and an electron beam convergent part 20 in an electrooptical lens barrel 2 is made a high vacuum state of 10 Pa or below, and a second area 2b of an end part of a side opposite to the substrate 50 is made the helium atmosphere of 1-900 Pa, and the pressure difference of the air with the first area 2a made the high vacuum state is relaxed.