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公开(公告)号：KR101386016B1
公开(公告)日：2014-04-16
申请号：KR1020120134282
申请日：2012-11-26
Applicant: 한국전기연구원
Abstract: An electron beam generation device according to the present invention includes a vacuum chamber with an opening unit emitting the electron beam on the upper part; a cold cathode located in the vacuum chamber; a grid electrode on the upper part of the cold cathode; an anode on the upper part of the grid electrode; a first power source for applying direct current voltage between the cold cathode and the anode; a second power source for applying alternating current voltage between the cold cathode and the anode; and a laser beam source for generating laser beam pulses outside of the vacuum chamber and delivering the laser beam pulses into the vacuum chamber via a light-guiding unit while the laser beam pulses are emitted towards an electron-emitting unit formed on the cold cathode. The electron beam generation device according to the present invention is capable of significantly reducing the width of the electron beam pulses by generating the electron beam pulses using laser beam pulses.
Abstract translation: 根据本发明的电子束产生装置包括具有在上部发射电子束的开口单元的真空室; 位于真空室内的冷阴极; 冷阴极上部的栅电极; 栅电极上部的阳极; 用于在冷阴极和阳极之间施加直流电压的第一电源; 用于在所述冷阴极和所述阳极之间施加交流电压的第二电源; 以及激光束源，用于在真空室外产生激光束脉冲，并且通过光导单元将激光束脉冲输送到真空室中，同时将激光束脉冲朝向形成在冷阴极上的电子发射单元发射。 根据本发明的电子束产生装置能够通过使用激光束脉冲产生电子束脉冲来显着地减小电子束脉冲的宽度。
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公开(公告)号：KR101378447B1
公开(公告)日：2014-03-26
申请号：KR1020120130836
申请日：2012-11-19
Applicant: 한국전기연구원
Abstract: The present invention relates to a non-invasive medical instrument including an MRI device and a LINAC system, capable of minimizing impacts of a LINAC system or surrounding metal materials on a magnetic field for MRI and minimizing impacts on the generation of electronic beams in the LINAC system while maintaining uniform distribution of the magnetic field for MRI whilst acquiring images from an MRI device and enabling local X-ray generation of the LINAC system at various angles, by installing the LINAC system to be rotatable and movable through a rail or a rotation gantry inside a circular- or disk-shaped outer box having a magnetic field shielding structure among magnetic field generation devices for MRI. [Reference numerals] (AA) X-ray
Abstract translation: 本发明涉及一种包括MRI装置和LINAC系统的非侵入性医疗器械，其能够最小化LINAC系统或周围金属材料对MRI磁场的影响并最小化对LINAC中电子束产生的影响 系统，同时保持用于MRI的磁场的均匀分布，同时从MRI装置获取图像，并且通过将LINAC系统安装成可旋转并可通过轨道或旋转机架移动，从而实现各种角度的LINAC系统的局部X射线产生 在用于MRI的磁场产生装置中具有磁场屏蔽结构的圆形或圆盘形外箱内。 （附图标记）（AA）X射线
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公开(公告)号：KR101339647B1
公开(公告)日：2013-12-09
申请号：KR1020110144056
申请日：2011-12-28
Applicant: 한국전기연구원
IPC: H01L21/306 , H01L33/00
Abstract: 다수의 단위 광결정 패턴들이 주기적으로 격자(grid) 형태로 배치되는 광결정 회로를 포함하는 광 결정 밴드갭 소자의 제조방법이 제공된다. 광 결정 밴드갭 소자의 제조방법은, (a) 금속층을 이용하여 두 개의 웨이퍼들을 본딩(bonding)하는 단계와, (b) 광결정 회로 제작을 위해 본딩된 웨이퍼들 중 상판 웨이퍼에 대해 CMP(Chemical Mechanical Polishing) 공정을 수행하여 상판 웨이퍼의 두께를 조절하는 단계와, (c) 상판 웨이퍼의 두께를 조절하는 것에 의해 광결정 회로의 주파수 대역이 결정된 후 감광성 에칭 마스크(photosensitive etching mask)를 이용하여 광결정 회로 제작을 위한 마스크 패턴을 형성하는 단계와, (d) 상기 마스크 패턴에 대해 습식 식각 공정을 적용하여 광 결정 밴드갭 소자를 제조하는 단계를 포함한다.
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Patent Agency Ranking
公开(公告)号：KR101338010B1
公开(公告)日：2013-12-09
申请号：KR1020120085895
申请日：2012-08-06
Applicant: 한국전기연구원
Abstract: The present invention relates to a method for manufacturing the two stage grating circuit (or low speed wave circuit) of vacuum microelectronic device. A silicon wafer used as the engraved frame of the grating circuit is manufactured by a Cu-Cu wafer bonding technology or a single wafer. The pattern of the grating circuit is manufactured by a photolithography process. The height of the grating circuit is manufactured by using a chemical mechanical polishing process for the two stage grating circuit. Therefore, high manufacture accuracy, high productivity, and low manufacture costs are realized. [Reference numerals] (AA,BB) Metal lattice
Abstract translation: 本发明涉及真空微电子器件的二级光栅电路（或低速波电路）的制造方法。 用作光栅电路的雕刻框架的硅晶片由Cu-Cu晶片接合技术或单个晶片制造。 光栅电路的图案通过光刻工艺制造。 通过使用用于两级光栅电路的化学机械抛光工艺来制造光栅电路的高度。 因此，实现了高制造精度，高生产率和低制造成本。 （附图标记）（AA，BB）金属晶格
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公开(公告)号：KR101296748B1
公开(公告)日：2013-08-20
申请号：KR1020120030411
申请日：2012-03-26
Applicant: 한국전기연구원
Abstract: PURPOSE: A high speed/high resolution spectral/image measurement system using an electromagnetic wave of an optical based are provided to obtain a high spatial resolution, and to obtain a high signal to noise ratio without a loss of a light source. CONSTITUTION: A high speed/high resolution spectral/image measurement system using an electromagnetic wave of an optical based comprise an optical system (110), a reflector (120), a scanning mirror (121), a THz wave generator (130), and an optical detector (190). The optical system focuses a laser generated in a laser unit, and makes an incident to a measurement object sample of a lower part of the THz wave generator and the reflector. The reflector is formed in a form of a pellicle or a form of a reflecting surface having a hole. The scanning mirror scans an incoming laser. The THz wave generator comprises an optical crystal, a support layer, a non-reflective coating layer, and a functional layer. The optical crystal generates a Thz wave, and the support layer protects an optical crystal, and the non-reflective coating layer reduces a loss of a laser light. The functional layer protects the measurement object sample, and passes the THz wave of a specific frequency. The optical detector generates an electric signal about a focused THz wave in the optical system. [Reference numerals] (AA) Scanning; (BB) Optical crystal; (CC) Sample
Abstract translation: 目的：提供使用基于光学的电磁波的高速/高分辨率光谱/图像测量系统以获得高空间分辨率，并且获得高的信噪比而不损失光源。 构成：使用光学电磁波的高速/高分辨率光谱/图像测量系统包括光学系统（110），反射器（120），扫描反射镜（121），太赫兹波发生器（130） 和光学检测器（190）。 光学系统聚焦在激光单元中产生的激光，并且对THz波发生器和反射器的下部的测量对象样本进行入射。 反射器形成为防护薄膜或具有孔的反射表面的形式。 扫描镜扫描传入的激光。 太赫兹波发生器包括光学晶体，支撑层，非反射涂层和功能层。 光学晶体产生Thz波，并且支撑层保护光学晶体，并且非反射涂层减少了激光的损失。 功能层保护测量对象样本，并通过特定频率的THz波。 光学检测器在光学系统中产生关于聚焦的THz波的电信号。 （附图标记）（AA）扫描; （BB）光学晶体; （CC）样品
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公开(公告)号：KR1020130029208A
公开(公告)日：2013-03-22
申请号：KR1020110092464
申请日：2011-09-14
Applicant: 한국전기연구원
IPC: H01L21/306 , H01L21/3065
CPC classification number: H01J37/32422
Abstract: PURPOSE: A method for manufacturing a micro grid structure is provided to easily form grid patterns of various shapes by using a silicon plate. CONSTITUTION: Grid grooves are formed in a first surface of a silicon plate(S10). A first silicon oxide film is formed in both surfaces of the silicon plate through a thermal oxidation process(S20). A groove and a grid hole are formed in a second surface of the silicon plate(S30). A second silicon oxide film is formed in both surfaces of the silicon plate through a thermal oxidation process(S40). A metal layer is formed on the second silicon oxide film(S50). [Reference numerals] (S10) Forming grid grooves in a first surface; (S20) Forming a first silicon oxide film through a thermal oxidation process; (S30) Forming a groove and a grid hole in a second surface; (S40) Forming a second silicon oxide film through a thermal oxidation process; (S50) Forming a metal layer on the first surface
Abstract translation: 目的：提供一种用于制造微格栅结构的方法，以通过使用硅板容易地形成各种形状的网格图案。 构成：在硅板的第一表面中形成网格槽（S10）。 通过热氧化处理在硅板的两个表面上形成第一氧化硅膜（S20）。 在硅板的第二表面中形成有槽和栅格孔（S30）。 通过热氧化工艺在硅板的两个表面上形成第二氧化硅膜（S40）。 在第二氧化硅膜上形成金属层（S50）。 （附图标记）（S10）在第一面中形成网格槽; （S20）通过热氧化法形成第一氧化硅膜; （S30）在第二表面形成槽和栅格孔; （S40）通过热氧化工序形成第二氧化硅膜; （S50）在第一表面上形成金属层
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公开(公告)号：KR101092217B1
公开(公告)日：2011-12-12
申请号：KR1020090112989
申请日：2009-11-23
Applicant: 한국전기연구원
IPC: G02B6/12
Abstract: 본발명은광결정도파관구조를활용하여직류전압으로편향된초고주파(RF) 신호를발생시키거나직류전압으로편향된초고주파신호에서직류전압편향을제거하기위한바이어스-티 (bias-Tee)에관한것이다. 본발명의일면에따른광결정바이어스-티는, 선결함이포함된복수의유전체막대로이루어지는이차원광결정, 및상기이차원광결정을덮는상측금속판과하측금속판을포함하고, 상기상측금속판은전기적으로분리절연을위한절연구간을사이에두고형성된제1 상측금속판및 제2 상측금속판을포함한다.
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