公开(公告)号：WO2008031076A2

公开(公告)日：2008-03-13

申请号：PCT/US2007/077943

申请日：2007-09-07

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  TORTONESE, Marco ,  BEVIS, Christoper, F.

Inventor： TORTONESE, Marco ,  BEVIS, Christoper, F.

IPC: G01N13/16

CPC classification number: G01Q60/38 ,  G01Q70/02

Abstract: In one embodiment, an atomic force microscope comprises a frame, a beam coupled to the frame at a first end and a second end, a probe mounted to the beam, means for inducing relative motion between the beam and an underlying surface, and means for detecting a characteristic of the beam.

Abstract translation: 在一个实施例中，原子力显微镜包括框架，在第一端耦合到框架的梁和第二端，安装到梁的探针，用于引导梁和下面的表面之间的相对运动的装置，以及用于 检测光束的特性。

公开(公告)号：WO2007111696A2

公开(公告)日：2007-10-04

申请号：PCT/US2006/060701

申请日：2006-11-09

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  CHEN, Da ,  FOUQUET, Christophe ,  BANERJEE, Saibal ,  BHATTACHARYYA, Santosh ,  WANG, Joseph ,  YAO, Lian ,  VAN RIET, Mike ,  GERMANENKO, Igor

Inventor： CHEN, Da ,  FOUQUET, Christophe ,  BANERJEE, Saibal ,  BHATTACHARYYA, Santosh ,  WANG, Joseph ,  YAO, Lian ,  VAN RIET, Mike ,  GERMANENKO, Igor

IPC: G06T7/40

CPC classification number: G06T7/001 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/95607 ,  G06T2207/30148

Abstract: Methods, defect review tools, and systems for locating a defect in a defect review process are provided. One method includes acquiring one or more images and data from an inspection tool. The one or more images illustrate an area on a specimen in which a defect to be reviewed is located. The data indicates a position and features of the defect within the area. The method also includes acquiring one or more additional images of the specimen proximate the position of the defect indicated in the data using an imaging subsystem of a defect review tool. In addition, the method includes identifying a portion of the one or more additional images that corresponds to the one or more images. The method further includes determining a position of the defect within the portion of the one or more additional images using the data.

Abstract translation: 提供了方法，缺陷评估工具和用于在缺陷评估过程中定位缺陷的系统。 一种方法包括从检查工具获取一个或多个图像和数据。 一个或多个图像示出了待检查缺陷所在的样本上的区域。 数据表示该区域内缺陷的位置和特征。 该方法还包括使用缺陷评估工具的成像子系统获取在数据中指示的缺陷的位置附近的样本的一个或多个附加图像。 此外，该方法包括识别对应于一个或多个图像的一个或多个附加图像的一部分。 所述方法还包括使用所述数据确定所述一个或多个附加图像的所述部分内的所述缺陷的位置。

公开(公告)号：WO2007075496A3

公开(公告)日：2007-07-05

申请号：PCT/US2006/048089

申请日：2006-12-14

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  MAPOLES, Evan R. ,  CHEN, Grace H. ,  BEVIS, Christopher F. ,  SHORTT, David W.

Inventor： MAPOLES, Evan R. ,  CHEN, Grace H. ,  BEVIS, Christopher F. ,  SHORTT, David W.

IPC: G01B9/02 ,  G01B11/02 ,  G01B11/24 ,  G01B11/30 ,  G01N21/00 ,  G01N21/86 ,  G01N21/88 ,  G01V8/00 ,  G06K9/00 ,  H04N7/18 ,  H04N9/47

Abstract: A dark field surface inspection tool and system are disclosed herein. The tool includes an illumination source (303) capable of scanning light (I) onto an inspection surface (301). Light scattered (S) by each inspection point is captured as image data by a photo detector array (305) arranged at a fourier plane. The images captured are adaptively filtered to remove a portion of the bright pixels from the images to generate filtered images. The filtered images are then analyzed to detect defects in the inspection surface. Methods of the invention include using die-to-die comparison to identify bright portions of scattering patterns and generate unique image filters associated with those patterns. The associated images are then filtered to generate filtered images which are then used to detect defects Also, data models of light scattering behavior can be used to generate filters.

公开(公告)号：WO2007016682A3

公开(公告)日：2007-02-08

申请号：PCT/US2006/030296

申请日：2006-08-02

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  HWANG, Shiow-Hwei ,  FU, Tao-Yi ,  LIU, Xiumei

Inventor： HWANG, Shiow-Hwei ,  FU, Tao-Yi ,  LIU, Xiumei

IPC: G01N21/00

Abstract: Systems configured to generate output corresponding to defects on a specimen and systems configured to generate phase information about defects on a specimen are provided. One system includes an optical subsystem that is configured to create interference between a test beam and a reference beam. The test beam and the reference beam are reflected from the specimen. The system also includes a detector that is configured to generate output representative of the interference between the test and reference beams. The interference increases contrast between the output corresponding to the defects and output corresponding to non-defective portions of the specimen.

公开(公告)号：WO2007005340A3

公开(公告)日：2007-01-11

申请号：PCT/US2006/024609

申请日：2006-06-22

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  CHUANG, Yung-Ho ,  ARMSTRONG, J. Joseph

Inventor： CHUANG, Yung-Ho ,  ARMSTRONG, J. Joseph

IPC: G01N21/00

Abstract: A method and apparatus for inspecting a specimen are provided. The apparatus comprises a primary illumination source, a catadioptric objective exhibiting central obscuration that directs light energy received from the primary illumination source at a substantially normal angle toward the specimen, and an optical device, such as a prism or reflective surface, positioned within the central obscuration resulting from the catadioptric objective for receiving further illumination from a secondary illumination source and diverting the further illumination to the specimen. The method comprises illuminating a surface of the specimen at a variety of angles using a primary illumination source, illuminating the surface using a secondary illumination source, the illuminating by the secondary illumination source occurring at a substantially normal angle of incidence; and imaging all reflected, scattered, and diffracted lig

公开(公告)号：WO2006133233A2

公开(公告)日：2006-12-14

申请号：PCT/US2006/022005

申请日：2006-06-06

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  DISHNER, Mark ,  LEE, Christopher, W. ,  MCCAULEY, Sharon ,  HUET, Patrick ,  WANG, David

Inventor： DISHNER, Mark ,  LEE, Christopher, W. ,  MCCAULEY, Sharon ,  HUET, Patrick ,  WANG, David

IPC: G06F19/00

CPC classification number: G05B23/0221

Abstract: Computer-implemented methods for performing one or more defect-related functions are provided. One method for identifying noise in inspection data includes identifying events detected in a number of sets of inspection data that is less than a predetermined number as noise. One method for binning defects includes binning the defects into groups based on defect characteristics and the sets of the inspection data in which the defects were detected. One method for selecting defects for defect analysis includes binning defects into group(s) based on proximity of the defects to each other and spatial signatures formed by the group(s). A different method for selecting defects for defect analysis includes selecting defects having the greatest diversity of defect characteristic(s) for defect analysis. One method includes classifying defects on a specimen using inspection data generated for the specimen combined with defect review data generated for the specimen.

Abstract translation: 提供了用于执行一个或多个缺陷相关功能的计算机实现的方法。 用于识别检查数据中的噪声的一种方法包括将小于预定数目的多组检查数据中检测到的事件识别为噪声。 分类缺陷的一种方法包括基于缺陷特征和检测缺陷检查数据的集合将缺陷合并成组。 用于选择缺陷分析的缺陷的一种方法包括基于缺陷彼此的接近度和由组形成的空间特征将缺陷合并成组。 用于选择缺陷分析缺陷的不同方法包括选择具有最大差异缺陷特征的缺陷以进行缺陷分析。 一种方法包括使用生成的样本的检查数据与样本产生的缺陷评估数据相结合来对样本进行分类。

公开(公告)号：WO2006133206A1

公开(公告)日：2006-12-14

申请号：PCT/US2006/021950

申请日：2006-06-06

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  JEONG, Hwan, J.

Inventor： JEONG, Hwan, J.

IPC: G02B17/00

CPC classification number: G02B17/0804 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2201/0636 ,  G02B17/0852

Abstract: Systems configured to provide illumination of a specimen during inspection are provided. One system includes catoptric elements configured to direct light from a light source to a line across the specimen at an oblique angle of incidence. The catoptric elements include positive and negative elements configured such that pupil distortions of the positive and negative elements are substantially canceled. Another system includes a dioptric element and a catoptric element. The dioptric element and the catoptric element are configured to direct light from a light source to a line across the specimen at an oblique angle of incidence. The dioptric and catoptric elements are also configured such that pupil distortions of the dioptric and catoptric elements are substantially canceled.

Abstract translation: 提供被配置为在检查期间提供样品的照明的系统。 一个系统包括反射元件，其被配置为将光从光源引导到以倾斜入射角穿过样本的线。 反射元件包括正和负元件，其被配置为使得正和负元件的光瞳畸变被基本上消除。 另一个系统包括一个折射元件和一个折射元件。 折射元件和反射元件被构造成将来自光源的光以倾斜的入射角引导到跨越样本的线。 折射和折射元件也被配置为使得屈光度和折射元件的瞳孔变形基本上被消除。

公开(公告)号：WO2006113145A3

公开(公告)日：2006-10-26

申请号：PCT/US2006/012846

申请日：2006-04-07

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  WATSON, Sterling, G. ,  LEVY, Ady ,  MACK, Chris, A. ,  STOKOWSKI, Stanley, E. ,  SAIDIN, Zain, K.

Inventor： WATSON, Sterling, G. ,  LEVY, Ady ,  MACK, Chris, A. ,  STOKOWSKI, Stanley, E. ,  SAIDIN, Zain, K.

IPC: G01P3/36 ,  G01N21/00 ,  G02B23/10

Abstract: Disclosed are systems and methods for mitigating variances (e.g., critical dimension variances) on a patterned wafer are provided. In general, variances of a patterned wafer are predicted using one or more reticle fabrication and/or wafer processing models. The predicted variances are used to modify selected transparent portions of the reticle that is to be used to produce the patterned wafer. In a specific implementation, an optical beam, such as a femto-second laser, is applied to the reticle at a plurality of embedded positions, and the optical beam is configured to form specific volumes of altered optical properties within the transparent material of the reticle at the specified positions. These reticle volumes that are created at specific positions of the reticle result in varying amounts of light transmission or dose through the reticle at such specific positions so as to mitigate the identified variances on a wafer that is patterned using the modified reticle.

公开(公告)号：WO2006094021A2

公开(公告)日：2006-09-08

申请号：PCT/US2006/007195

申请日：2006-02-28

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  FROMMER, Aviv ,  LEVINSKI, Vladimir ,  SMITH, Mark, D. ,  BYERS, Jeffrey ,  MACK, Chris, A. ,  ADEL, Michael, E.

Inventor： FROMMER, Aviv ,  LEVINSKI, Vladimir ,  SMITH, Mark, D. ,  BYERS, Jeffrey ,  MACK, Chris, A. ,  ADEL, Michael, E.

CPC classification number: G03F9/7049 ,  G03F7/70633 ,  G03F9/7088

Abstract: In one embodiment, a system for imaging an acquisition target or an overlay or alignment semiconductor target is disclosed. The system includes a beam generator for directing at least one incident beam having a wavelength l towards a periodic target having structures with a specific pitch p. A plurality of output beams are scattered from the periodic target in response to the at least one incident beam. The system further includes an imaging lens system for passing only a first and a second output beam from the target. The imaging system is adapted such that the angular separation between the captured beams, l, and the pitch are selected to cause the first and second output beams to form a sinusoidal image. The system also includes a sensor for imaging the sinusoidal image or images, and a controller for causing the beam generator to direct the at least one incident beam towards the periodic target or targets, and for analyzing the sinusoidal image or images. In one application the detector detects a sinusoidal image of an acquisition target with the same pitch as the designed target and the controller analyzes the pitch of the sinusoidal image compared to design data to determine whether the target has been successfully acquired. In a second application a first and second periodic target that each have a specific pitch p are imaged so that the detector detects a first sinusoidal image of the first target and a second sinusoidal image of the second target and the controller analyzes the first and second sinusoidal image to determine whether the first and second targets have an overlay or alignment error.

Abstract translation: 在一个实施例中，公开了一种用于对采集目标或覆盖或对准半导体目标进行成像的系统。 该系统包括用于将具有波长l的至少一个入射光束引向具有特定间距p的结构的周期性目标的光束发生器。 响应于至少一个入射光束，多个输出光束从周期性靶标散射。 该系统还包括用于仅从目标通过第一和第二输出光束的成像透镜系统。 成像系统被适配成使得捕获的光束1和间距之间的角度间隔被选择为使得第一和第二输出光束形成正弦图像。 该系统还包括用于对正弦图像或图像进行成像的传感器，以及控制器，用于使光束发生器将至少一个入射光束引向周期性目标或目标，并用于分析正弦图像或图像。 在一个应用中，检测器以与设计目标相同的间距检测采集目标的正弦图像，并且控制器分析与设计数据相比的正弦图像的间距，以确定目标是否已被成功获取。 在第二应用中，每个具有特定间距p的第一和第二周期性目标成像，使得检测器检测第一目标的第一正弦图像和第二目标的第二正弦图像，并且控制器分析第一和第二正弦曲线 图像以确定第一和第二目标是否具有覆盖或对齐错误。

公开(公告)号：WO2006062952A3

公开(公告)日：2006-06-15

申请号：PCT/US2005/044075

申请日：2005-12-06

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  BAREKET, Noah ,  WANG, Haiming

Inventor： BAREKET, Noah ,  WANG, Haiming

IPC: G01B7/00 ,  G01B11/00 ,  G01B11/14 ,  G01B15/00 ,  G01J3/28 ,  G01N21/86 ,  G06F7/60 ,  G06F15/00 ,  G06F17/10 ,  G06F19/00 ,  G01V8/00 ,  H01L21/00

Abstract: Techniques for optimizing the sensitivity of spectroscopic measurement techniques (100) with respect to certain profile variables include selecting desired measurement angles (104) since the measurement sensitivity to each variable depends, at least in part, on the measurement angles of an incident beam. The selected desired set of measurement angles includes both an azimuth angle and a polar angle (106). Optimizing the sensitivity of spectroscopic measurement techniques (100) can also reduce or eliminate measurement correlation among variables to be measured.