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    Magnetic separation of devitrified particles from corrosion-resistant iron-based amorphous metal powders
    82.
    发明申请
    Magnetic separation of devitrified particles from corrosion-resistant iron-based amorphous metal powders 有权
    从耐腐蚀铁基非晶态金属粉末中分离失透颗粒

    公开(公告)号：US20070281102A1

    公开(公告)日：2007-12-06

    申请号：US11595056

    申请日：2006-11-09

    Applicant: Phillip D. Hailey ,  Sumner D. Day ,  Joseph C. Farmer ,  Nancy Yang ,  Thomas M. Devine ,  Larry Kaufman

    Inventor： Phillip D. Hailey ,  Sumner D. Day ,  Joseph C. Farmer ,  Nancy Yang ,  Thomas M. Devine ,  Larry Kaufman

    IPC: B05D1/02 ,  H01F1/00 ,  B05C5/00 ,  B05B5/025

    CPC classification number: C23C4/12 ,  B03C1/0332 ,  B03C1/30 ,  B05B5/00 ,  C23C4/073 ,  C23C24/04 ,  H01F1/15308

    Abstract: A system for coating a surface comprising providing a source of iron-based amorphous metal, the iron-based amorphous metal including devitrified ferrite; directing the iron-based amorphous metal toward the surface by a spray for coating the surface; and separating at least a portion of the devitrified ferrite from the spray before the spray reaches the surface. Also an apparatus for coating a surface comprising a source of iron-based amorphous metal, the iron-based amorphous metal including devitrified ferrite; an application system for directing the iron-based amorphous metal toward the surface by a spray for coating the surface, and a system for separating at least a portion of the devitrified ferrite from the spray before the spray reaches the surface.

    Abstract translation: 一种用于涂覆表面的系统，包括提供铁基非晶态金属源，所述铁基非晶态金属包括失透铁素体; 通过用于涂覆表面的喷雾将铁基非晶态金属引导到表面; 并且在喷雾到达表面之前将至少一部分失透铁素体与喷雾分离。 还有一种用于涂覆包括铁基非晶态金属源的表面的设备，所述铁基非晶态金属包括失透铁素体; 用于通过用于涂覆表面的喷雾将铁基非晶态金属朝向表面引导的应用系统，以及用于在喷雾到达表面之前将至少一部分失透铁素体与喷雾分离的系统。

    Methods of fabricating microelectromechanical and microfluidic devices
    86.
    发明申请
    Methods of fabricating microelectromechanical and microfluidic devices 有权
    制造微机电和微流体装置的方法

    公开(公告)号：US20020092822A1

    公开(公告)日：2002-07-18

    申请号：US10003851

    申请日：2001-11-02

    Applicant: Kionix, Inc.

    Inventor： James E. Moon ,  Timothy J. Davis ,  Gregory J. Galvin ,  Kevin A. Shaw ,  Paul C. Waldrop ,  Sharlene A. Wilson

    IPC: C23F001/00

    CPC classification number: B05B5/00 ,  H01J49/0018 ,  H01J49/167 ,  Y10S438/942

    Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as nulllatent maskingnull, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as nullsimultaneous multi-level etching (SMILE)null, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as nulldelayed LOCOSnull, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes. The fourth aspect provides a process sequence that incorporates all three fundamental aspects to fabricate an integrated liquid chromatography (LC)/electrospray ionization (ESI) device. The fifth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an ESI device. The sixth aspect provides a process sequence that incorporates two of the fundamental aspects to fabricate an LC device. The process improvements described provide increased manufacturing yield and design latitude in comparison to previously disclosed methods of fabrication.

    Abstract translation: 公开了本发明的三个基本和三个派生方面。 三个基本方面各自公开了可以整合到完整过程中的过程序列。 第一方面，被指定为“潜屏蔽”，定义了在固定材料（例如氧化硅）中的掩模，该掩模在定义之后被保持为静止，而执行中间处理操作。 然后将潜在氧化物图案用于掩模蚀刻。 指定为“同时多级蚀刻（SMILE）”的第二方面提供了一种处理顺序，其中在蚀刻到下面的材料中第一图案可相对于第二图案被赋予高级开始，使得第一图案可以是 蚀刻成更深，更浅或与第二图案相同的深度。 指定为“延迟LOCOS”的第三方面提供了在过程的一个阶段定义接触孔图案的方法，然后在稍后阶段使用限定的图案来打开接触孔。 第四方面提供了一个整合三个基本方面来制造液相色谱（LC）/电喷雾离子化（ESI）装置的方法。 第五方面提供了一种结合两个基本方面来制造ESI装置的过程序列。 第六方面提供了一种结合两个基本方面来制造LC器件的过程序列。 与先前公开的制造方法相比，所描述的工艺改进提供了增加的制造产量和设计自由度。

    Gas atomizer for spray casting
    87.
    发明授权
    Gas atomizer for spray casting 失效
    喷雾喷雾器

    公开(公告)号：US4901784A

    公开(公告)日：1990-02-20

    申请号：US330049

    申请日：1989-03-29

    Applicant: Sankaranarayanan Ashok ,  Harvey P. Cheskis

    Inventor： Sankaranarayanan Ashok ,  Harvey P. Cheskis

    IPC: B05B5/00 ,  B05B7/16 ,  B22D23/00 ,  B22F3/115 ,  B22F9/08

    CPC classification number: B22F9/082 ,  B05B5/00 ,  B05B7/1606 ,  B22D23/003 ,  B22F3/115 ,  B22F9/08 ,  B22F2009/0808 ,  B22F2009/088 ,  B22F2009/0892 ,  B22F2998/00 ,  B22F2999/00

    Abstract: A gas-atomizing system for spray casting a spray of molten metal on a moving substrate in which the gas atomizing device is in the form of an annulus having a central opening therethrough through which the molten metal to be atomized flows. The annulus is provided with a plenum chamber which communicates with elongated openings on the bottom surface of the annulus. The manifold and outlets are so arranged that a divergent conical spray pattern is produced having a central axis inclined with respect to the vertical axis of the molten metal stream in a direction downstream of the moving substrate upon which the spray material is deposited.

    Abstract translation: 一种用于在移动基板上喷射熔融金属喷雾的气体雾化系统，其中气体雾化装置是具有中心开口的环形的形式，待雾化的熔融金属通过该中心开口流过。 环带设置有与环形物的底表面上的细长开口连通的增压室。 歧管和出口被布置成使得产生具有相对于熔融金属流的垂直轴线倾斜的中心轴线的发散锥形喷射图案，该中心轴线沿着移动基板的下游方向沉积喷涂材料。

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