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    Thermoplastic moulding compositions
    73.
    发明专利
    Thermoplastic moulding compositions 未知

    公开(公告)号：DE3530304A1

    公开(公告)日：1987-02-26

    申请号：DE3530304

    申请日：1985-08-24

    Applicant: BASF AG

    Inventor： HAMBRECHT JUERGEN DR ,  HOENL HANS DR ,  ECHTE ADOLF DR

    IPC: C08L51/04 ,  C08L71/12 ,  C08L25/04 ,  C08L25/10 ,  C08L53/02 ,  C08L71/04

    Abstract: The invention relates to thermoplastic moulding compositions based on impact-modified styrene polymers with a total polybutadiene content of from 4 to 12 % by weight and polyphenylene ethers, where the particles of the soft phase of the impact-modified styrene polymer have a mean particle diameter in the range from 0.01 to 0.05 mu m and have a drop shape. The soft phase is preferably prepared by free-radical polymerization of the styrene in the presence of a mixture of a) homopolybutadiene and b) a linear styrene-butadiene two-block copolymer containing from 10 to 60 % by weight of copolymerized butadiene, where the proportion of homopolybutadiene compared with the total polybutadiene content of the impact-modified styrene polymer is from 10 to 50 % by weight. e

    Self-extinguishing, halogen-free thermoplastic moulding composition
    74.
    发明专利
    Self-extinguishing, halogen-free thermoplastic moulding composition 未知

    公开(公告)号：DE3526549A1

    公开(公告)日：1987-02-05

    申请号：DE3526549

    申请日：1985-07-25

    Applicant: BASF AG

    Inventor： MUENCH VOLKER DR ,  TAUBITZ CHRISTOF DR ,  HAMBRECHT JUERGEN DR ,  ECHTE ADOLF DR

    IPC: C08L25/12 ,  C08L51/00 ,  C08L51/04 ,  C08L61/10 ,  C08L71/12 ,  C08L85/00 ,  C08L71/04 ,  C08K3/32 ,  C08K5/49

    Abstract: Self-extinguishing, halogen-free thermoplastic moulding composition containing: A) from 3 to 97 % by weight of a halogen-free thermoplastic resin which contains, in copolymerized form, a1 a vinylaromatic monomer and a2 acrylonitrile, optionally containing B) up to 40 % by weight of an elastomer having a glass transition temperature of below 0 DEG C which is used in the form of a graft copolymer of the monomers a1) and a2) of component A), C) from 97 to 3 % by weight of a halogen-free thermoplastic polyphenylene ether (PPE) of the formula in which Y is a monovalent substituent and r is an integer from 20 to 200, D) from 0.5 to 40 % by weight of a phosphorus-containing compound (flameproofing agent), E) from 0.3 to 95 % by weight of a copolymer (comb polymer) which comprises a main chain in a proportion of from 90 to 10 % by weight and side chains bonded thereto in a proportion of from 10 to 90 % by weight, where the main chain has a weight average molecular weight Mw in the range from 5000 to 2 . 10 and each of the side chains has a weight average molecular weight of from 2000 to 60000, and where the main chain is a terpolymer which contains, in copolymerized form: ea) from 60 to 91 % by weight of at least one vinylaromatic monomer, eb) from 40 to 9 % by weight of acrylonitrile and ec) from 0.1 to 10 % by weight of a monomer of the formula where R1 = H or methyl, Ar is an optionally alkyl-substituted aromatic radical having 6 to ... Original abstract incomplete.

    TREATMENT PROCESS FOR (CO)POLYMERS TO ELIMINATE REST MONOMERS
    77.
    发明专利
    TREATMENT PROCESS FOR (CO)POLYMERS TO ELIMINATE REST MONOMERS 未知

    公开(公告)号：DE3365251D1

    公开(公告)日：1986-09-18

    申请号：DE3365251

    申请日：1983-04-21

    Applicant: BASF AG

    Inventor： REFFERT RUDI WILHELM ,  HAMBRECHT JUERGEN DR ,  JUNG RUDOLF H DR ,  ECHTE ADOLF DR

    IPC: C08F6/00 ,  C08F6/10 ,  C08F6/16 ,  C08F6/24 ,  C08F6/28

    Abstract: (Co)polymers which are composed of one or more monomers from the group comprising (a) the vinyl-aromatic monomers and (b) the ethylenically unsaturated monomers and furthermore contain one or more monomer components (a) or (b), or (a) and (b), as unreacted residual monomers are treated at above the glass temperature of the (co)polymer and in the presence of one or more assistants, which have been added to the (co)polymer. The assistant used is a bicyclic compound of the general formula I where X is a methylene, ethylene, 1,1-ethenyl, 1,2-ethenyl, carbonyl, azo, amino, ether or thioether group which is unsubstituted or substituted by halogen, alkyl, alkenyl, cycloalkyl, aryl, carboxyl, carboxyalkyl, an ether group or a thioether group, R1, R2, R3 and R4 are each hydrogen, halogen, alkyl, alkenyl, cycloalkyl, aryl, carboxyalkyl or nitrile, R5 and R6 are each hydrogen, halogen, alkyl or carboxyalkyl, and R7 and R8 are each hydrogen, halogen, alkyl, alkenyl, aryl, carboxyalkyl, carboxyl or nitrile.

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