Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device, which can form a BCN film having a stable low dielectric constant and a high hardness (Young's modulus). SOLUTION: The BCN film is formed by using organic amino boron gas without corrosivity, which is replaced as conventional BCl 3 gas. An insulator material film of the low dielectric constant of a BCN system whose specific inductive capacity is 2.5 or below and whose elastic modulus (Young's modulus) is 8 GPa or above is obtained by forming the film with plasma CVD by using tris(dimethylamino)boron, as an example. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a high-performance semiconductor device manufactured by using a semiconductor surface treatment that can achieve a surface protection and a surface passivation using a baron nitride film, a deposition process, its surface protection technology, and surface passivation technology and an electronic device for communication system containing the semiconductor device. SOLUTION: The semiconductor device has a film containing at least boron and nitrogen atoms. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a biosensor for quickly, sensitively and simply measuring the total number of bacteria and a particular food poisoning bacterium. SOLUTION: The simplified biosensor obtains a concentration property, a cell wall solution property and a selectivity by combining different types of ion exchange fiber films. A structure for improving the separation accuracy by use of an electrophoresis method is also proposed so as to improve the selectivity. The sensor sized to be portable can be provided without needing a culture time and an expensive analyzer in comparison with a conventional sensor. COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a vaporizer which can be used for a long period of time without generating clogging or the like and can stably supply a raw material to a reaction part. SOLUTION: The vaporizer has a dispersion part 8, which includes a gas passage 2 formed inside a dispersion part main body 1, a gas inlet opening 4 to introduce a pressurized carrier gas 3 into the gas passage 2, a means 6 to supply raw material solution to the carrier gas passing the gas passage 2, a gas outlet 7 to send the carrier gas containing dispersed raw material solution to a vaporization part 22, and a cooling means 18 to cool the carrier gas flowing in the gas passage 2; and a vaporizing part 22 which includes a vaporization pipe 20 connected to the gas outlet 7 of the reaction part and the dispersion part 8 of the apparatus and a heater 21 to heat the vaporization pipe 20, and heats and vaporizes the carrier gas containing dispersed raw material solution; and also is provided with a radiation preventing part 102 having a small hole 101 on the outside of the gas outlet 7. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a floatation transport device and a floatation transport system which moves even a heavy plate-like base substance and changes direction of the base substance at high speed, and surely stops the base substance, when the plate-like base substance is floated by blowing gas to the base substance and then the base substance is moved, stopped, or kept still, or the direction thereof is changed, while floating the base substance. SOLUTION: The floatation transport system is constituted by combining: a transfer part 1 having a plurality of blowing holes 11B formed on a carrying surface, and moving the plate-like substance by the gas blown from the blowing holes 11B, while floating the plate-like substance; and a control unit having a plurality of blowing holes formed on a carrying surface, and performing at least any one of the controls of moving the plate-like substance, stopping it, keeping it still, or changing its direction, while floating it by the gas blown from the blowing holes. In the floatation transport system, a moving means (a moving device 13) pushing and moving the floating plate-like substance is disposed to the transfer part 1. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a thin film forming device that equalizes the film pressure of a substrate to be formed. SOLUTION: To the thin film forming device, a feed gas vaporized by means of a vaporizer 11 is supplied through a pipeline 14. At the same time, a shower nozzle 15 which jets the feed gas toward the substrate to be formed P disposed to face the surface 15b of the nozzle 15 is provided with a peripheral wall 15c rising from the expanding end section of the external wall 15a of the nozzle 15. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a dispersing device for a vaporizer that prevents the projection of a rod regardless of the pressure of a carrier gas without using any special fixing component and, in addition, joins a plurality of thin film forming materials at a joining section in a state where the materials are distributed in suitable amounts. SOLUTION: In the dispersing device for the vaporizer, the rod 37 which forms a gas passage 35 in cooperation with the internal wall of a hole formed along the transporting route of the carrier gas is inserted into the hole and a dispersing section which disperses a plurality of thin film forming raw materials in the carrier gas introduced into the gas passage 35 is disposed in the middle section of the passage 35. At least the front end section of the rod 37 on the downstream side of the transporting direction of the carrier gas is tapered down and, at the same time, the inner wall of the hole is formed in accordance with the shape of the front end section of the rod 37. The carrier gas in which the plurality of thin film forming materials are dispersed by means of the dispersing section is joined to the downstream-side end section of the gas passage 35 by the joining section. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a vaporization method and a vaporizer by which the number of particles scattered in a film after film formation is significantly reduced. SOLUTION: A raw material solution is brought into contact with a heated carrier gas, and then transported to a next process. The vaporizer comprises a vaporizing chamber, a carrier gas channel connected to the vaporizing chamber, a raw material solution introducing port for introducing the raw material solution to the channel, and a means for heating the carrier gas. COPYRIGHT: (C)2005,JPO&NCIPI