Abstract:
PURPOSE: A structure for a cantilever typed near field probe applicable to a head of an optical information storing device and a manufacturing method thereof are provided to maximally shorten an optical loss region on the head of the optical information storing device and improve an optical throughput needed for recording/playing the optical information more than a few thousands times of a current optical fiber probe. CONSTITUTION: A hole(11) penetrating an upper/lower part of a body is formed on a silicon substrate(10). A dielectrics thin film(20) is formed to a bottom of the silicon substrate as a mask layer. As an oxide film(40) is deposited to the upper part of the silicon substrate as the probe of a parabolic curve, an aperture(41) leading to the penetrating hole of the silicon substrate is formed on a vertex of the oxide film. As depositing on the oxide film, a near field aperture(71) leading to the aperture of the oxide film and having a high throughout is formed on a metal thin film(70).