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    Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
    61.
    发明授权
    Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby 有权
    光学元件，包括这种光学元件的光刻设备，器件制造方法以及由此制造的器件

    公开(公告)号：US08289499B2

    公开(公告)日：2012-10-16

    申请号：US12495043

    申请日：2009-06-30

    Applicant: Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen

    Inventor： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen

    IPC: G02B5/26 ,  F21V9/08 ,  G03B27/72

    CPC classification number: G03F7/70958 ,  G03F7/70575

    Abstract: Spectral purity of a radiation beam of a first wavelength may be improved by providing an optical element that includes a structure having at least first layer including a first material, which structure is configured to be substantially reflective for a radiation of the first wavelength and substantially transparent or absorptive for a radiation of a second wavelength, a second layer including a second material, the second layer being configured to be substantially reflective, absorptive or scattering for the radiation of the second wavelength, and vacuum between the first layer and the second layer, wherein the first layer is located upstream in the optical path of incoming radiation with respect to the second layer.

    Abstract translation: 可以通过提供一种光学元件来改善第一波长的辐射束的光谱纯度，所述光学元件包括具有至少包括第一材料的第一层的结构，该结构被配置为对于第一波长的辐射基本上是反射的，并且基本上透明 或吸收第二波长的辐射，第二层包括第二材料，第二层被配置为对于第二波长的辐射是基本反射的，吸收的或散射的，以及第一层和第二层之间的真空， 其中所述第一层位于相对于所述第二层的入射辐射的光路中的上游。

    SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER
    64.
    发明申请
    SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER 审中-公开
    光谱滤光片，光刻设备和制造光谱滤光片的方法

    公开(公告)号：US20120154779A1

    公开(公告)日：2012-06-21

    申请号：US13392444

    申请日：2010-07-16

    Applicant: Wouter Anthon Soer ,  Martin Jacobus Johan Jak

    Inventor： Wouter Anthon Soer ,  Martin Jacobus Johan Jak

    IPC: G03B27/72 ,  B29D11/00 ,  G02B5/28

    CPC classification number: G03F7/70191 ,  G02B5/204 ,  G02B5/208 ,  G03F7/70575 ,  G21K1/10

    Abstract: A method for manufacturing a spectral purity filter is provided in which openings in a first surface of a base material, corresponding to a plurality of apertures of the spectral purity filter, are formed. At least the surfaces of the base material surrounding the openings in the first surface are chemically treated to form a layer of a second material, and the base material is etched from the second surface such that the openings extend from the first surface of the base material to the second surface of the base material.

    Abstract translation: 提供了一种用于制造光谱纯度滤光器的方法，其中形成了与光谱纯度滤光片的多个孔对应的基材的第一表面中的开口。 至少围绕第一表面中的开口的基材的表面被化学处理以形成第二材料层，并且从第二表面蚀刻基材，使得开口从基材的第一表面延伸 到基材的第二表面。

    SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER
    65.
    发明申请
    SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER 有权
    光谱滤光片，光刻设备和制造光谱滤光片的方法

    公开(公告)号：US20120154778A1

    公开(公告)日：2012-06-21

    申请号：US13392434

    申请日：2010-07-21

    Applicant: Wouter Anthon Soer ,  Martin Jacobus Johan Jak ,  Ronald Dekker

    Inventor： Wouter Anthon Soer ,  Martin Jacobus Johan Jak ,  Ronald Dekker

    IPC: F21V9/06 ,  B29D11/00 ,  G03B27/72

    CPC classification number: G03F7/70575 ,  G02B5/1809 ,  G21K1/10

    Abstract: A method of forming a spectral purity filter having a plurality of apertures configured to transmit extreme ultraviolet radiation and suppress transmission of a second type of radiation, in which trenches are formed in a base material in a pattern corresponding to the walls to be formed between the apertures. The trenches are filled with a grid material to form walls of the grid material, and the base material is selectively removed until the grid material is exposed and forms the spaces between the walls of the grid material for the apertures.

    Abstract translation: 一种形成光谱纯度滤光片的方法，该光谱纯度滤光器具有多个孔，其被配置为透射极紫外辐射并抑制第二类型辐射的透射，其中沟槽以对应于待形成的壁之间的壁的图案形成在基材中 孔。 沟槽填充有栅格材料以形成栅格材料的壁，并且选择性地去除基底材料，直到栅格材料暴露并且在孔的栅格材料的壁之间形成空间。

    SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER
    66.
    发明申请
    SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER 审中-公开
    光谱滤光片，光刻设备和制造光谱滤光片的方法

    公开(公告)号：US20120147351A1

    公开(公告)日：2012-06-14

    申请号：US13391095

    申请日：2010-07-14

    Applicant: Martin Jacobus Johan Jak ,  Wouter Anthon Soer

    Inventor： Martin Jacobus Johan Jak ,  Wouter Anthon Soer

    IPC: G03B27/72 ,  B29D11/00 ,  G02B5/20

    CPC classification number: G03F7/70191 ,  G03F7/70575 ,  G21K1/10

    Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation (λ

    Abstract translation: 透射光谱纯度滤光器被配置为透射极紫外辐射（λ<20nm）。 该滤波器包括格栅状结构，其包括以诸如硅的载体材料制造的多个微小孔。 在其区域的至少一部分中的格子状结构形成为在预期的操作条件范围内具有负的泊松比。 通过在正交方向上形成同时扩展或收缩的材料的网格，提高了差分热膨胀的管理。 各种几何形状都可以实现负的泊松比。 孔径几何形状可以是具有弯曲侧面的折射多边形或重入形状。 实例包括所谓的入口或辅助蜂窝，其中每个孔都是六边形的，如在普通蜂窝中，但是形式是六边形而不是正六边形。

    Debris mitigation system and lithographic apparatus
    67.
    发明授权
    Debris mitigation system and lithographic apparatus 失效
    碎片缓解系统和光刻设备

    公开(公告)号：US08071963B2

    公开(公告)日：2011-12-06

    申请号：US11645809

    申请日：2006-12-27

    Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Kurt Gielissen

    Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder ,  Wouter Anthon Soer ,  Kurt Gielissen

    IPC: G21G5/00

    CPC classification number: G03F7/70916 ,  G03F7/70858 ,  H05G2/003 ,  H05G2/005

    Abstract: A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.

    Abstract translation: 用于捕集来自碎屑产生辐射源的污染物质的碎片缓解系统。 该系统包括构造和布置成围绕轴线旋转的污染屏障，以及构造和布置成提供用于使来自辐射源的带电碎片偏转的磁场的磁体结构。 磁体结构被构造和布置成通过污染屏障提供磁场。 当通过污染屏障时，磁场沿着通常与污染屏障旋转轴线重合的平面定向。

    CATHETER WITH SEPARABLE SECTIONS
    68.
    发明申请
    CATHETER WITH SEPARABLE SECTIONS 审中-公开
    具有可分段的导管

    公开(公告)号：US20110092956A1

    公开(公告)日：2011-04-21

    申请号：US12999394

    申请日：2009-06-24

    Applicant: Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen

    Inventor： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen

    IPC: A61M25/00

    CPC classification number: A61B1/0051 ,  A61B1/00094 ,  A61B1/00156 ,  A61M25/0069 ,  A61M25/0105 ,  A61M2025/0175

    Abstract: The present invention relates to a catheter comprising a catheter body section (1) and at least one catheter tip section (2). The catheter body section (1) can extend in a longitudinal direction. The at least one catheter tip section (2) may be located on a distal side of the catheter body section (1). In a first operation mode of the catheter usable during insertion thereof, the catheter body section (1) and the at least one catheter tip section (2) can be commonly moved substantially in the longitudinal direction. In a second operation mode of the catheter usable when the catheter has reached a position where it should not be advanced any further, the catheter body section (1) and the at least one catheter tip section (2) may be moved relative to each other, so that the at least one catheter tip section (2) can be separated from the catheter body section (1).

    Abstract translation: 本发明涉及包括导管主体部分（1）和至少一个导管末端部分（2）的导管。 导管主体部分（1）可沿纵向方向延伸。 至少一个导管末端部分（2）可以位于导管主体部分（1）的远侧。 在可插入其中的导管的第一操作模式中，导管主体部分（1）和至少一个导管末端部分（2）可以基本上在纵向上移动。 在导管可到达不再进一步推进的位置的导管的第二操作模式中，导管主体部分（1）和至少一个导管末梢部分（2）可相对于彼此移动 ，使得至少一个导管末端部分（2）可以与导管主体部分（1）分离。

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