公开(公告)号：JP2008292605A

公开(公告)日：2008-12-04

申请号：JP2007136095

申请日：2007-05-23

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： IIDA SUSUMU

IPC: G02F1/37

CPC classification number: G02F1/3501 ,  G02F1/3525 ,  G02F2001/3505

Abstract: PROBLEM TO BE SOLVED: To provide a wavelength conversion device system, a crystal storage device, and a crystal exchange method for a wavelength conversion device facilitating exchange of non-linear crystal of the wavelength conversion device in a short time period. SOLUTION: The wavelength conversion device system includes the wavelength conversion device 100 in which light is transmitted through the non-linear crystal 114 to perform wavelength conversion and the crystal storage device 200 storing a non-linear crystal 214 for exchange to be used in the wavelength conversion device 100. The wavelength conversion device 100 includes a first crystal holder 110 fixing the non-linear crystal 114 and a first heating means 116 heating the non-linear crystal 114. The crystal storage device 200 includes a container 250, a second crystal holder 210 fixing the non-linear crystal 214 for exchange in the container 250 and exchangeable with the first crystal holder 110, and a second heating means 216 heating the non-linear crystal 214 for exchange. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于波长转换装置的波长转换装置系统，晶体存储装置和晶体交换方法，其便于在短时间内交换波长转换装置的非线性晶体。 解决方案：波长转换装置系统包括波长转换装置100，其中光通过非线性晶体114透射以进行波长转换，并且晶体存储装置200存储用于交换的非线性晶体214。 波长转换装置100包括固定非线性晶体114的第一晶体保持器110和加热非线性晶体114的第一加热装置116.晶体存储装置200包括容器250， 将第二晶体保持器210固定在容器250中以便与第一晶体保持器110交换的非线性晶体214，以及加热非线性晶体214以进行交换的第二加热装置216。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008268424A

公开(公告)日：2008-11-06

申请号：JP2007109289

申请日：2007-04-18

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： HIRANO RYOICHI ,  OGAWA TSUTOMU

IPC: G01N21/956 ,  G03F1/24 ,  G03F1/84 ,  H01L21/027

CPC classification number: G01N21/956 ,  G01N2021/95676 ,  G03F1/84

Abstract: PROBLEM TO BE SOLVED: To provide a reticle defect inspection device and a reticle defect inspection method, which suppresses damages on a reticle by irradiation with inspection light when a reticle is inspected in a still state.
SOLUTION: The reticle defect inspection device and the reticle inspection method aim to inspect a defect on a reticle by using a pattern image obtained by irradiating the reticle 101 having the pattern formed thereon with light, and are characterized in that the inspection device includes: a dose monitoring means 72 for measuring a dose of light on the reticle; a means 74 for calculating a cumulative dose from the dose measured by the dose monitoring means and comparing with a preliminarily determined threshold; and a means 76 for stopping irradiation of the reticle with light when the cumulative dose resulted from the comparison exceeds the threshold.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种掩模版缺陷检查装置和掩模版缺陷检查方法，当在静止状态下检查掩模版时，通过用检查光照射来抑制掩模版的损伤。 解决方案：掩模版缺陷检查装置和掩模版检查方法旨在通过使用通过用形成在其上的具有图案的掩模版101照射而获得的图案图像来检查掩模版上的缺陷，其特征在于，检查装置 包括：用于测量光罩上的光量的剂量监测装置72; 用于根据由剂量监测装置测量的剂量计算累积剂量并与预先确定的阈值比较的装置74; 以及当由比较产生的累积剂量超过阈值时用于停止光线照射的装置76。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008039712A

公开(公告)日：2008-02-21

申请号：JP2006217672

申请日：2006-08-10

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： YAMASHITA KYOJI

IPC: G01N21/956 ,  G03F1/84 ,  H01L21/027 ,  H01L21/66

CPC classification number: G06K9/32 ,  G06T7/001 ,  G06T2207/30148

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for performing the positional alignment of a reference image and an optical image with high precision. SOLUTION: The sample inspection system 100 of one embodiment is equipped with a regular matrix element operation part 370 for operating a plurality of the elements of the regular matrix due to the method of least squares for operating the positional shift quantity from the temporary aligning position of the optical image and the reference image, a dimension judging part 380 for judging the kind of a pattern using a part of a plurality of the elements, a positional shift quantity operation part 390 for operating the positional shift quantity due to the method of least squares using the regular matrix wherein a predetermined element is eliminated from the regular matrix corresponding to the kind of the pattern, a position correction part 350 for correcting the position matched with the position shifted by the positional shift quantity, and a comparing part 108 for performing comparison at the position. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于以高精度执行参考图像和光学图像的位置对准的方法和装置。 解决方案：一个实施例的样本检查系统100配备有用于操作正规矩阵的多个元素的规则矩阵元素操作部分370，这是由于用于操作来自临时的 光学图像和参考图像的对准位置，用于判断使用多个元件的一部分的图案的种类的尺寸判断部件380，用于根据该方法操作位置偏移量的位置偏移量操作部分390 使用其中从与图案的种类相对应的规则矩阵中去除预定元素的正规矩阵的最小二乘法，用于校正与偏移位置偏移量相匹配的位置的位置的位置校正部分350以及比较部分108 用于在该位置执行比较。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007205828A

公开(公告)日：2007-08-16

申请号：JP2006024079

申请日：2006-02-01

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： HIRANO RYOICHI ,  OGAWA TSUTOMU

IPC: G01N21/956

Abstract: PROBLEM TO BE SOLVED: To acquire a high contrast optical image of the pattern of a sample to be inspected. SOLUTION: The optical image acquisition device comprises a mounting section for mounting the sample to be inspected, a light radiating section for radiating light to the sample to be inspected mounted on the mounting section, a light quantity adjusting section for increasing and decreasing the light quantity of the radiated light radiated to the sample to be inspected, and an optical image receiving section for receiving the radiated light radiated to the sample to be inspected. The light quantity of the radiated light is increased and decreased with respect to a specific pattern of the sample to be inspected. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：获取要检查的样品的图案的高对比度光学图像。 解决方案：光学图像采集装置包括用于安装待检测样品的安装部分，用于将光照射到安装在安装部分上的被检查样品的光辐射部分，用于增加和减少的光量调节部分 辐射到待检查样品的辐射光的光量和用于接收辐射到待检查样品的辐射光的光学图像接收部分。 相对于要检查的样品的特定图案，辐射光的光量增加和减小。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007142293A

公开(公告)日：2007-06-07

申请号：JP2005336487

申请日：2005-11-22

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： KUDO AKIRA ,  TAKAHARA KENICHI

IPC: H01L21/68 ,  G01N21/956 ,  G03F1/84 ,  H01L21/027 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To provide a substrate inspection apparatus capable of shortening an inspection processing time. SOLUTION: The substrate inspection apparatus 100 for inspecting a substrate 101 is provided with an XY stage 121 moving in a horizontal direction; a Z-θ stage 122 provided on the XY-stage 121 and moving in a vertical direction and a rotating direction; and a holding device 102 for holding the substrate 101 so that the height of an inspection surface of the substrate 101 may be arranged on a barycenter height position of the Z-θ stage 122. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决的问题：提供能够缩短检查处理时间的基板检查装置。 解决方案：用于检查基板101的基板检查装置100设置有沿水平方向移动的XY台121; 设置在XY台121上并沿垂直方向和旋转方向移动的Z-θ平台122; 以及保持装置102，用于保持基板101，使得基板101的检查表面的高度可以布置在Z-θ平台122的重心高度位置。版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007142292A

公开(公告)日：2007-06-07

申请号：JP2005336486

申请日：2005-11-22

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： KUDO AKIRA ,  TAKAHARA KENICHI

IPC: H01L21/68 ,  G01N21/956 ,  G05D3/00 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To provide a substrate inspection apparatus capable of keeping the position of a surface to be inspected more highly accurately. SOLUTION: The substrate inspection apparatus for inspecting a substrate 101 is provided with an XY-stage 121 moving in a horizontal direction; a Z-stage 103 arranged on the XY-stage 121 and moving in a vertical direction; three actuator mechanisms 107a, 107b and 107c each having a piezoelectric element and causing the Z-stage 103 to move in a vertical direction at three points; and an elastic hinge 108 for supporting the Z-stage 103. Further, a θ-stage 106 moving in a rotating direction using the center of a substrate 101 as a virtual center axis is arranged on the Z-stage 103. The θ-stage 106 is provided with a rod 308 moving in a linear direction and an elastic member 113 connected to the rod 308 and rotating the θ-stage 106 while elastically deforming. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供能够更高精度地保持要检查的表面的位置的基板检查装置。 解决方案：用于检查基板101的基板检查装置设置有沿水平方向移动的XY台121; 布置在XY台121上并沿垂直方向移动的Z级103; 三个致动器机构107a，107b和107c各自具有压电元件，并使Z档103在三个位置沿垂直方向移动; 以及用于支撑Z级103的弹性铰链108.此外，在Z级103上配置有使用基板101的中心作为虚拟中心轴在旋转方向上移动的θ级106.θ级 106设置有沿直线方向移动的杆308和连接到杆308的弹性构件113，并且在弹性变形的同时旋转θ级106。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007086535A

公开(公告)日：2007-04-05

申请号：JP2005276585

申请日：2005-09-22

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： UMEDA TAKUO ,  MATSUMURA KENICHI

IPC: G01N21/956 ,  G03F1/84

CPC classification number: G03F1/84 ,  G03F7/70616 ,  G06T7/001 ,  G06T2207/30148

Abstract: PROBLEM TO BE SOLVED: To alleviate time required for pattern inspection processing of a test piece for inspection, and at the same time to ensure high inspection sensitivity. SOLUTION: In a pattern inspection device with which patterns of a plurality of dies 22 formed on the test piece 2 for inspection are inspected, the pattern inspection device is equipped with a memory device 36 for a stream image to store the stream image of the test piece 2 for inspection, and a DD comparing section 51 to DD compare the patterns of the respective dies 22 in the stream image with one another. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了减轻检查用试件的图案检查处理所需的时间，同时确保高检查灵敏度。 解决方案：在检查形成在用于检查的试件2上的多个模具22的图案的图案检查装置中，图案检查装置配备有用于存储流图像的流图像的存储装置36 的DD比较部51〜DD将流图像中的各个模具22的图案进行比较。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007086534A

公开(公告)日：2007-04-05

申请号：JP2005276584

申请日：2005-09-22

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： OOAKI JIYUNJI ,  HARABE NOBUYUKI

IPC: G03F1/84

CPC classification number: G06T7/001 ,  G06T2207/30164

Abstract: PROBLEM TO BE SOLVED: To correct an image with high accuracy in a periphery of an inspected region while eliminating influences of an inspection unnecessary region in a pattern image of an inspection objective sample. SOLUTION: The invention provides a pattern inspection device equipped with: a correction region designating section to designate a correction region including each pattern and its periphery in an inspection reference pattern image and an inspection objective pattern image; a simultaneous equation generating section to generate a simultaneous equation from a linear prediction model on the inspection reference pattern image in the correction region and on the inspection objective pattern image in the correction region; a parameter generating section to solve the simultaneous equation to obtain model parameters; and a corrected pattern image forming section to apply the linear prediction model using the model parameters on the inspection reference pattern image to generate a corrected pattern image. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：在检查对象样本的图案图像中消除检查不必要区域的影响的同时，在检查区域的周围高精度地校正图像。 解决方案：本发明提供一种图案检查装置，其配备有：校正区域指定部，其在检查基准图案图像和检查对象图案图像中指定包括各图案及其周边的校正区域; 在校正区域中的检查参考图案图像上的线性预测模型和校正区域中的检查对象图案图像上生成联立方程的联立方程生成部; 参数产生部分，用于求解模型参数的联立方程; 以及校正图案图像形成部，其使用所述模型参数将所述线性预测模型应用于所述检查基准图案图像，以生成校正图案图像。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007085995A

公开(公告)日：2007-04-05

申请号：JP2005277773

申请日：2005-09-26

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： SAITO YASUKO

IPC: G01N21/956 ,  G03F1/84

Abstract: PROBLEM TO BE SOLVED: To provide a device for quickly generating reference image of a necessary area from a design data, a device for preparing the reference image, and methods therefor. SOLUTION: This index information preparation device 200 is provided with an area-dividing part 222 for dividing imaginarily a photomask 101 into a plurality of areas, an area-extracting part 224 for inputting a CAD data file for the photomask 101 including a plurality of graphic data, and for extracting the area with each graphic pattern in the plurality of graphic data belonging thereto from among the plurality of areas, and a writing part 228 for preparing index information 20, by writing an area number indicating the extracted area, while correlating therewith an file offset in the CAD data file of the graphic data belonging to the extracted area. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于从设计数据快速生成必要区域的参考图像的装置，用于准备参考图像的装置及其方法。 解决方案：该索引信息准备装置200设置有用于将光掩模101分成多个区域的区域划分部分222，用于输入用于光掩模101的CAD数据文件的区域提取部分224，包括 多个图形数据，并且用于从多个区域中的属于其的多个图形数据中的每个图形图形提取区域;以及用于通过写入指示提取区域的区域编号来准备索引信息20的写入部分228， 同时与属于提取区域的图形数据的CAD数据文件中的文件偏移相关联。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007072232A

公开(公告)日：2007-03-22

申请号：JP2005260109

申请日：2005-09-08

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： HARABE NOBUYUKI

IPC: G01N21/956 ,  G03F1/84

CPC classification number: G03F1/84

Abstract: PROBLEM TO BE SOLVED: To appropriately form a reference image according to the characteristics of a pattern upon inspecting a pattern of an inspection object. SOLUTION: A reference image forming apparatus is equipped with: an optical image acquiring unit 10 acquiring an optical image 100 of an inspection object; a conversion parameter determining unit 203 determining a conversion parameter 204 from the optical image 100 and the design data 201 of the inspection object by using characteristics data 202 based on the characteristics of the image pattern of the inspection object; and a reference image forming unit 20 forming a reference image 200 by computing the conversion parameter 204 and the design data 201. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：在检查检查对象的图案时，根据图案的特性适当地形成参考图像。 解决方案：参考图像形成装置配备有：光学图像获取单元10，其获取检查对象的光学图像100; 转换参数确定单元203基于检查对象的图像图案的特性，通过使用特征数据202从光学图像100和检查对象的设计数据201确定转换参数204; 以及参考图像形成单元20，通过计算转换参数204和设计数据201来形成参考图像200.版权所有（C）2007，JPO＆INPIT